High growth rate metal‐organic molecular beam epitaxy for the fabrication of GaAs space solar cells

In this work, the epitaxial growth of GaAs photovoltaic devices using metalorganic molecular beam epitaxy (MOMBE) and chemical beam epitaxy (CBE) with growth rates in excess of 3 μm/h is undertaken. The performance of these preliminary devices offer encouraging evidence for MOMBE and CBE as possible alternatives to the more common metalorganic chemical vapor deposition (MOCVD) for the production of III‐V solar cells. Copyright © 2000 John Wiley & Sons, Ltd.     

GaAs/InGaAs应变异质结构临界厚度的Raman散射和PL谱分析

采用室温Raman散射和低温光致发光(PL)谱,对以TMG,固体As和固体In作为分子束源的MOMBE法生长的GaAs/In_xGa_(1-x)As(x=0.3)单层异质结构和多量子阱结构中InGaAs应变层的临界厚度进行了实验研究。由应变引起的Raman散射峰位移,以及PL谱峰位置与应变和无应变状态下一维有限深势阱跃迁能量计算结果的比较可见,在In组分含量x=0.3的情况下,临界厚度H_c≤5nm,小于能量平衡理论的结果,而与力学平衡模型的理论值相近。     

Electrical passivation in hydrogen plasma exposed GaN

Lightly p-doped (3×10¹⁷ cm^-3) GaN grown on GaAs substrates by metal organic molecular beam epitaxy (MOMBE) shows deactivation of the residual acceptors on exposure to a microwave (2.45 GHz) hydrogen plasma at 250°C. Subsequent annealing to 350°C produces further dopant passivation, while higher temperatures (450°C) restore the initial conductivity. These results suggest that hydrogen carrier gases should be avoided during vapour phase growth of III-V nitrides     

Dopant incorporation in GaAs and AlGaAs grown by MOMBE for high speed devices

Continued improvement in GaAs/AlGaAs device technology requires higher doping levels, both to reduce parasitics such as source resistances, and to enhance speed in devices such as the heterostructure bipolar transistor (HBT). In this paper we will discuss doping issues which are critical to high speed performance. In particular, we will focus on doping of GaAs and AIGaAs using carbon as the acceptor and Sn as the donor. Due to the unique growth chemistry of metalorganic molecular beam epitaxy (MOMBE), both of these impurities can be used to achieve high doping levels when introduced from gaseous sources such as trimethylgallium (TMG) or tetraethyltin (TESn). Comparison of SIMS and Hall measurements show that both elements give excellent electrical activation to 1.5 × 10¹⁹ cm³ for Sn and 5 × 10²⁰ cm⁻³ for C. More importantly, we have found that both impurities canbe used to achieve high quality junctions, indicating that little or no diffusion or segregation is occurring during growth. Because of the excellent incorporation behavior of these dopants, we have been able to fabricate a wide range of devices including field effect transistors (FETs), high electron mobility transistors (HEMTs), and Pnp HBTs whose performance equals or exceeds that of similar devices grown by other techniques. In addition to these results, we will briefly discuss the key differences in growth kinetics which allow such abruptness and high doping levels to be achieved more readily in MOMBE than in other growth techniques.     

Self-aligned InGaP/GaAs heterojunction bipolar transistors formicrowave power application

As an alternative to AlGaAs/GaAs heterojunction bipolar transistors (HBTs) for microwave applications, InGaP/GaAs HBTs with carbon-doped base layers grown by metal organic molecular beam epitaxy (MOMBE) with excellent DC, RF, and microwave performance are demonstrated. As previously reported, with a 700-Å-thick base layer (135-Ω/sq sheet resistance), a DC current gain of 25, and cutoff frequency and maximum frequency of oscillation above 70 GHz were measured for a 2-μm×5-μm emitter area device. A device with 12 cells, each consisting of a 2-μm×15-μm emitter area device for a total emitter area of 360 μm², was power tested at 4 GHz under continuous-wave (CW) bias condition. The device delivered 0.6-W output power with 13-dB linear gain and a power-added efficiency of 50%     

