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Ho3+在氟氧化物玻璃陶瓷中的光谱性质 总被引:5,自引:0,他引:5
根据 Ho掺杂的氟氧化物玻璃陶瓷的吸收光谱,用 Judd-Ofelt理论计算了强度参量,并由此计算了激发能级的自发辐射跃迁速率、辐射寿命、荧光分支比和积分发射截面等光谱参量. 相似文献
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The samples consisting of 100nm Al or Ag film on optical glass substrate were irradiated by a beam of Xe 5×10~(15) to 2×10~(16) cm~(-2) with energy 320 keV. The adhesion of films on substrates was tested by Xe~+ irradiation. Optical character was measured by spectrophotometer. The ion mixing amount was measured by RBS. The results showed that after ion irradiating the adhesion of the film on the glass is enhanced. The adherent strength is greater than 10 kg/cm~2. The thermal stability of the films is good. The irradiated film is more optically efficient, the surface is smooth and rendered more corrosion resistance. The mechanism of the film adhesion was discussed. 相似文献
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频率上转换研究由于半导体激光以及上转换材料的发展而获得了巨大的发展.目前通过一些新原理、新材料来寻找有效提高上转换效率的方法、途径是一个热点问题.利用Fluorolog-2荧光分光光度计我们测量了Tin(0.1)Yb(10.9)氟氧化物微晶玻璃的常规光致发射谱和激发谱.容易指认出其发射谱中位于451.5urn、649.0urn、(772.5urn,783.0urn)和(777.5urn,800.5urn)M$分别是‘D2-’F4、‘G4-’F4、‘G。-’H。、和’H。-’H6的荧光.其激发谱中… 相似文献
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