多晶硅纳米膜压阻超薄微梁加速度敏感结构

随着微机电系统(MEMS)技术的迅速发展,硅基加速度传感器已经得到广泛应用。但在敏感结构设计中,普遍存在灵敏度与固有谐振频率相互制约的矛盾。为此,采用多晶硅纳米膜作应变电阻,设计了300 nm超薄微梁加速度敏感结构。这种结构的设计改善了灵敏度与谐振频率之间的矛盾,使两者乘积值提高了30余倍,从而使压阻加速度计的性能得到大幅提升。     

Modeling of subthreshold characteristics for undoped and doped deep nanoscale short channel double-gate MOSFETs

A model of subthreshold characteristics for both undoped and doped double-gate (DG) MOSFETs has been proposed. The models were developed based on solution of 2-D Poisson's equation using variable separation technique. Without any fitting parameters, our proposed models can exactly reflect the degraded subthreshold characteristics due to nanoscale channel length. Also, design parameters such as body thickness, gate oxide thickness and body doping concentrations can be directly reflected from our models. The models have been verified by comparing with device simulations' results and found very good agreement.     

关于短沟道双栅无结型晶体管的仿真研究

We study the characteristics of short channel double-gate(DG) junctionless(JL) FETs by device simulation. OutputⅠ-Ⅴcharacteristic degradations such as an extremely reduced channel length induced subthreshold slope increase and the threshold voltage shift due to variations of body doping and channel length have been systematically analyzed.Distributions of electron concentration,electric field and potential in the body channel region are also analyzed.Comparisons with conventional inversion-mode(IM) FETs,which can demonstrate the advantages of JL FETs,have also been performed.     

多晶硅隧道压阻模型*

基于陷阱模型,分析了多晶硅能带结构和导电机理,给出了解释隧道压阻效应的等效电路,说明了构成多晶硅压阻效应的内在因素以及隧道压阻效应在其中的作用。综合晶界区域和晶粒中性区两方面压阻效应建立了新的压阻模型——隧道压阻模型。结果表明,掺杂浓度在1020cm-3以上,复合晶界的压阻系数不但大于晶粒中性区的压阻系数,而且随掺杂浓度增加而增大,从而揭示了多晶硅纳米薄膜在重掺杂情况下出现应变因子随掺杂浓增加而增大的重要实验现象的内在机理。