Carbon-doped base GaAs-AlGaAs HBT's grown by MOMBE and MOCVDregrowth

High-quality GaAs-AlGaAs heterojunction bipolar transistors (HBTs) in which the carbon-doped base layers (p=10¹⁰-10²⁰ cm^-3, 400-800 Å thick) and Sn-doped collector and subcollector layers are grown by metalorganic molecular-beam epitaxy (MOMBE) and a subsequent regrowth using metalorganic chemical vapor deposition (MOCVD) is used to provide the n⁺ AlGaAs emitter and GaAs/InGaAs contact layers are discussed. A current gain of 20 was obtained for a base doping of 10¹⁹ cm^-3 (800 Å thick) in a 90-μm-diameter device, with ideality factors of 1.0 and 1.4 for the base-collector and emitter-base junctions, respectively, demonstrating the excellent regrowth-interface quality. For a base doping of 10²⁰ cm^-3 (400 Å thick), the current gain decreased to 8     

High-f/sub max/ AlGaAs/InGaAs and AlGaAs/GaAs HBT's with p/sup +//p regrown base contacts

The present paper describes a new approach to fabricating high performance HBT's with low base resistance. Their base contact resistance is reduced by using MOMBE selective growth in the extrinsic base region-a key process in the fabrication of high-f/sub max/ AlGaAs/InGaAs and AlGaAs/GaAs HBT's. A p/sup +//p regrown base structure, which consists of a 40-nm-thick graded InGaAs strained layer and a heavily C-doped regrown contact layer, is used for the AlGaAs/InGaAs HBT's to reduce both their base transit time and base resistance, while preventing aluminum oxide incorporation at the regrowth interface. An h/sub fe/ of 93, an f/sub T/ of 102 GHz, and an f/sub max/ of 224 GHz are achieved for a 1.6-/spl mu/m/spl times/4.6-/spl mu/m HBT, together with reduced base push-out effects and improved reliability. AlGaAs/GaAs HBT's with an 80-nm-thick uniform base layer that have high f/sub max/ values ranging from 140-216 GHz are also fabricated using the selective growth technique. These results confirm the high potential of the proposed HBT's, especially for microwave and millimeter-wave applications.<>     

Selfaligned AlGaAs/GaAs HBT grown by MOMBE

The very low parasitic resistance n-p-n GaAs/AlGaAs heterojunction bipolar transistors (HBT) grown by metal organic molecular beam epitaxy (MOMBE) using all gaseous source dopants are reported. The carbon and tin dopants were introduced through the uses of trimethygallium (TMGa) and tetraethyltin (TESn). To achieve the low parasitics, the graded InGaAs emitter cap layer was doped with tin to 5*10/sup 19/ cm/sup -3/ and the doping level in the subcollector was 3*10/sup 18/ cm/sup -3/. The emitter and collector sheet resistances were 25 Omega / Square Operator and 10 Omega / Square Operator , respectively. The 800 AA thick base layer was carbon doped to a level of 7*10/sup 19/ cm/sup -3/. The base contact resistance and sheet resistance were 0.1 Omega mm and 180 Omega / Square Operator , respectively. With a thin AlGaAs surface passivation layer for the emitter-base junction, the common emitter DC current gain was maintained up to 25, even for 2*5 mu m/sup 2/ emitter size devices. The unity short circuit current gain cutoff frequency f/sub T/, and maximum oscillation frequency f/sub max/, were 48 and 63 GHz, respectively.<>     

Anisotropic surface diffusion at crystal facet transitions during localized Ga---In---As---P growth by MOMBE

Localized grown InP/GaInAs(P) heterostructure ridges by selective area metalorganic molecular beam epitaxy (MOMBE) are investigated concerning the surface diffusion. The structures have different crystal facets at the semiconductor mask transition area. The surface diffusion processes between these simultaneously growing facets are a function of the step density, which is preset by the selected substrate misorientations. The anisotropic surface diffusion in the direction of the group V terminated surface steps determines the lateral facet growth and leads to a fine oscillating surface corrugation on the ridge surface only near the step upwards oriented facet transition. A simulation of this anisotropic surface corrugation by a deterministic nonlinear partial differential equation of a one dimensional diffusion model for the selective area growth in MOMBE presents a good agreement with the measured corrugation depth and periods.     

