应变GaInNAs/GaAs量子阱光增益特性研究

采用近似方法对GaInNAs材料的能带结构进行了分析,并计算了应变GaInNAs/GaAs量子阱能级,在此基础上进一步计算了应变GaInNAs/GaAs量子阱的材料光增益谱.对计算结果的分析表明,应变GaInNAs/GaAs量子阱材料是一种可以应用于1 300 nm波段的新型长波长半导体光电子材料.     

光抽运垂直外腔面发射激光器的增益特性数值模拟

为了深入研究光抽运垂直外腔面发射激光器的增益特性,以InGaAs/GaAs应变量子阱系统为例,建立了将带隙、带边不连续性计算和带结构计算系统结合起来的完整体系,考虑在应变影响下能带及波函数的混合效应。利用有限差分法对含6×6 Luttinger-Kohn哈密顿量的有效质量方程精确求解,得到了InGaAs/GaAs应变量子阱导带、价带的能带结构和包络函数,然后选用Lorentzian线形函数,数值模拟了量子阱的材料增益谱和自发辐射谱。最后讨论了阱宽、载流子浓度、温度等因素对量子阱材料增益的影响,为光抽运垂直外腔面发射激光器的优化设计提供了理论依据。     

GaAs/AIGaAs多量子阱子带间光跃迁的研究

随着分子束外延等技术的不断完善,半导体多量子阱结构和超晶格的制备、研究和应用受到相益广泛的重视。迄今研究得最多的是GaAs/AlGaAs材料。由窄带隙材料(例如GaAs)构成电子和空穴的势阱,而由宽带隙材料(例如AlGaAs)构成势垒。其势能曲线接近于周期方阱,即Kronig—Penney模型。     

量子点半导体光放大器的速率方程和增益特性

为了深入研究量子点半导体光放大器(QD-SOA)的特性,建立了量子点半导体光放大器子带导带的三能级系统模型.把系统载流子的速率方程与其他文献采用的速率方程进行了对比优化.通过数值计算得到了瞬态解,并得到载流子在放大器各能级态的浓度分布,验证了量子点中能级分立特性.利用电子和空穴各自的占有几率在基态成一定的线性关系,在稳态下对速率方程求解,得出了量子点半导体光放大器相关的增益特性,以及增益特性与基态电子的占有几率之间的关系.结果表明量子点半导体光放大器具有很高的饱和增益和微分增益,较低的阈值电流等特性.说明量子点半导体光放大器具有比其他体材料和量子阱光放大器更加优异的特性.为光放大器的设计提供了有力的理论指导.     

1.55μm张应变InGaAsP/InGaAsP量子阱偏振不灵敏半导体光放大器的优化设计

优化设计了1.55μm InGaAsP/InGaAsP张应变量子阱偏振不灵敏半导体光放大器的结构.利用k*p方法计算了多量子阱的价带结构,计算中考虑了6×6有效质量哈密顿量.从阱宽、应变、注入载流子密度等方面计算了量子阱模式增益的偏振相关性.     

单轴压应变量子阱红外探测器吸收波长的研究

研究了单轴压应力对GaAs/AlGaAs/GaAs量子阱红外探测器(QWIP)吸收波长的影响。以量子阱电子干涉方法以及单轴压应力作用下量子阱应变理论为基础,分析了GaAs/AlGaAs/GaAs量子阱导带中子能级与应变的关系。理论上计算了单轴应力下四个QWIP吸收波长与应变的关系。结果表明,E1与E<1>能级之间的吸收波长和E(1)与EF能级之间的吸收波长随应变的增大而减小的幅度比E1与EF能级之间的吸收波长和E(0)与E1能级之间吸收波长随应变的增大减小的幅度大。     

MBE生长高光功率转换效率InGaAs/GaAs/AlGaAs应变量子阱激光器

本文从理论上分析了实现InGaAs/GaAs/AlGaAs应变量子阱激光器高光功率转换效率、高输出功率的有效途径,并优化了器件结构,可以同时获得低的腔面光功率密度和小的垂直于结平面远场发散角.利用分子束外延生长构成了高质量InGaAs/GaAs/AlGaAs应变量子阱激光器,其最高光功率转换效率为53%、最大输出功率为3.7W,垂直于结平面方向远场发散角为30°     

