GaAs/AlGaAs量子阱的输运特性

本文研究了低迁移率GaAs/AlGaAs量子阱的散射机制。由电导测量和Shubnikov de-Haas振荡曲线分别得到输运散射时间τ_0和弛豫时间τ_q(量子散射时间)。在GaAs/AlGaAs量子阱中,τ_0≈τ_q;而在调制掺杂的异质结中,τ_0》τ_q。用量子阱、异质结中起支配作用的散射机构不同很好地解释了实验结果。本文还研究了弱磁场下量子阱的负磁阻效应,这是磁场抑制了电子局域态的结果。     

GaAs/AlGaAs量子阱红外探测器的量子阱参数设计

量子阱参数如势阱宽度、势垒高度和阱中的掺杂浓度决定了阱中的能级分布及光学吸收,它和量子阱红外探测器(QWIP)的响应波长、暗电流、响应率、探测率等特性参数密切相关.为了使设计的QWIP达到预期的各种性能指标,对其各参量进行了精心设计.运用量子阱的第一激发态与势垒的高度接近时产生共振效应,进行了量子阱的优化设计,得出垒高和阱宽的关系.另外,根据器件光谱响应的要求,利用传输矩阵法计算出相应的量子阱参数.此设计方法在GaAs/AlGaAs长波-长波双色QWIP中得到了较好的验证.     

GaAs／AlGaAs量子阱红外探测器特性非对称性分析

在分子束外处生长量子阱材料过程中,分析了在不同的GaAs/AlGaAs异质结生长次序中Ga的解吸附速率不同和量子阱中掺杂的扩散造成量子阱结构的不对称,讨论了GaAs/AlGaAs最子红外探测器的性能参数相对于正负偏压的不对称性,并与金属有机化合物汽相沉淀法生长的最子阱材料和相应器件进行了比较,发现,采用分子束外延方法生长器件的不对称性更明显。     

AlInGaAs/AlGaAs应变量子阱增益特性研究

采用Shu Lien Chuang方法计算了AlInGaAs/AlGaAs应变引起价带中重、轻空穴能量变化曲线,在Harrison模型的基础上详细地计算了AlInGaAs/AlGaAs和GaAs/AlGaAs量子阱电子、空穴子能级分布并且进一步研究了这两种材料在不同注入条件下的线性光增益.进一步计算比较可以得出AlInGaAs/AlGaAs应变量子阱光增益特性要优于GaAs/AlGaAs非应变量子阱增益特性,因此AlInGaAs/AlGaAs应变量子阱半导体材料应用于半导体激光器比传统GaAs/AlGaAs材料更具优势.     

肖特基C-V法研究AlxGa1-xN/GaN异质结界面二维电子气

通过对Pt/AI0 22Ga078N/GaN肖特基二极管的C-V测量,研究分析了A1022Ga078N/GaN异质结界面二维电子气(2DEG)浓度及其空间分布.测量结果表明,Al0.22Ga.8N/GaN异质结界面2DEG浓度峰值对应的深度在界面以下1.3nm处,2DEG分布峰的半高宽为2.3nm,2DEG面密度为6.5×1012cm-2.与AlxGa1xAs/GaAs异质结比,其2DEG面密度要高一个数量级,而空间分布则要窄一个数量级.这主要归结于A1xGa1-xN层中～MV/cm量级的压电极化电场和自发极化电场对AlxGa1-xN/GaN异质结能带的调制和AlxGa1xN/GaN异质结界面有更大的导带不连续.     

基于肖特基电流输运模型和扫描分布电阻显微术的窄量子阱载流子浓度表征

目前对于纳米尺度半导体材料的局域电导与对应载流子浓度关系的描述主要以参数拟合为主。其关系模型主要依赖人工拟合参数, 例如理想因子。所以无法从测得局域电导分布来推出载流子浓度分布。为此, 提出了一种获取量子阱中载流子浓度的模型。通过小于10nm分辨的截面扫描分布电阻显微术, 测得了GaAs/AlGaAs量子阱 (110) 截面的局域电导分布。基于实验设置, 提出了只含有掺杂浓度参量的实验描述模型。通过模型, 由测得的量子阱 (掺杂浓度从1016/cm3到1018/cm3) 局域电导分布, 推导出了其载流子分布。相对误差在30%之内。     

