首页 | 本学科首页   官方微博 | 高级检索  
文章检索
  按 检索   检索词:      
出版年份:   被引次数:   他引次数: 提示:输入*表示无穷大
  收费全文   2203篇
  免费   70篇
  国内免费   1篇
电工技术   33篇
综合类   1篇
化学工业   688篇
金属工艺   46篇
机械仪表   39篇
建筑科学   81篇
矿业工程   2篇
能源动力   70篇
轻工业   175篇
水利工程   12篇
石油天然气   6篇
无线电   220篇
一般工业技术   406篇
冶金工业   217篇
原子能技术   16篇
自动化技术   262篇
  2021年   44篇
  2020年   13篇
  2019年   19篇
  2018年   33篇
  2017年   36篇
  2016年   43篇
  2015年   19篇
  2014年   54篇
  2013年   109篇
  2012年   92篇
  2011年   117篇
  2010年   83篇
  2009年   104篇
  2008年   101篇
  2007年   99篇
  2006年   83篇
  2005年   72篇
  2004年   62篇
  2003年   64篇
  2002年   77篇
  2001年   37篇
  2000年   39篇
  1999年   44篇
  1998年   58篇
  1997年   55篇
  1996年   43篇
  1995年   40篇
  1994年   34篇
  1993年   35篇
  1992年   31篇
  1991年   34篇
  1990年   36篇
  1989年   30篇
  1988年   24篇
  1987年   27篇
  1986年   25篇
  1985年   42篇
  1984年   34篇
  1983年   18篇
  1982年   26篇
  1981年   20篇
  1980年   17篇
  1979年   29篇
  1978年   23篇
  1977年   24篇
  1976年   22篇
  1975年   22篇
  1974年   14篇
  1973年   18篇
  1971年   11篇
排序方式: 共有2274条查询结果,搜索用时 375 毫秒
1.
2.
The extinction coefficient ? at 2.9 μm for OH in fluoride glasses is measured by determining the amount of HF evolved during heating of the glass under steam and the corresponding intensity of the OH absorption band. This coefficient is respectively equal to 31 litre mole?1 cm?1 for BTYbZ glass (15 BaF2 - 29 ThF4 - 28 YbF3 - 28 ZnF2) and 19.5 litre mole?1 cm?1 for BALLA glass (34 BaF2 - 57 ZrF4 - 4 AlF3 - 5 LaF3).  相似文献   
3.
An assessment of the Fe-C-Si system   总被引:1,自引:0,他引:1  
  相似文献   
4.
Reaction of metallic fluorides: WF6 TaF5, NbF5 and TiF4 with C60/C70 extract was performed at appropriate temperatures. M0F5 and BF3 fluorides do not react. Chemical formulas based on mass uptake show MFn/C60 ratios up to 2.00. Compounds were analysed by means of X-ray diffraction, FT-IR and NMR spectroscopies. The presence of neutral fluorides and associated anionic species is put forward and it is shown that MFn compounds do not act as fluorination agents. Electrical conductivity measurements are also presented.  相似文献   
5.
Data transmission networks and systems are often subject to perturbations due to the fact that (low level) data signals are surrounded by perturbing electromagnetic fields. This paper presents and analyses information perturbing mechanisms. The authors examine data streams transmitted by an elementary system which represents the basis of any electronic device. We show the influence of technological families of cmos circuits and present a test method and bench to investigate the sensitivity of devices under test by means of statistical parameters.  相似文献   
6.
A 1% Pd catalyst (38% dispersion) was prepared by impregnating a γ-alumina with palladium acetylacetonate dissolved in acetone. The behaviour of this catalyst in oxidation and steam reforming (SR) of propane was investigated. Temperature-programmed reactions of C3H8 with O2 or with O2 + H2O were carried out with different stoichiometric ratios S(S =[O2]/5[C3H8]). The conversion profiles of C3H8 for the reaction carried out in substoichiometry of O2 (S < 1) showed two discrete domains of conversion: oxidation at temperatures below 350°C and SR at temperatures above 350°C. The presence of steam in the inlet gases is not necessary for SR to occur: there is sufficient water produced in the oxidation to form H2 and carbon oxides by this reaction. Contrary to what was observed with Pt, an apparent deactivation between 310 and 385°C could be observed with Pd in oxidation. This is due to a reduction of PdOx into Pd0, which is much less active than the oxide in propane oxidation. Steam added to the reactants inhibits oxidation while it prevents the reduction of PdOx into Pd0. Compared to Pt and to Rh, Pd has a higher thermal resistance: no deactivation occurred after treatment up to 700°C and limited deactivation after treatment up to 900°C, provided that the catalyst is maintained in an oxygen-rich atmosphere during the cooling.  相似文献   
7.
8.
The Na2O-Cs2O-SiO2 system has been investigated by means of a new differential thermal analysis apparatus. Two compounds have been observed for the first time in the metasilicate and disilicate joins. The CsNaSi2O5 disilicate melts congruently at 1217 K and the peritectic fusion of the CsNaSiO3 metasilicate occurs at 1120 K.  相似文献   
9.
Nowadays different kinds of double-skin facades are developed and used in new architectural projects. The aim of these facades is, on the one hand, to increase internal comfort and, on the other hand, to decrease energy consumption. In order to optimise the overall performance of the double-skin façades, their detailed behaviour needs to be better understood. The prediction of the airflow within the channel (between the two glazings) is very important for understanding of the double-skin facades behaviour, especially in summer conditions. A comprehensive modelling of a compact double-skin facade equipped with a venetian blind and forced ventilation is proposed here. The modelling is done using the CFD (computational fluid dynamics) approach to assess the air movement within the ventilated facade channel. Three-dimensional airflow is modelled using a homogeneous porous media representation, in order to reduce the size of the mathematical model. A parametric study is proposed here, analysing the impact of three parameters on the airflow development: slat tilt angle, blind position and air outlet position. The distance between the blind and the external glazing was found to have a major impact on the velocity profiles inside the double-skin facade channel.  相似文献   
10.
In this paper, a simple but accurate analytical solution is presented to model the flexion of a circular diaphragm with clamped edges under an uniform load. The touch down effect and the evolution of touch radius are considered in this model, making it useful for touch down capacitor devices such as pressure sensors. This model is then compared to results obtained from Coventor, a finite elements analysis program designed for microelectromechanical systems  相似文献   
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号