TEM and DFT investigation of CVD TiN/κ-Al2O3 multilayer coatings

This paper investigates the interfacial structure in hot-wall CVD TiN/κ-Al₂O₃ multilayer coatings using both HREM and DFT modeling. Two multilayers with different thicknesses of the TiN layers (50 and 600 nm) separating the κ-Al₂O₃ layers are analyzed. The general microstructure of the two multilayers is relatively similar. The TiN layer in the thicker TiN/κ-Al₂O₃ coating is thick enough to be several TiN grains high. This means that epitaxial columns, which are often found in the thinner TiN/κ-Al₂O₃ coatings, are not present. However, the orientation relationships at the TiN/κ-Al₂O₃ interfaces are the same in both multilayers. The HREM investigations show that κ-Al₂O₃ (001) planes can grow directly on flat (111) TiN faces, without any other phases or detectable amounts of impurities, such as sulphur, present. Where the TiN layers are more curved, γ-Al₂O₃ can be grown, at least partly stabilized by the cube-on-cube orientation relationship between γ-Al₂O₃ and the underlying TiN. The DFT calculations show very similar adsorption strengths for an O monolayer positioned on Ti-terminated TiC(111) and TiN(111) surfaces, with preferred adsorption in the fcc site. O adsorption on N-terminated TiN(111) is much weaker, with preferred adsorption in the top site. Calculated elastic-energy contributions yield a higher stability for κ-Al₂O₃ on TiN(111) than on TiC(111) and a higher stability for κ-Al₂O₃ than for α-Al₂O₃ on both TiC and TiN. This indicates that the observed higher stability of κ-Al₂O₃ on TiC(111) than on TiN(111) is not due to the lattice mismatch, while the preferred epitaxial growth of κ-Al₂O₃ over α-Al₂O₃ can be partly attributed to the mismatch.     

PREPARATION OF TiN FILMS BY N_2 ASSISTED Xe~+ ION BEAM ENHANCED DEPOSITION AND THEIR MECHANICAL PROPERTIES

A new method for preparation of hard TiN films has been developed by using electronbeam evaporation-deposition of Ti and bombardment with 40 keV Xe~+ ion beam ina N_2 gas environment.The synthesized TiN films were superior to PVD and CVDones in respects of improved adhesion to substrate and low preparing temperature.Theyexhibited good wear resistance and high hardness up to 2200 kg/mm~2.Some industrialapplications have been reported.     

GCr15SiMn轴承钢中大尺寸TiN生成与控制

 以西宁特钢EAF→LF→VD→IC工艺路线生产GCr15SiMn轴承钢为研究背景,采用矿物解离分析仪、夹杂物自动分析系统、化学分析及X射线荧光光谱仪等检测手段与热力学计算相结合的方法,研究了铸锭中大尺寸TiN夹杂物的析出机理,分析了冶炼阶段钢液中钛含量增加的原因,并提出了相应的改进工艺。通过对轴承钢中残余钛、氮含量的热力学计算,发现大尺寸TiN主要是在凝固过程中析出和长大,降低冶炼过程中钛含量是控制TiN生成的主要途径。对原工艺冶炼过程钛含量变化进行分析,钢液中钛增量主要发生在EAF出钢→LF结束阶段,其中52%钛增量来自于炉渣。为了避免炉渣中钛进入钢液,借助于七元炉渣CaO-SiO₂-MgO-FeO-Al₂O₃-MnO-TiO₂与钢液之间平衡的钛分配比(LTi)模型,计算了铝含量和炉渣中CaO含量对LTi 的影响,预测了最佳的平衡炉渣成分。结果表明,适当降低铝含量和炉渣中CaO含量可以提高渣-钢之间的钛分配比,降低钢液的钛含量;当铝质量分数为0.015%～0.025%、CaO质量分数为50%～55%时,其他炉渣组元的最佳成分(质量分数)为18%～24% Al₂O₃和12%～17% SiO₂。此外,定量描述了不同LTi条件下EAF下渣量与LF终点钛含量的关系。最后,采用“低炉渣碱度、低铝含量以及严格控制电炉下渣量”的改进措施进行了优化试验,优化后冶炼终点钛质量分数可控制在小于0.002 0%,铸锭TiN平均数密度可由原工艺的2.09个/mm2降低至0.73个/mm2,且TiN尺寸几乎都小于10 μm。     