MOCVD生长的高质量掺碳GaAs/AlGaAs材料的特性研究

利用低压金属有机化合物汽相淀积方法,以液态CCl4为掺杂源生长了高质量的碳掺杂GaAs/AlGaAs外延材料,研究了CCl4流量、生长温度和V/Ⅲ比等因素对外延材料中的碳掺杂水平的影响。采用电化学CV方法、范德堡霍耳方法、低温光致发光谱和X射线双晶衍射回摆曲线测量等方法对碳掺杂外延材料的电学、光学特性进行了研究。实验制备了空穴浓度高达1.9×1020cm-3的碳掺杂GaAs外延材料和低温光致发光谱半宽小于5nm的高质量碳掺杂Al03Ga0.7As外延层。在材料研究的基础上,我们以碳为P型掺杂剂生长了GaAs/A1GaAs/InGaAs应变量子阱980nm大功率半导体激光器结构,并获得了室温连续工作1W以上的光功率输出。     

GaAs (110)量子阱的电子自旋弛豫

采用固态源分子束外延的方法在GaAs(110)取向衬底上生长了GaAs/AlGaAs多量子阱结构.对样品进行了低温光致发光谱和时间分辨光致发光谱的测量,结果表明激发功率和激发波长对室温下量子阱内电子的自旋弛豫时间有强烈的影响.对于常见的GaAs(100)量子阱起支配作用的D'yakonov-Perel' (DP)自旋弛豫机制,在GaAs (110)量子阱材料里被充分地抑制了.对于缺失了DP相互作用的GaAs (110)多量子阱,电子-空穴相互作用对自旋弛豫时间随激发功率变化有重要的影响.     

GaAs/AlGaAs量子阱中电子浓度的自洽计算

应用波函数展开方法,自洽计算了调制掺杂AlGaAs/GaAs/AlGaAs量子阱中电势能分布、子能级位置、2DEG浓度分布和2DEG面浓度n_s,以及这些参数与量子阱宽度、不掺杂AlGaAs厚度等材料参数的关系.计算表明,量子阱中2DEG n_s比单异质结n_s大2倍左右,量子阱宽度在200-300A之间n_s有个最大值;量子阱太宽时,2DEG主要集中在两边异质结界面附近,变为双异质结.     

Theory of the doped quantum well superlattice APD: A new solid-state photomultiplier

A new superlattice avalanche photodiode structure consisting of repeated unit cells formed from a p-i-n Al0.45Ga0.55As region immediately followed by near intrinsic GaAs and Al0.45Ga0.55As layers is examined using an ensemble Monte Carlo calculation. The effects of various device parameters, such as the high-field layer width, GaAs well width, low-field AlGaAs layer width, and applied electric field on the electron and hole ionization coefficients is analyzed. In addition, the fraction of electrons which ionize in a spatially deterministic way, at the same place in each stage of the device, is determined. As is well known, completely noiseless amplification can be achieved if each electron ionizes in each stage of the device at precisely the same location while no holes ionize anywhere within the device. A comparison is made between the doped quantum well device and other existing superlattice APD's such as the quantum well and staircase APD's. It is seen that the doped quantum well device most nearly approximates photomultiplier-like behavior when applied to the GaAs/AlGaAs material system amongst the three devices. In addition, it is determined that none of the devices, when made from GaAs and AlGaAs, fully mimic ideal photomultiplier-like performance. As the fraction of electron ionizations per stage of the device is increased, through variations in the device geometry and applied electric field, the hole ionization rate invariably increases. It is expected that ideal performance can be more closely achieved in a material system in which the conduction band edge discontinuity is a greater fraction of the band gap energy in the narrow-band gap semiconductor.     

