Structural stability of single-layered LaNi4.25Al0.75 film and its electrochemical hydrogen-storage properties

AB5-based hydrogen storage thin fdms （LaNi4.25Al0.75）, deposited on Cu substrate by dc magnetron sputtering were investigated in this study. X-ray diffraction （XRD） revealed that the microstructure of the layer was in crystal form. SEM and AFM analyses proved that the film appeared to be rather rough with numerous randomly sized pores of approximately 15-40 in nm diameter. Structural stability of the film was examined by the combined analyses of DSC, XRD, and SEM, which indicated that this film maintained its structural stability below 500 K or so, and a network structure was observed on the film after being heated at 700 K for 30 min. Electrochemical hydrogen-storage properties of the films were investigated by simulated battery tests. It was found that single-layered LaNi4.25A10.75 film exhibited electrochemical hydrogen-storage properties similar to typical AB5 alloys in bulk, and the maximum discharge capacity of the film was about 220 mAh/g. After 20 charge/discharge cycles, small needle-shaped aluminium oxide was formed on some fractions of the film surface.     

镍、碳共掺杂纳米二氧化钛薄膜的制备与光催化性能研究

为了增强纳米二氧化钛薄膜在紫外光下光催化降解罗丹明B溶液的能力,分别采用磁控直流溅射与射频溅射的方法,使用二氧化钛靶材、镍靶材、碳靶材,分别制备了碳非金属掺杂、镍金属掺杂以及镍、碳共掺杂的纳米二氧化钛薄膜,并利用扫描电子显微镜（SEM）、X射线衍射仪（XRD）和紫外可见分光光度计（UV-Vis）进行表征。SEM结果表明,与纯二氧化钛薄膜相比镍、碳共掺杂纳米二氧化钛薄膜晶粒细化,比表面积增大,薄膜表面聚集体为不规则的多边形颗粒状,有利于增大与污染物的接触面积;XRD结果表明该薄膜的晶粒减小,加快了光生电子空穴对的分离;薄膜的吸收极限红移,禁带宽度减小。在紫外光照射下,镍、碳共掺杂纳米二氧化钛薄膜的光催化性能最优,1 h降解了29.54%的罗丹明B溶液。     

Role of deposition parameters on microstructure and mechanical properties of chromium oxide coatings

Chromium oxide coatings were deposited by reactive magnetron sputtering on high speed steel (HSS) substrate under various oxygen flow rates and radio frequency (RF) powers. The effect of deposition conditions on the microstructure, hardness and critical load of chromium oxide coating failure was studied. The results indicated that a crystalline chromium oxide coating formed at a high oxygen flow rate and a low RF power exhibited a higher hardness and a lower critical load as compared to a chromium oxide coating with an amorphous microstructure.     

磁控溅射制备In2O3-SnO2薄膜与分析

选择In2LO3与SnO2质量比11的靶材为溅射源,采用磁控溅射法沉积了ITO薄膜,讨论了溅射氩气压强、氧流量、基体温度对薄膜透射率和方阻的影响,深入分析了其机理.研究结果表明溅射时采用低Ar压强更有利于降低ITO薄膜的电阻率,并确定最佳氩气压强为0.2 Pa,厚度为120 nm的ITO薄膜在可见光区的透过率可达到90%;氧流量能明显改变薄膜的性能,随着氧流量从0增加10 L/min(标准状态下,下同),载流子浓度(N)则由3.2×1020降低到1.2×1019/cm3,N值的变化与ITO薄膜光学禁带宽度(Eg)的变化密切相关.振子模型与实验结果吻合,并确定了ITO薄膜的等离子波长(λp=1 510 nm).薄膜随方阻减小表现出明显的"B-M"效应.通过线性外推,建立了直接跃迁的(αE)2模型,并确定了薄膜的Eg值(3.5～3.86 eV).     

TbCo／Cr非晶垂直磁化膜的磁特性

在 SPF-430H 溅射系统上采用不加偏压的射频磁控溅射法制备了 TbCo 非晶垂直磁化膜, 并就 Cr 底层对 TbCo 非晶垂直磁化膜磁性能的影响进行了研究。结果表明,Cr 底层的存在能够增强 TbCo 非晶垂直磁化膜的磁各向异性,并使得其矫顽力增加。分别采用 VTBH-1 型高感度振动样品磁强计和 MTL-1 磁转矩系统测量了 TbCo薄膜的磁滞回线和磁转矩曲线。结果发现,厚度为 120 nm,并带有 180 nm 厚度 Cr 底层的 Tb31C69 薄膜的矫顽力和磁各向异性能分别高达 51.2×104 A/m 和 0.457 J/cm3;没有带 Cr 底层的同样厚度的 Tb31C69 薄膜的矫顽力和磁各向异性能分别只有 35.2×104 A/m 和 0.324 J/cm3。Hitachi X-650 型扫描电镜的观测结果表明,带有 Cr 底层的TbCo 薄膜具有柱状结构,这一柱状结构导致了磁各向异性能的增强以及矫顽力的提高。     

STUDY ON Ni-Cr SYSTEM SOLAR SELECTIVE THIN FILMS PREPARED BY MAGNETRON REACTIVE SPUTTERING PROCESS

1. IntroductionSolar selective thiIl solid fil1us are the key part for solar heat collect'ors. But ll1ostfactories still produced solar absorptive filn1s by traditional tecIl11ology sucl1 as pai1ltillga1ld electrocl1eluical process that nlust result in po…     

K38G合金及其溅射微晶层的高温氧化

研究了K38G铸造镍基高温合金及其用平面磁控离广溅射工艺制备的微晶涂层在800-1000℃500小时内的抗高温氧化性。结果表明,微晶化极大改善合金的抗氧化能力,并改变合金表面生成的氧化物类型,由Cr_2O_3变为α-Al_2O_3。还讨论了铸态K38G合金及溅射微晶层的氧化机理。     

LOCALIZED CORROSION OF MICROCRYSTALS OF 1Crl8Ni9Ti STAINLESS STEEL

The resistances against localized corrosion of 1Cr18Ni9Ti microcrystals with normal grainsize and bcc structure obtained hy magnetron sputtering have been compared.The two kindsof microcrystals with (110) and (211) textures respectively were obtained under differentsputtering conditions.Both microcrystals were found to have better resistance against local-ized corrosion than the crystal with normal grain.The microcrystal with (110) preferredorientation has larger resistance to localized corrosion than that with (211) preferredorientation.     

工艺参数对射频磁控溅射PTFE靶形成的等离子体组成的影响

采用四极质谱仪测量了试验参数对高压脉冲增强射频磁控溅射PTFE靶等离子体气氛的影响规律。结果表明：增加脉冲偏压、脉冲频率、脉宽、射频功率和气压能提高Az离子对PTFE靶的溅射能力，增加空间中氟碳自由基的数量，其中各参数对峰位位于25．0aum处的氟碳自由基强度影响最大：脉冲电压从10kV提高到20kV能将该峰强度提高2倍；脉宽从40s提高到100μs强度提高80倍；频率从50Hz提高到200Hz强度提高4倍；溅射气压由0．1Pa提高到0.3Pa强度提高6倍；射频功率由200W提高到400W强度提高6倍。励磁电流能有效的约束氟碳自由基的空间分布。     

离子束溅射法制备Ti—Ni贮氢薄膜的研究

介绍了用离子束溅射制备贮氢薄膜的方法。采用钛板与镍板拼合靶制备的Ti—Ni薄膜为非晶态,具有良好的附着力和抗粉化能力,而晶化后的贮氢性能更好。