A study of the OMVPE growth mechanisms using internal reflectance spectroscopy to examine adsorption of TMGa and NH3 and surface reactions between them

Internal reflection spectroscopy spectra show that NH₃ and ND₃ chemisorb onto (100) and (111)A GaAs surfaces. Adsorption occurs by the formation of Ga—N bonds via Lewis acid-base reactions which are identified by an absorption band between 1325 and 1100 cm⁻¹ with peaks near 1285, 1220 and 1150 cm⁻¹. No NH₃ absorption bands are detected when the (111)B surface is exposed. TMGa also chemisorbs onto the (100) GaAs surface. The adsorption spectra of NH₃ + TMGa is a function of the order in which the reactants are introduced. When NH₃ is introduced first, the reactivity is much greater as is evidenced by the almost total elimination of absorption peaks associated with N—H and CH₃ peaks which suggests that the reactions are surface catalyzed methane elimination reactions. Implications of the requirement that the hydride be adsorbed and the methyls react with the hydrogen atoms from the hydride to ALE and MOMBE growth are discussed. Also, consistent explanations are presented for why growth on the (111)B surface is difficult, the growth rate is independent of the hydride partial pressure under normal growth conditions, the incorporation of C into GaAs has an orientational dependence, and As is more preferentially incorporated into GaAsP at the lower growth temperatures.     

Growth and characterization of Ga2Te3 films by metalorganic molecular beam epitaxy

Single-crystal Ga2Te3 films were grown by metalorganic moleular beam epitaxy (MOMBE). The crystallinity of the Ga2Te3 films was characterized by reflection high energy electron diffraction (RHEED) and x-ray diffraction measurements. Unique substrate temperature and VI/III ratio dependence of crystallinity and growth rate are obtained in this experiment for the first time.     

GaInAs/InP waveguide multiple-quantum-well optical modulator with 9 dB on/off ratio

Clear excitonic peak wavelength shifts are obtained with an applied electric field and large on/off ratio optical modulation of long-wavelength light propagating along the plane of GaInAs/InP multiple-quantum-well (MQW) structures grown by metalorganic molecular beam epitaxy (MOMBE). These waveguide MQW optical modulators have a modulation on/off ratio of 8:1 (9 dB) at a driving voltage as low as 5 V operating at a wavelength of 1.55 ?m. This measurement is the first step towards faster and higher extinction ratio devices.     

Crosstalk characteristics of a 1.3-μm/1.5-μm wavelengthdemultiplexing photodetector using laser-assisted MOMBE growth

This paper demonstrates a monolithic 1.3-μm/1.5-μm wavelength demultiplexing photodetector fabricated using Ar ion laser-assisted metal organic molecular beam epitaxy (MOMBE) growth. Reduction of crosstalk to -24 dB is accomplished in both 1.3-μm and 1.5-μm wavelength regions. The dependence of the crosstalk on the coupling efficiency between the fiber and device and the polarization dependence of the responsivity is also discussed     

High-speed, high-current-gain p-n-p InP/InGaAs heterojunctionbipolar transistors

p-n-p InP/InGaAs heterojunction bipolar transistors (HBTs) are reported for the first time. The transistors, grown by metal organic molecular beam epitaxy (MOMBE), exhibited maximum DC current gain values up to 420 for a base doping level of 4×10¹⁸ cm^-3 . Small-signal measurements on self-aligned transistors with 3-μm×8-μm emitter area indicated the unity gain cutoff frequency value of 10.5 GHz and the inferred maximum frequency of oscillation of 25 GHz. The results clearly demonstrate the feasibility of complementary integrated circuits in the InP material system     

High speed waveguide-integrated photodiodes grown by metal organic molecular beam epitaxy

