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1.
We have developed a problem-solving framework, called ConClass, that is capable of classifying continuous real-time problems dynamically and concurrently on a distributed system. ConClass provides an efficient development environment for describing and decomposing a classification problem and synthesizing solutions. In ConClass, decomposed concurrent subproblems specified by the application developer effectively correspond to the actual distributed hardware elements. This scheme is useful for designing and implementing efficient distributed processing, making it easier to anticipate and evaluate system behavior. The ConClass system provides an object replication feature that prevents any particular object from being overloaded. In order to deal with an indeterminate amount of problem data, ConClass dynamically creates object networks that justify hypothesized solutions, and thus achieves a dynamic load distribution. A number of efficient execution mechanisms that manage a variety of asynchronous aspects of distributed processing have been implemented without using schedulers or synchronization schemes that are liable to develop bottlenecks. We have confirmed the efficiency of parallel distributed processing and load balancing of ConClass with an experimental application 相似文献
2.
Takeshi Kondo Hiroyuki Ito Kazuhide Kusakabe Kazuhiro Ohkawa Kensuke Honda Yasuaki Einaga Akira Fujishima Takeshi Kawai 《Diamond and Related Materials》2008,17(1):48-54
The effect of CF4 plasma etching on diamond surfaces, with respect to treatment time, was investigated using scanning electron microscopy (SEM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and electrochemical measurements. SEM observations and Raman spectra indicated an increase in surface roughening on a scale of 10–20 nm, and an increase in crystal defect density was apparent with treatment time in the range of 10 s to 30 min. In contrast, alteration of the diamond surface terminations from oxygen to fluorine was found to be rather rapid, with saturation of the F/C atomic ratio estimated from XPS analysis after treatment durations of 1 min and more. The redox kinetics of Fe(CN)63−/4− was also found to be significantly modified after 10 s of CF4 plasma treatment. This behavior shows that C–F terminations predominantly affect the redox kinetics compared to the effect on the surface roughness and crystal defects. The double-layer capacitance (Cdl) of the electrolyte/CF4 plasma-treated boron-doped diamond interface was found to show a minimum value at 1 min of treatment. These results indicate that a short-duration CF4 plasma treatment is effective for the fabrication of fluorine-terminated diamond surfaces without undesirable surface damage. 相似文献
3.
Akira Watanabe Yoshimitsu Takeuchi Goji Saeki 《Journal of the American Ceramic Society》1985,68(11):308-C
The length of potassium titanate fibers produced by several conventional methods averages 50 μm, with a maximum of 100 μm. Extremely long fibers (most >1000 μm long) were obtained by calcination in N2 gas flowing at 5.2×10-4 m/s. 相似文献
4.
We succeeded in the fabrication of bonded laser crystals composed of a neodymium-doped YVO4 laser crystal (Nd:YVO4) and its host crystals YVO4 by a newly developed dry etching technique using an argon ion beam. The optical distortion caused by the bonded interface of size 5 mm × 6 mm was estimated to be 0.05λ at 633 nm. From the comparison of laser performance pumped by a laser diode, the bonded crystals could increase the laser output power by nearly twice that of the non-bonded crystals with the same degree of polarization of 99.2%. To analyze the mechanism of the enhanced reduction of the thermal load in the bonded crystals, numerical simulations with a finite-element method were also performed. 相似文献
5.
Yoshiyuki Uno Akira Okada Kensuke Uemura Purwadi Raharjo Toshihiko Furukawa Kosaku Karato 《Precision Engineering》2005,29(4):171-455
A new finishing process for metal molds by large-area electron beam (EB) irradiation is proposed in this study. In the large-area EB irradiation equipment used here, an EB with high-energy density is irradiated without focusing the beam, and so the EB with a maximum diameter of 60 mm can be used for melting or evaporating metal surface instantly. Experimental results show that the surface roughness decreases from 6 μmRz to less than 1 μmRz in just a few minutes under proper machining conditions. The corrosion resistance of metal mold surface also could be greatly improved by large-area EB irradiation. Furthermore, the surface roughness of tilting surface close to 90° could be well improved. Therefore, large-area EB irradiation method has a possibility to become a high-efficiency finishing process for metal molds. 相似文献
6.
A response surface model of the luminous flame emissivity of sodium pool fire has been proposed for use in safety analysis computer codes of a liquid metal fast reactor. The liquid sodium burns in air resulting in not only heat generation but also release of sodium oxide aerosols of sub-micron diameters. Aerosols levitating in air are radiative and they influence the allocation of combustion heat from the flame to atmospheric gas or sodium pool. The emissivity of the flame needs to be quantified, as it is one of user-specified parameters of the computer codes for the sodium fire analysis. The response surface model of the flame emissivity is developed based on numerical experiments on the physics of mass and heat transfer and behavior of the aerosol. Thermal-hydraulic equations have been solved coupled with aerosol dynamics and chemical reaction. Three influential variables on the emissivity are identified as pool temperature, gas temperature and oxygen molar fraction in the air. It has been found that the emissivity is calculated reasonably as a function of the three variables. The proposed response surface model can be easily employed in the sodium fire analysis codes because it is a simple quadratic expression. For the safety evaluation of the sodium fire, combined use is recommended of the proposed model and the lumped-mass zone model code. 相似文献
7.
