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排序方式: 共有3055条查询结果,搜索用时 109 毫秒
1.
Kedong Xia Shuoshuo Yu Yunling Li Huijuan Han Lingyao Duan Zhenyu Hou Xiao Liu 《Journal of the European Ceramic Society》2021,41(4):2375-2385
In this study, C/SiOC and C/SiO2 composites were prepared by using carbonaceous microspheres with different surface functional groups. Carbonaceous microspheres based on hydrothermal reaction of glucose contains hydroxyl group, while the surface carboxyl group increases after NaOH etching. The hydroxyl group increases the oxygen-enriched structural units of SiOC ceramics, and the C spheres are closely enwrapped in SiOC matrix after pyrolysis at 900 °C. However, the interfacial reaction of surface carboxyl with Si–OH results in the formation of cristobalite SiO2, and C spheres are not only encased inside the SiOC matrix, but also dispersed outside of SiOC ceramics. After removal of C via calcination at 500 °C for 5 h, C/SiOC and C/SiO2 composites are transformed into amorphous SiO2 and cristobalite SiO2, respectively. The thermogravimetric analysis indicates the oxidation resistance of SiOC is superior to that of C and SiO2. 相似文献
2.
Shunda Zhan Bangyan Dong Hongqiang Wang Yonghua Zhao 《Journal of the European Ceramic Society》2021,41(10):5075-5087
Bulk micromachining of single-crystal SiC has been challenging due to its extreme stability both mechanically and chemically. To address this issue, a novel tool-based electrolytic plasma etching method is proposed, with which micropatterns and micro-holes are fabricated in SiC in a hydrofluoric acid-free aqueous solution with no need for masks. The material removal is the result of the combined effects of electrolytic plasma chemistry and physics. The chemistry refers to the reaction of Si with hydroxyl radical to form various SiOx and with H to form silanes, and the reactions of C to form volatile carbon oxides or hydrocarbons, all of which are accomplished and enhanced under the electrolytic plasma atmosphere. Besides, the local high temperature of plasma thermally promotes the evaporation or dissolution of SiO2 in NaOH solution. The tool-based electrolytic plasma etching method provides alternative approaches for the fabrication of SiC-based MEMS and devices. 相似文献
3.
在多晶硅太阳能电池的生产过程中, 金刚线切割技术(Diamond wire sawn, DWS)具有切割速度快、精度高、原材料损耗少等优点, 受到了广泛关注。金刚线切割多晶硅表面形成的损伤层较浅, 与传统的酸腐蚀制绒技术无法匹配, 金属催化化学腐蚀法应运而生。金属催化化学腐蚀法制绒具有操作简单、结构可控且易形成高深宽比的绒面等优点, 具有广阔的应用前景。本文总结了不同类型的金属催化剂在制绒过程中的腐蚀机理及其形成的绒面结构, 深入分析和讨论了具有代表性的银、铜的单一及复合催化腐蚀过程及绒面结构和电池片性能。最后对金刚线切割多晶硅片表面的金属催化化学腐蚀法存在的问题进行了分析, 并展望了未来的研究方向。 相似文献
4.
E. Sebastián A. Murciano R. Madrigal P.N. De Aza P. Velasquez 《Ceramics International》2021,47(15):21466-21475
The influence of surface topography on cellular behaviour and its importance for the development of three-dimensional scaffolds for bone tissue engineering are a topic of growing interest. To date, the introduction of topographical patterns into the surface of 3D porous ceramic scaffolds has proven difficult, due partly to the brittle nature of ceramic materials as well as the currently available fabrication technologies. In this study, a grooved pattern was introduced into the surface of 3D multilayer porous ceramic scaffolds by the chemical etching technique. The patterned scaffolds were characterised by X-Ray Diffraction (XRD), Scanning Electron Microscopy with Energy Dispersive X-Ray Spectroscopy (SEM-EDX) and Digital Holographic Microscopy (DHM). Their bioactivity was also evaluated in vitro by immersion in simulated body fluid (SBF) for 12 h, 1, 7, 14 and 21 days. Scaffolds were constituted mainly with a mixture of the calcium pyrophosphate (Ca2O7P2) and β-tricalcium phosphate (Ca?(PO?)?) phases. The pyrophosphate on the external layer was dissolved as a result of the etching process, leaving grooves on the surface. Ridges and grooves were nano-/micrometric, with dimensions of around 900 nm–1.5 μm in width and 200 nm–300 nm in depth. Moreover, the mechanical properties and bioactive capacity of the patterned scaffolds were not affected by chemical etching, making them suitable to be used in bone tissue engineering. 相似文献
5.