肖特基C-V法研究Al_xGa_(1-x)N/GaN异质结界面二维电子气

通过对 Pt/ Al0 .2 2 Ga0 .78N/ Ga N肖特基二极管的 C- V测量 ,研究分析了 Al0 .2 2 Ga0 .78N/ Ga N异质结界面二维电子气 (2 DEG)浓度及其空间分布 .测量结果表明 ,Al0 .2 2 Ga0 .78N/ Ga N异质结界面 2 DEG浓度峰值对应的深度在界面以下 1.3nm处 ,2 DEG分布峰的半高宽为 2 .3nm ,2 DEG面密度为 6 .5× 10 1 2 cm- 2 .与 Alx Ga1 - x As/ Ga As异质结相比 ,其 2 DEG面密度要高一个数量级 ,而空间分布则要窄一个数量级 .这主要归结于 Alx Ga1 - x N层中～ MV / cm量级的压电极化电场和自发极化电场对 Alx Ga1 - x N/ Ga N异质结能带的调制和 Alx Ga1 -     

InGaAs／AlGaAs单量子阱激光器低阈值激射

研制了InGaAs/AlGaAs SQW激光器,对其工作特性如阈值电流密度、激射波长、特征温度、远场分布等进行了研究. 用MOCVD方法生长制备了InGaAs/AlGaAs分别限制单量子阱结构材料,得出其各层组分和能带分布.首先在GaAs衬底上生长GaAs缓冲层和AlGaAs波导层,然后生长窄能带的AlGaAs量子阱势垒层,再继续生长InGaAs量子阱有源区.其后继续生长AlGaAs势垒层、高Al组分AlGaAs波导层和GaAs高掺杂欧姆接触层.我们发现在低温范围里(160 K～220 K)阈值电流密度随温度升高而减小,与普通量子阱激光器正相反,表现出负的特征温度.随着温度进一步提高,阈值电流密度表现出指数式增大.300 K下腔长2000 μm的激光器最低的阈值电流密度约为200 A/cm2.(OD7)     

Ge/Si量子阱结构的C-V特性的模拟

采用有限深对称方势阱近似模型求解薛定谔方程得到Ge/Si量子阱中的子能级分布,并基于迭代法数值求解泊松方程模拟计算了量子阱结构样品在不同偏压下的载流子浓度分布和C-V特性.C-V曲线上电容平台的存在是量子阱结构C-V特性的显著特征,它与量子阱结构参数有密切的关系.随着覆盖层厚度的减小,C-V曲线上平台起始点的电容值增加,并且向低电压方向移动直至其消失.随着量子阱中的掺杂浓度提高,阱中的载流子浓度也会相应增加,那就需要更高的外加电压才能耗尽阱中的载流子,因此平台宽度也就随着掺杂浓度的增加而增加.当覆盖层厚度增加时,由于电压的分压作用,使得降在量子阱上的分压相应减少,因此需要更大的外加偏压才能使阱中载流子浓度全部耗尽,这就使平台的宽度增大.同样地,当覆盖层掺杂浓度增加时,覆盖层中更多的载流子转移到阱内,也就需要更高的外加偏压才能使阱中载流子全部耗尽,平台的宽度也就随之增大.     

Ge/Si量子阱结构的C-V特性的模拟

采用有限深对称方势阱近似模型求解薛定谔方程得到Ge/Si量子阱中的子能级分布,并基于迭代法数值求解泊松方程模拟计算了量子阱结构样品在不同偏压下的载流子浓度分布和C-V特性.C-V曲线上电容平台的存在是量子阱结构C-V特性的显著特征,它与量子阱结构参数有密切的关系.随着覆盖层厚度的减小,C-V曲线上平台起始点的电容值增加,并且向低电压方向移动直至其消失.随着量子阱中的掺杂浓度提高,阱中的载流子浓度也会相应增加,那就需要更高的外加电压才能耗尽阱中的载流子,因此平台宽度也就随着掺杂浓度的增加而增加.当覆盖层厚度增加时,由于电压的分压作用,使得降在量子阱上的分压相应减少,因此需要更大的外加偏压才能使阱中载流子浓度全部耗尽,这就使平台的宽度增大.同样地,当覆盖层掺杂浓度增加时,覆盖层中更多的载流子转移到阱内,也就需要更高的外加偏压才能使阱中载流子全部耗尽,平台的宽度也就随之增大.     