Hitoshi Kurokawa Taku Nakayama Yasunori Kobayashi Ken Suzuki Mutsumi Takahashi Seiichi Takami Momoji Kubo Naotsugu Itoh Parasuraman Selvam Akira Miyamoto 《Catalysis Today》2003,82(1-4):233-240
A modified Monte Carlo (MC) simulation was performed to investigate the hydrogen absorption behavior in Pd and Pd–Ag alloys of the composition PdxAg1−x (x=0.7–0.8) under H2 pressure (0.1 MPa) at different temperatures. The present method employed can consider the dissociative adsorption of hydrogen molecule and the subsequent absorption of hydrogen atom by formalizing the relationship between the pressure of hydrogen molecule and hydrogen atom. The potential parameters were determined to reproduce the solution enthalpy of hydrogen in pure metals. The results are in good agreement with experimental findings as well as previous theoretical studies. We confirmed that our method is useful to simulate the absorption of hydrogen in metals and alloys. 相似文献
8.
Preliminary experiments using two chemicals (CaO, a quicklime, and a cationic nitrogen-bearing precipitant, EC-004) to remove silica from geothermal brine were undertaken at the Mokai geothermal plant, New Zealand. The brine was mixed with the reagent (CaO or EC-004). The reaction was studied from the start of the experiment (NRT, 0 min, no retaining time) and after 15 min (15RT) at 90 °C. The concentration of silica in the brine was initially 954 mg/l, and decreased linearly with increasing reagent concentration. When CaO is added, the silica concentration at 15RT was 200 mg/l lower than at NRT and became almost zero on addition of 1.5 g/l. In contrast, when EC-004 is added, the total silica concentration nearly reaches the solubility of amorphous silica at 90 °C. In order to prevent silica scaling in Mokai brines cooled to 90 °C, the CaO and EC-004 added should be individually adjusted to 0.5 g/l and 80 mg/l, respectively. 相似文献
9.
Y Shioda S Koizumi S Furuya S Akira N Kameyama N Hamano W Takahashi A Tokunaga N Tanaka M Onda 《Canadian Metallurgical Quarterly》1993,23(6):556-561
Respiratory infections are the most common infection in children. They differ remarkably according to age, bacteria and viruses. Therefore a careful history of outbreak, age, former infections, involvement of surroundings, symptoms, etc are essential. The present study included 50 children, aged between 0.3 and 12 yrs, all treated ambulatorily. 21 received brodimoprim (B) and 29 erythromycin (E). Indications were: tonsillitis, bronchitis, otitis media, sinusitis and scarlet fever. Dosages were: B was given 10 mg/kg body weight (b.w.) initially followed by 5 mg/kg b.w., once-a-day. The duration of treatment varied between 4 and 14 days (mean 8.3 days). E was given 30.50 mg/kg b.w. 3 times per day; duration 4 to 14 days (mean 8.6 days). Overall results were: in group B:12 cures, 5 improvements, 3 failures; 1 not assessable. In group E: 20 cures, 8 improvements, 1 failure. Side effects: in group B: vomiting (1), skin reaction (2), discontinuation (2); in group E: skin reaction (1), diarrhea (5), diarrhea+vomiting (1); discontinuation (2). The differences in efficacy and tolerability in the two groups are not statistically significant. The improved compliance with a single versus t.i.d. dosages has to be taken into account. 相似文献
10.
Rui Morimoto Chisato Yokomori Akiko Kikkawa Akira Izumi Hideki Matsumura 《Thin solid films》2003,430(1-2):230-235
In this paper, bulk-Si metal–oxide–semiconductor field effect transistors (MOSFETs) are fabricated using the catalytic chemical vapor deposition (Cat-CVD) method as an alternative technology to the conventional high-temperature thermal chemical vapor deposition. Particularly, formation of low-resistivity phosphorus (P)-doped poly-Si films is attempted by using Cat-CVD-deposited amorphous silicon (a-Si) films and successive rapid thermal annealing (RTA) of them. Even after RTA processes, neither peeling nor bubbling are observed, since hydrogen contents in Cat-CVD a-Si films can be as low as 1.1%. Both the crystallization and low resistivity of 0.004 Ω·cm are realized by RTA at 1000 °C for only 5 s. It is also revealed that Cat-CVD SiNx films prepared at 250 °C show excellent oxidation resistance, when the thickness of films is larger than approximately 10 nm for wet O2 oxidation at 1100 °C. It is found that the thickness required to stop oxygen penetration is equivalent to that for thermal CVD SiNx prepared at 750 °C. Finally, complementary MOSFETs (CMOSs) of single-crystalline Si were fabricated by using Cat-CVD poly-Si for gate electrodes and SiNx films for masks of local oxidation of silicon (LOCOS). At 3.3 V operation, less than 1.0 pA μm−1 of OFF leakage current and ON/OFF ratio of 107–108 are realized, i.e. the devices can operate similarly to conventional thermal CVD process. 相似文献