Electrochromic Properties of Sputtered Ti-Doped WO3 Films

Ti-doped WO3 films were prepared by the mid-frequency dual-target magnetron sputtering method. The structure and electrochromic properties of the Ti-doped WO3 films were analysed by X-Ray diffraction （XRD）, Raman spectroscopy, spectrophotometer, cyclic chronoam- perometry and atomic force microscopy （AFM）. The results indicate that the erystallinity decrease after the doping of titanium, the channels for ion injection and extraction increase, the responding speed with 5.1% titanium doped becomes faster, and its circle life increases more than four times compared with the undoped WO3 film. In the coloured state, the W-O-W bonds decrease, but the W = O bonds increase. Since the W-O-W bonds break down for Li＋ ions＇ injection and more W = O bonds form, it is more convenient to inject Li＋ ions into the Ti-doped film than undoped film because more W-O-W bonds break down in the coloured state.     

氧流量和钛掺杂对WO3电致变色性能的影响

采用中频孪生磁控溅射技术制备非晶WO3薄膜.拉曼光谱、X射线衍射(XRD)、紫外分光光度计、计时安培分析仪等测试手段分析薄膜的结构、吸收光谱、透射光谱及响应时间.研究了氧流量和钛掺杂对薄膜电致变色性能的影响.结果表明原始非晶态WO3薄膜在较高O2流量比份(＞ 95%)条件沉积时,表现出更好的变色性能,对于500 nm～800 nm可见光范围,薄膜的透光率差值大于60%.钛掺杂后吸收光谱向短波方向移动,且掺杂5%后,近紫外线区域吸收率明显提高.掺杂5%,10%后响应速度提高了1倍,但着色效率降低.     

氮分压对电弧离子镀CrNx薄膜结构与性能的影响

采用电弧离子镀技术,在不同n2分压下沉积Cr/CrNx薄膜.X射线衍射技术、努氏硬度计和UMT型球-盘摩擦试验机、M342-2型腐蚀测量系统分别测试了薄膜相结构、显微硬度、摩擦磨损和抗腐蚀性能.研究了N2分压对薄膜相组成、硬度、摩擦磨损和抗腐蚀性能的影响.结果表明随着N2分压的升高,薄膜由Cr2N(211)相过渡到CrN(220)相;薄膜硬度出现两个极值,对应于单相Cr2N和CrN;与钢基体相比,N2分压为0.35 Pa时制备的CrNx薄膜具有良好的耐磨性能和抗腐蚀性能.     

氮气含量对CrNx薄膜相结构及摩擦磨损性能的影响

采用电弧离子镀技术,在45钢基体上制备了不同氮气含量的CrNx薄膜.采用X射线衍射技术(XRD)、扫描电子显微镜(SEM)、努氏硬度计和UMT型球-盘摩擦试验机,分别测试了薄膜相结构、表面形貌、显微硬度和摩擦磨损性能.结果表明:CrNx薄膜主要由CrN和Cr2N相组成;随着N2含量的增加,薄膜中Cr2N(211)衍射峰强度逐渐减弱,CrN(220)衍射峰强度逐渐增强;薄膜表面颗粒逐渐减少,表面趋于平整,薄膜硬度出现两个峰值,对应于薄膜为单相Cr2N和CrN的相组成处;与钢基体相比,氮气含量为35%时,CrNx薄膜具有良好的表面质量、最佳的硬度、优良的耐磨损性能.