A charge control and current-voltage model for inverted MODFET's

An analytical model is used to investigate properties of the two-dimensional electron gas (2DEG) confined in a GaAs/AlGaAs quantum well (QW) formed in a inverted modulation doped field effect transistor (MODFET). The position of the Fermi level and the average distance of the carriers in the well have been calculated as a function of the 2DEG concentration, n_s. A charge control model is presented based on the self-consistent solution of Schrodinger and Poisson's equation. The results show a unique behavior of the average distance of the 2DEG which increases with n_s, a property unique to these type of structures. The analysis is extended to model current-voltage characteristics     

Influence of RIE-induced damage on luminescence and electron transport properties of AlGaAs-GaAs heterostructures

Reactive ion etching induced damage was systematically studied by photoluminescence (PL), cathodoluminescence (CL) and electronic microwave absorption in GaAs/AlGaAs multiple quantum well (MQW) and two-dimensional electron gas (2DEG) heterostructures. Using QW’s of differing widths at various depths, PL and CL characterization of the individual quantum wells allowed a depth sensitive detection of RIE induced damage. Etching was done with CC1₂F₂ at constant pressure and exposure time, while the bias voltage was successively increased from 55 to 320 V. A remarkable degradation in PL-intensity was observed for the topmost 1 nm QW located 30 nm beneath the surface, even at the lowest etch bias voltage. In 2DEG heterostructure samples investigated electrically, both mobility and carrier concentration of the 2DEG were seen to be strongly reduced. After illumination however, the initial values were almost completely restored, indicating that RIE damage predominantly reduces the electron supply efficiency of the AlGaAs barrier, whereas the 2DEG channel itself is not severely degraded even at the highest etch bias voltage.     

用分数维空间方法研究量子阱中激子效应对三次谐波产生的影响

运用分数维空间方法理论研究了GaAs/AlGaAs无限深和有限深方形量子阱中激子效应对三次谐波产生的影响。利用分数维空间模型获得波函数和束缚能级为空间维度的函数,而空间维度数是阱宽的函数。无限深方阱的维度数随着阱宽的减小从三维极限过渡到二维;而在有限深阱中,当维度数达到一个极值后,维度数随阱宽的减小而增大。采用密度矩阵和迭代法导出三次谐波的表达式。数值结果表明,考虑激子效应的三次谐波系数比只考虑电子状态的系数增大40%左右,并且三次谐波系数大小依赖于激子的受限程度。结果还表明在弛豫率较小情况下可以获得较大的三次谐波的系数。     

HEMT器件小信号模型研究

提出一种AlGaAs/GaAs HEMT器件沟道电荷新模型,该模型用一个通用解析函数中系数的不同值来描述二维电子气(2DEG)和AlGaAs层中的电子浓度。在小信号特性上,除考虑了2DEG层外,又在考虑了AlGaAs层、速度饱和、饱和区沟道长度调制效应和源、漏串联电阻RS和RD等效应的基础上,推导出直流特性、跨导、输出电导和栅电容的解析表达式。仿真说明,在较大的栅、漏压范围内,该模型的理论值与实验结果符合良好。     

Photoluminescence of InAs quantum dots coupled to a two-dimensional electron gas

Self-assembled InAs quantum dots have been extensively studied by a variety of experimental techniques. Works have been done on the transport properties of the InAs dots located near a two-dimensional electron gas (2DEG). However, there have been few reports on the optical properties of the InAs dots located closely to 2DEG. In this work, InAs dots samples with 2DEG and without 2DEG growth by solid source molecular beam epitaxy were studied using photoluminescence measurements. Different photoluminescence behaviors between the InAs dots and the InAs dots near the 2DEG were observed. It was found that the emission efficiency of the InAs dots was significantly enhanced by the existence of the nearby 2DEG and the thermal activation energy of the InAs dots was decreased by the 2DEG. It was speculated that the 2DEG at the AlGaAs/GaAs interface worked as an electron reservoir to the InAs dots. As a result, the conduction band between the dots and 2DEG is lowered, and thus the thermal activation energy of PL is lowered. It was concluded that in this way the optical properties of the InAs quantum dots could be tailored for optical applications.     

