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This paper presents the design, kinematic and dynamic analysis, fabrication and characterization of a monolithic micro/nanopositioning three degrees-of-freedom (DOF) (XYθ) stage. The design of the proposed MEMS (micro-electro-mechanical system) stage is based on a parallel-kinematic mechanism (PKM) scheme that allows for translation in the XY plane and rotation about the Z axis, an increased motion range, and linear kinematics in the operating region (or work area) of the stage. The truss-like structure of the PKM results in higher modal frequencies by increasing the structural stiffness and reducing the moving mass of the stage. The stage is fabricated on a silicon-on-insulator (SOI) wafer using surface micromachining and deep reactive ion etching (DRIE) processes. Three sets of electrostatic linear comb drives jointly actuate the mechanism to produce motion in the X, Y and θ (rotation) directions. The fabricated stage provides a motion range of 18 μm and 1.72° at a driving voltage of 85 V. The resonant frequency of the stage under ambient conditions is 465 Hz. Additionally a high Q factor (66) is achieved from this parallel-kinematics mechanism design.  相似文献
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纳米定位系统中广泛采用的压电驱动器因存在非线性、多映射的迟滞特性而严重影响了纳米定位系统的 定位精度. 为消除迟滞对定位精度的影响, 将其视为干扰, 设计不基于迟滞及定位系统精确数学模型的自抗扰控制 算法, 利用扩张状态观测器实时估计迟滞, 进而补偿其对定位精度的影响, 获得了良好的定位系统控制仿真效果. 仿 真结果表明, 自抗扰控制器能够有效消除迟滞、提高纳米定位系统的定位精度  相似文献
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