为探究挠性筋结构单晶硅材料的各向异性特性以及KOH腐蚀工艺对其力学性能的影响规律,进行纳米压痕实验,并结合原子力显微镜观察单晶硅表层3个主晶面上压痕裂纹形貌随晶向的变化规律,分析单晶硅材料表层弹性模量、硬度、断裂韧性等机械力学特性参数在(001)、(110)及(111)3个主要晶面上沿各个晶向的变化规律;分析挠性筋结构单晶硅材料(001)晶面的KOH腐蚀工艺对其材料表面机械特性的影响规律.结果表明:挠性筋单晶硅在(001)晶面上弹性模量的各向异性变化幅度明显,硬度及断裂韧性各向异性的变化幅度不大;挠性筋单晶硅在(110)晶面弹性模量和断裂韧性的各向异性变化幅度明显,硬度各向异性变化幅度不大;挠性筋单晶硅在(111)晶面硬度值、弹性模量及断裂韧性参数的变化幅度幅值均较小;确定了单晶硅表层3个晶面裂纹最易扩展的晶向方向,KOH腐蚀工艺使得单晶硅表面质量降低,腐蚀后暴露的表面微裂纹、缺陷等会使得单晶硅(001)晶面表层硬度、断裂韧性降低,从而降低了挠性筋结构的实际断裂强度. 相似文献
6.
《Ceramics International》2021,47(20):28642-28649
Ti3C2Tx MXene has attracted remarkable attention due to its promising applications in energy storage and sensors. However, traditional MXene preparation methods used HF as etchant, which was highly toxic and harmful to human and environment. Moreover, the aqueous etchants will also result in the combination of OH, O and F groups on the surfaces, making it difficult to control the varieties and contents of the surface terminations. In this paper, a green and mild electrochemical exfoliation method was proposed to synthesize Ti3C2Fx and synchronously control its fluorination degree on the surface. A non-aqueous ionic liquid, [BMIM][PF6]-based solution was used as electrolyte. The as-prepared Ti3C2Fx was fluorinated with the CF and TiF3 groups, which were electrochemically active and contributed to the excellent cycling stability of the MXene anode-based Li-ion batteries. These findings provided a facile strategy to prepare MXene materials and dope MXene with tailored property for MXene-based energy devices applications. 相似文献
7.
8.
M.J. Wang W.T. Wang L. Liu F. Scurti Y.D. Xia B.L. Huo X. Yang Y. Zhao 《Ceramics International》2018,44(13):15572-15578
Corrosion resistance is a crucial property to achieve successful superconducting joints of Y0.5Gd0.5Ba2Cu3O7-z (YGdBCO) coated conductors (CCs). Cu and Ag metallic layers need to be fully removed from the area of conductor to be joint to allow for a superconducting path across the joint. Therefore, when using a wet etching process to remove the metallic layers, the joint performance can be significantly influenced by the etching conditions. The effects of chemical etching with ammonia water and hydrogen peroxide mixture on crystal structure, surface microstructure and critical current (Ic) of YGdBCO CCs were systematically investigated. We found the set of etching parameters that does not affect conductor performance, leaving the Ic of the YGdBCO conductor unchanged upon etching. However, when the etching conditions are not optimal, decrease in Ic was found and the underlying reasons driving the degradation were investigated. Raman spectroscopy and XRD analysis indicated that the reduced Ic is mainly due to oxygen deficiency in the YGdBCO crystal lattice. 相似文献
9.
Conductive micropatterns is an essential part for operation of electronic devices in both industrial and academic fields. Conventional mask-based photolithography and vacuum deposition are inadequate to meet the demands of convenience and simplicity due to their complicated operation, costly instrumentations and relatively low resolution (for vacuum deposition). Development of simple and efficient mask-less fabrication techniques of conductive micropatterns is highly expected. Here we report a facile meniscus-confined electrochemical etching (MCEE) approach to fabricate metal micropatterns with resolution down to at least 1.0 μm. Both the applied bias and the moving velocity directly influence the patterning resolution. MCEE process is developed to fabricate source and drain electrodes in organic transistors on both rigid and flexible substrates. Being a maskless direct writing method, the width and morphology of the etched channel can be easily modulated by the bias and the velocity. The organic transistor with top-contact configuration presents better electrical performance with device on/off ratio of 1.1 × 105 and maximum carrier mobility of 1.07 cm2V−1s−1, which implies that MCEE operation doesn't result in the degradation of the already deposited semiconducting film. This mask-less MCEE approach provides a potential complementary to conventional mask-based techniques for the fabrication of microscale metal patterns. 相似文献
10.
Perfluorocarbon gas is widely used in the semiconductor industry. However, perfluorocarbon has a
negative effect on the global environment owing to its high global warming potential (GWP) value.
An alternative solution is essential. Therefore, we evaluated the possibility of replacing conventional
perfluorocarbon etching gases such as CHF3 with C6F12O, which has a low GWP and is in a liquid
state at room temperature. In this study, silicon oxynitride (SiON) films were plasma-etched using
inductively coupled CF4 +C6F12O+O2 mixed plasmas. Subsequently, the etching characteristics
of the film, such as etching rate, etching profile, selectivity over Si, and photoresist, were investigated.
A double Langmuir probe was used and optical emission spectroscopy was performed for plasma
diagnostics. In addition, a contact angle goniometer and x-ray photoelectron spectroscope were used
to confirm the change in the surface properties of the etched SiON film surface. Consequently, the
etching characteristics of the C6F12O mixed plasma exhibited a lower etching rate, higher SiON/Si
selectivity, lower plasma damage, and more vertical etched profiles than the conventional CHF3 mixed plasma. In addition, the C6F12O gas can be recovered in the liquid state, thereby decreasing
global warming. These results confirmed that the C6F12O precursor can sufficiently replace the
conventional etching gas. 相似文献