Gate capacitance—Voltage characteristic of MODFET's: Its effect on transconductance

Gate capacitance Cgin modulation-doped field-effect transistors (MODFET's) is one of the most important parameters for small- and large-signal applications as well as for understanding device operation at dc and high frequencies. We have modeled the gate capacitance-voltage characteristics of AlGaAs/GaAs MODFET's and obtained good agreement with experiments at 300 and 77 K. Rigorous numerical simulations relating the Fermi level at the GaAs/AlGaAs heterointerface to the two-dimensional electron gas (2DEG) concentrations were fitted with analytical functions to simplify the model. The fit is quite reasonable with an accuracy of 1 percent in a wide range of sheet carrier concentrations. By incorporating AlGaAs charge response to gate voltage near full turn-on, discrepancies between the experiments and earlier models (predicting a nearly constant capacitance-voltage characteristic) were minimized. The model also shows that theC_{g}(V)characteristic below threshold is governed by the doping level in the buffer layer, in the intermediate region by the 2DEG and near complete turn-on by the 2DEG and the AlGaAs layer. Considering the contribution of the AlGaAs layer, a detailed RC network was developed. The model also explains the rise in capacitance and fall in the transconductance for large forward gate voltages (low frequency) due basically to the contribution of AlGaAs to the gate capacitance but almost no contribution to the current conduction. In contrast, the transconductance and capacitance both increase in MESFET's.     

Nonlinear absorption properties of AlGaAs/GaAs multiple quantumwells grown by metalorganic chemical vapor deposition

The nonlinear absorption properties of the excitonic resonances associated with multiple quantum wells (MQWs) in AlGaAs/GaAs grown by metalorganic chemical vapor deposition are reported. The dependence of the saturation properties on growth parameters, especially growth temperature, and the well width are described. The minimum measured saturation intensity for these materials is 250 W/cm², the lowest reported value to date. The low saturation intensities are the result of excellent minority carrier properties. A systematic study of minority carrier lifetimes in quantum wells are reported. Lifetimes range from 50-350 ns depending on growth temperature and well width     

Characteristics study of 2DEG transport properties of AlGaN/GaN and AlGaAs/GaAs-based HEMT

Growth of wide bandgap material over narrow bandgap material, results into a two dimensional electron gas (2DEG) at the heterointerface due to the conduction band discontinuity. In this paper the 2DEG transport properties of AlGaN/GaN-based high electron mobility transistor (HEMT) is discussed and its effect on various characteristics such as 2DEG density, C-V characteristics and Sheet resistances for different mole fractions are presented. The obtained results are also compared with AlGaAs/GaAs-based HEMT for the same structural parameter as like AlGaN/GaN-based HEMT. The calculated results of electron sheet concentration as a function of the Al mole fraction are in excellent agreement with some experimental data available in the literature.     

Accurate modeling for parasitic source resistance intwo-dimensional electron gas field-effect transistors

An accurate two-layer model has been developed for parasitic source resistance in two-dimensional electron gas field-effect transistors (2DEGFETs). In this model, the 2DEG concentration-voltage and current density-voltage relations at the cap/barrier/2DEG junction are taken into account, based on the self-consistent charge control model and effective mass tunneling theory. Empirical 2DEG velocity field characteristics are also included. To show the feasibility of this method, the source resistance in conventional GaAs/AlGaAs 2DEGFETs was analyzed and the AlGaAs thickness dependence was discussed. For comparison, the lattice-matched GaInAs/AlInAs 2DEGFET and pseudomorphic GaInAs/AlGaAs 2DEGFET were examined. It was shown that introducing a highly doped cap layer leads to a drastic reduction in source resistance for pseudomorphic 2DEGFETs but has a very small effect for GaInAs/AlGaAs 2DEGFETs     

Theory of the doped quantum well superlattice APD: A new solid-state photomultiplier

A new superlattice avalanche photodiode structure consisting of repeated unit cells formed from a p-i-n Al0.45Ga0.55As region immediately followed by near intrinsic GaAs and Al0.45Ga0.55As layers is examined using an ensemble Monte Carlo calculation. The effects of various device parameters, such as the high-field layer width, GaAs well width, low-field AlGaAs layer width, and applied electric field on the electron and hole ionization coefficients is analyzed. In addition, the fraction of electrons which ionize in a spatially deterministic way, at the same place in each stage of the device, is determined. As is well known, completely noiseless amplification can be achieved if each electron ionizes in each stage of the device at precisely the same location while no holes ionize anywhere within the device. A comparison is made between the doped quantum well device and other existing superlattice APD's such as the quantum well and staircase APD's. It is seen that the doped quantum well device most nearly approximates photomultiplier-like behavior when applied to the GaAs/AlGaAs material system amongst the three devices. In addition, it is determined that none of the devices, when made from GaAs and AlGaAs, fully mimic ideal photomultiplier-like performance. As the fraction of electron ionizations per stage of the device is increased, through variations in the device geometry and applied electric field, the hole ionization rate invariably increases. It is expected that ideal performance can be more closely achieved in a material system in which the conduction band edge discontinuity is a greater fraction of the band gap energy in the narrow-band gap semiconductor.