量子阱太赫兹探测材料设计与生长的研究*

子带跃迁的量子阱结构太赫兹探测器具有响应速度快等特点,有广泛的应用前景,越来越受到研究 人员的关注。以量子力学基本原理,量子阱结构材料光吸收的特性,以及光导型探测器暗电流分析为基础,进行了 量子阱厚度、势垒层Al 含量和量子阱掺杂浓度等参数的AlGaAs/ GaAs 量子阱太赫兹探测材料结构设计,按照优化 后的外延参数进行了材料生长,获得了符合设计要求的探测材料。     

剩余应变对半导体量子点边带能影响的数值分析

 从弹性力学的理论出发,导出了应变对量子点各边带能级影响改变量的表达式,以有限元法计算了量子点的应变;结合应变能改变量表达式给出了应变作用下各边带能改变量的变化曲线,指出应变使量子点导带级平行移动,且移动的数值只与材料的性质有关;应变作用下重空穴带和轻空穴带发生分裂,分裂的大小与材料的性质和量子点的形状都有关.     

Polarization-insensitive quantum-well semiconductor opticalamplifiers

Theoretical modeling and fabrication of polarization-insensitive semiconductor optical amplifiers that use a multi-quantum-well structure as the gain media are reported. Polarization insensitivity of gain is achieved through the introduction tensile strain into the quantum wells. Gain calculations, using the k·p method, were performed to obtain the required amount of tensile strain to obtain polarization insensitivity over a wide energy spectrum. Fabricated amplifiers show a polarization-insensitive (<1 dB) spectral width of 10 nm at 1300 nm in the InGaAsP/InP system, 15 nm at 1300 nm in the AlInGaAs/InP system, and 40 nm at 1550 nm in the AlInGaAs/InP system     

InGaAs/GaAs/AlGaAs应变量子阱激光器

优化设计了既能实现较小垂直方向远场发散角,又能降低腔面光功率密度的ＩｎＧａＡｓ／ＧａＡｓ／ＡｌＧａＡｓ应变层量子阱激光器,并计算了该结构激光器实现基横模工作的脊形波导结构参数。利用分子束外延生长了ＩｎＧａＡｓ／ＧａＡｓ／ＡｌＧａＡｓ应变量子阱激光器材料并研制出基横模输出功率大于１４０ｍＷ,激射波长为９８０ｎｍ的脊形波导应变量子阱激光器,其微分量子效率为０．８Ｗ／Ａ,垂直和平行结平面方向远场发散角分别为２８°和６．８°     

GaAs／AlGaAs多量子阱结构的热电子效应

采用低温荧光激发光谱研究了ＧａＡｓ／ＡｌＧａＡｓ多量子阱结构中热电子的驰豫过程，在ＰＬＥ谱中首次观察到ＧａＡｓ／ＡｌＧａＡｓ多量子阱中ＬＯ声子的发射，用四能带Ｋａｎｅ模型计算了由轻、重空穴杂化效应引起的价带结构的畸变及其对声子发射谱的影响，实验和理论计算结果均表明、光激发热电子可以通过发射ＬＯ声子直接弛豫到激子态上，实现热电子的冷却。     

Optical Properties of AlGaAs/GaAs Resonant Bragg Structure at the Second Quantum State

Photoluminescence, optical reflectance and electro-reflectance spectroscopies were employed to study an AlGaAs/GaAs multiple-quantum-well based resonant Bragg structure, which was designed to match optical Bragg resonance with the exciton-polariton resonance at the second quantum state in the GaAs quantum wells. The structure with 60 periods of AlGaAs/GaAs quantum wells was grown on a semi-insulating substrate by molecular beam epitaxy. Broad and enhanced optical and electro-reflectance features were observed when the Bragg resonance was tuned to the second quantum state of the GaAs quantum well excitons manifesting an enhancement of the light-matter interaction under double-resonance conditions. By applying an alternating electric field, we revealed electro-reflectance features related to the x(e2-hh2) and x(e2-hh1) excitons. The excitonic transition x(e2-hh1), which is prohibited at zero electric field, was allowed by a DC bias due to brake of symmetry and increased overlap of the electron and hole wave functions caused by electric field.