大气环境下Au/TiN复合薄膜的滑动摩擦磨损性能

以30CrMnSi钢为基体,用磁控溅射法制备出Au/TiN复合薄膜材料,研究了薄膜在大气环境中的滑动摩擦磨损性能。结果表明:该复合薄膜材料与9Cr18钢球构成的滑动摩擦副,在接触压力不大于1.0GPa条件下,摩擦系数小于0.15,摩擦次数超过3×105;在较宽的温度、湿度和磁场范围内,薄膜的摩擦磨损性能保持稳定。当接触压力增大至3.0GPa时,薄膜的摩擦系数增大,耐磨寿命减小。该薄膜可用于大气环境下长寿命低载荷精密摩擦副的润滑。     

生物医用钛合金TiN涂层微磨粒磨损及耐蚀性初步研究

对生物医用Ti6Al4V合金表面TiN涂层机械力学性能进行了研究,在分析力学性能的基础上,考察了TiN涂层在蒸馏水和Hank’s模拟体液中的耐磨性,并在Hank’s模拟人体体液中研究了TiN涂层在静态环境中的腐蚀行为。结果表明:在Ti6Al4V合金表面沉积TiN涂层后,其耐磨性和耐蚀性大大提高,有利于改善钛合金在人体环境中的使用寿命。     

PIII方法制备的TiN膜的性能

用一种新型的等离子体浸没式离子注入技术(PIII),在Cr12MoV钢基体上制备了TiN膜,经XPS分析发现,膜中的组织为TiN、TiO2和Ti2O3。对有与无TiN膜的Cr12MoV钢试样进行对比,测定了维氏硬度,耐磨性以及磨痕。结果表明:TiN膜具有高的硬度和优良的抗摩擦性能。     

Structural characterization of TiN/NbN multilayers: X-ray diffraction, energy-filtered TEM and Fresnel contrast techniques compared

Two TiN/NbN multilayers with wavelength 13.6 and 6.15 nm have been characterized by X-ray diffraction (XRD), Fresnel contrast analysis (FCA) and energy-filtered transmission electron microscopy (EFTEM). Good agreement between the composition profile obtained by FCA and EFTEM is obtained if the lower resolution of the EFTEM images is taken into account. The relative advantages and disadvantages of the techniques are discussed. Used together the two TEM techniques provide a quantitative characterization that is consistent with, and for some parameters provides more precise values than, that from XRD. The analysis shows that the multilayers have narrow interfaces (< 1 nm) and a composition amplitude close to 95% for the longer wavelength.     

双辉渗镀TiN陶瓷层摩擦磨损性能的研究

采用一种新的制备TiN双层辉光渗金属技术，在钢铁材料表面直接复合而形成超硬耐磨TiN渗镀扩散陶瓷层。用Tapping AFM型原子力显微镜和LEC图像分析仪分析表面形貌；用GDS750型辉光放电光谱分析仪测定渗镀复合层试样成分；用Rigaku／max2500型X射线衍射仪（XRD）测定复合渗镀层的相结构；用WTM-1E可控气氛微型摩擦磨损试验仪对复合渗镀层的摩擦磨损性能进行研究。结果表明：这种制备TiN新工艺方法合成的渗镀TiN陶瓷层，其表面均匀致密，Ti和N原子由表层向内呈梯度分布，与一般表面沉积的TiN层不同，属于冶金扩散层结合；渗镀层厚度可达8μm以上，TiN层择优取向为（200）晶面；渗镀层硬度较高，达到HV0.1 2200，在干滑动摩擦磨损试验条件下具有较低的摩擦因数和优异的耐磨性能。     

有限元方法求解化学气相淀积反应器模型(Ⅰ)——冷壁反应器模型及有限元解

建立了冷壁化学气相淀积反应器的数学模型,用Galerkin有限元方法对模型予以求解.计算中考虑了温度对物性参数的影响及自然对流因素,计算值和实验结果基本上一致.     

New type of tin support for hydroprocessing catalyst

TiN supported molybdenum sulfide catalysts showed much higher activity for cleavage of C-C bonds than oxide supported molybdenum sulfide catalysts, indicating the possibility of a new generation of supports for hydroprocessing catalysts.