| Surface morphology and photoluminescence properties of ZnO thin films obtained by PLD |
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| 作者姓名： | 连建设 郭作兴 蒋青 |
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| 作者单位： | KeyLabofAutomobileMaterials,MinistryofEducation,CollegeofMaterialsScienceandEngineering,JilinUniversity,Changchun130025,China |
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| 基金项目： | 国家重点基础研究发展计划(973计划) |
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| 摘 要： | ZnO thin films on Si(111) substrate were deposited by laser ablation of Zn target in oxygen reactive atmosphere, Nd-YAG laser with wavelength of 1 064 nm was used as laser source. XRD and FESEM microscopy were applied to characterize the structure and surface morphology of the deposited ZnO films. The optical properties of the ZnO thin films were characterized by photoluminescence. The UV and deep level (yellow-green) light were observed from the films. The UV light is the intrinsic property and deep level light is attributed to the existence of antisite defects (Ozn). The intensity of UV and deep level light depends strongly on the surface morphology and is explained by the surface roughness of ZnO film. A strongly UV emission can be obtained from ZnO film with surface roughness in nanometer range.
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| 关 键 词： | 氧化锌 脉冲激光沉积 薄膜生长 UV光致发光 |
Surface morphology and photoluminescence properties of ZnO thin films obtained by PLD |
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| FAN Xi-mei,LIAN Jian-she,GUO Zuo-xing,JIANG Qing.Surface morphology and photoluminescence properties of ZnO thin films obtained by PLD[J].Transactions of Nonferrous Metals Society of China,2005,15(3):519-523. |
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| Authors: | FAN Xi-mei LIAN Jian-she GUO Zuo-xing JIANG Qing |
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| Abstract: | ZnO thin films on Si(111) substrate were deposited by laser ablation of Zn target in oxygen reactive atmosphere, Nd-YAG laser with wavelength of 1 064 nm was used as laser source. XRD and FESEM microscopy were applied to characterize the structure and surface morphology of the deposited ZnO films. The optical properties of the ZnO thin films were characterized by photoluminescence. The UV and deep level (yellow-green) light were observed from the films. The UV light is the intrinsic property and deep level light is attributed to the existence of antisite defects (OZn). The intensity of UV and deep level light depends strongly on the surface morphology and is explained by the surface roughness of ZnO film. A strongly UV emission can be obtained from ZnO film with surface roughness in nanometer range. |
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| Keywords: | ZnO pulsed laser deposition UV photoluminescence film |
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