反应磁控溅射(CrMoTaNbVTi)N多主元薄膜的微观组织与机械性能研究

本文采用直流反应磁控溅射方法，通过溅射（CrMoTaNbV）镶嵌靶和纯Ti靶制备了(CrMoTaNbVTi)N多主元氮化物薄膜。研究了不同氮气流量比RN对(CrMoTaNbVTi)N薄膜的微观结构、力学性能和摩擦学性能的影响。结果表明，当RN=0% 和10%时薄膜为简单的体心立方结构，当RN=20%、30% 和40%时为简单的面心立方结构。随着氮气流量比RN的增大，表面颗粒逐渐减小，断面柱状晶更为致密，同时(CrMoTaNbVTi)N薄膜的残余应力、膜基结合力、硬度和弹性模量逐渐增大，且当RN=40%时达到最大值，分别为-3.3 GPa, 352 mN, 25.6±1.2 GPa 和 278.8±11.2 GP。RN =40%制备的氮化物薄膜具有最小的比磨损率，相较合金薄膜降低了约1个数量级，表现出优异的耐磨损性能。

Structure and mechanical properties of multi-element (CrMoTaNbVTi)N films by reactive magnetron sputtering

In this study, (CrMoTaNbVTi)N multi-element films are deposited by direct current magnetron sputtering CrMoTaNbV mosaic alloy target and pure Ti target. The composition, structure, mechanical properties and wear behavior of the films deposited at RN (N2/(Ar+N2)=0%, 10%, 20%, 30% and 40% are investigated. The (CrMoTaNbVTi)N films deposited at RN=0% and 10 % exhibit a simple BCC solid solution structure, whereas those deposited at RN=20%, 30 % and 40% show a simple FCC solid solution structure. With increasing of RN, the size of the surface particles is decreased and the columnar crystals are become denser. Meanwhile, the compressive stress, adhesive critical load (Lc), hardness and elastic modules are increased and reach a maximum value of -3.3 GPa, 352 mN, 25.6±1.2 GPa and 278.8±11.2 GPa at RN=40%, respectively. The wear rate of film deposited at RN =40% is decreased about ten times that the alloy film (RN=0%), indicated an excellent wear resistance.