| UV-LIGA深度光刻机平滑衍射技术研究 |
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| 引用本文： | 余国彬,姚汉民,胡松.UV-LIGA深度光刻机平滑衍射技术研究[J].微细加工技术,2002(3):40-43. |
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| 作者姓名： | 余国彬 姚汉民 胡松 |
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| 作者单位： | 中国科学院光电技术研究所,成都,610209 |
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| 摘 要： | UV-LIGA深度光刻技术是加工微型机电系统的一项重要的微细加工技术。介绍了一种平滑衍射效应的位错强度叠加原理，它采用了蝇眼积分透镜去平滑衍射，并模拟数值计算了硅片表面的光强分布，最后给出了光刻结果。
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| 关 键 词： | 深度光刻机 UV－LIGA技术 平滑衍射 蝇眼积分透镜 错位强度叠加 |
| 文章编号： | 1003-8213(2002)03-0040-04 |
| 修稿时间： | 2002年4月17日 |
An Investigation on Diffraction Reducing Technology of Equipment for UV-LIGA Deep Lithography |
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| YU Guo?bin,YAO Han?min,HU Song.An Investigation on Diffraction Reducing Technology of Equipment for UV-LIGA Deep Lithography[J].Microfabrication Technology,2002(3):40-43. |
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| Authors: | YU Guo?bin YAO Han?min HU Song |
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| Abstract: | UV-LIGA deep lithography technology is an important micro fabrication technology of fabricating micro electro mechanical systems. In this paper, the principle of phase dislocation strength super impose of reducing diffraction effects is presented, and the diffraction is reduced making use of Fly's Eye Integral Lens. Numerical simulations of the intensity distribution on the wafer plane have been done. In the end, experimental results are presented. |
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| Keywords: | UV-LIGA technology diffraction reducing Fly's Eye Integral Lens |
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