Using InP/InGaAs layers grown by metal organic molecular beam epitaxy (MOMBE) on semi-insulating (SI) InP substrate the authors have fabricated waveguide-integrated pin-photodiodes working on the principle of evanescent field coupling. A 3 dB cutoff frequency of 9.6 GHz has been found in a 50 Omega system. The 100 mu m long diodes exhibit a capacitance of <0.1 pF at -5 V bias. In addition design criteria are given to improve the speed of the devices.<>     

Medieval manners & magic at ICMOVPE-6

The Sixth International Conference on Metallorganic Vapour Phase Epitaxy (ICMOVPE-VI) was held on June 8–12th in Cambridge, MA, USA. Highlights included not only papers and posters on MOVPE, MOMBE and CBE but also the informal Panel Discussion in which Group V alternatives, scrubbing and waste disposal were addressed.     

The role of ion characteristics in determining the structural and electrical quality of InN grown by metalorganic molecular beam epitaxy

The effects of growth temperature and nitrogen plasma biasing on the electrical and structural properties of InN grown using electron cyclotron resonance metalorganic molecular beam epitaxy (ECR MOMBE) have been investigated. These results are compared to those found from InN grown using a higher energy radio frequency (rf) plasma source (rf MOMBE). By varying the bias of the nitrogen plasma or the growth temperature, it is possible to achieve smooth surface morphologies. However, biasing can also be used to increase the mobility by a factor of two while the growth temperature has only a small effect. By contrast, use of an rf plasma improves mobility by nearly a factor of ten. None of the growth conditions investigated were found to significantly alter the electron concentration, which was measured to be 1−5 × 10²⁰ cm⁻³.     

A 10 Gbit/s OEIC photoreceiver using InP/InGaAs heterojunction bipolar transistors

Metal organic molecular beam epitaxy (MOMBE) was successfully used for the first time to realise a high speed monolithic photoreceiver. Incorporating an InGaAs pin photodetector followed by a transimpedance preamplifier circuit implemented with InP/InGaAs heterojunction bipolar transistors (HBTs), the OEIC photoreceiver had a bandwidth of 6 GHz and a midband transimpedance of 350 Omega . In a system experiment performed at 10 Gbit/s, the receiver exhibited a sensitivity of -15.5 dBm for a bit error rate of 10/sup -9/ at a wavelength of 1.53 mu m. This is the first demonstration of operation of a long wavelength OEIC photoreceiver at this speed.<>     

Semiconductor lasers fabricated by selective area epitaxy

For the first time, semiconductor lasers grown entirely by selective area epitaxy are reported. The lasers were formed by in situ processing techniques and metal organic molecular beam epitaxy (MOMBE). A 50 AA thick layer of Si deposited on the InP substrate was used as a mask for both the selective growth and etching. Laser stripes, 6 mu m wide, were delineated by a focused Ga ion beam and transferred into the substrate by Cl/sub 2/ etching. These steps were performed in the vacuum chambers attached to the MBE machine. Separate confinement heterostructure GaInAsP-InP lasers were grown selectively in the stripes. The resulting devices emit at 1.3 mu m and show threshold currents of 40 mA.<>     

Modeling growth rate of HfO2 thin films grown by metal-organic molecular beam epitaxy

HfO₂ dielectric layers were grown on the p-type Si (100) substrate by metal-organic molecular beam epitaxy (MOMBE). Hafnium-tetra-butoxide, Hf(O·t-C₄H₉)₄ was used as a Hf precursor and Argon gas was used as a carrier gas. The thickness of the HfO₂ film and intermediate SiO₂ layer were measured by scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM). The properties of the HfO₂ layers were evaluated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), high frequency (HF) capacitance-voltage (C-V) measurement, and current-voltage (I-V) measurement. C-V and I-V measurements have shown that HfO₂ layer grown by MOMBE has a high dielectric constant (k) of 20-22 and a low-level of leakage current density. The growth rate is affected by various process variables such as substrate temperature, bubbler temperature, Ar and O₂ gas flows and growth time. Since the ratio of O₂ and Ar gas flows are closely correlated, the effect of variations in O₂/Ar flow ratio on growth rate is also investigated using statistical modeling methodology.