天线辐射特性计算

介绍了某雷达双反射面天线工程设计，采用Ansoft HFFS对馈源辐射特性进行仿真，获得较精确的初级方向图计算模型，应用等效面电流法和等效抛物面原理，获得反射面天线的次级方向图特性。给出了方向图特性计算值与实测结果的比较。     

一种宽频带圆锥波纹喇叭设计

设计了一种工作频带范围为22-30GHz 的圆锥波纹喇叭。通过电磁场仿真软件HFSS 对该天线进行仿真,计算了天线的驻波系数、交叉极化、增益方向图、相位中心等参数。计算结果表明,该波纹喇叭方向图对称性好、交叉极化低,可用作高性能反射面天线馈源。     

双反射面天线的和差方向图和增益计算

利用面电流法推导出了多模喇叭馈源照射时双反射面天线的方向图和增益计算公式，方向图计算包括了由馈源ＨＥ１１模激励的天线和方向图和由馈源ＨＥ２１模激励的天线差方向图两种形式；增益计算包括了口径利用系数、交叉极化损失和融反射面漏失等项内容，得到的结果与实测结果比较一致。     

天线的机电一体化分析方法

基于机电综合分析的思想,给出了变形反射面的变形函数描述,以及天线变形后的辐射场计算方法,并分析了变形反射面对天线辐射方向图的影响。最后,运用最优化方法计算出了馈源在最佳位置时天线的辐射方向图。     

焦面场分析与相控阵馈源设计

该文介绍了焦面场的计算方法及其与反射面焦径比的关系,分析了焦面场与馈源口径场的联系,并建立了基于焦面场分析进行相控阵馈源设计的方法,包括确定单元间距、阵列规模以及实现目标方向图所需要的激励.按照这一方法,分别以未赋形卡塞格伦天线和前馈抛物面天线为对象,设计了各自的相控阵馈源以实现赋形波束的效果,并在后者上验证了波束扫描性能.通过仿真,天线性能实现了预定目标,证明了设计方法的有效性.     

基于NURBS建模的椭圆波束赋形天线设计

基于非均匀有理B样条曲面建模,提出一种低剖面椭圆波束赋形天线设计方法。利用馈源喇叭的辐射方向图和主反射面口面场分布函数,对φ=0°面的主副反射面曲线赋形,计算任意φ平面的主副反射面赋形曲线,利用非均匀有理B样条曲面建模技术对主副反射面建模并用全波仿真软件进行仿真优化。仿真结果表明,用该方法设计的椭圆波束天线在12.5 GHz和14.5 GHz时效率分别为67.82％和65.38％,第一副瓣电平均小于-14 dB,该天线实现了低剖面和高效率的优良性能。     

双反射面天线偏焦问题的解决方法分析

大型双反射面天线理论焦点和天线变形曲面最佳吻合反射面新焦点不重合,会造成天线偏焦而导致天线性能恶化的问题。通过对横向偏焦的分析,推导出了馈源横向偏焦的表达式,对馈源横向偏焦量对天线性能的影响进行了分析,提出了寻找新的吻合面和偏转副反射面的2种解决偏焦问题的方法,并以65 m天线为例分别进行了仿真计算,仿真结果表明这2种方法能够很好地解决这一问题。     

考虑馈源位置误差的面天线机电耦合优化设计

 针对面天线结构设计中存在的机电分离以及忽视馈源位置误差的问题,从机械电磁两场耦合的角度,将反射面天线主面误差和馈源位置误差统一到天线方向图的远场计算公式中,从而可以研究包含馈源支撑结构在内的天线结构参数对主要电性能（包括增益、副瓣、波瓣宽度、指向精度等）的影响。利用该公式建立了包含馈源支撑结构参数的天线整体机电耦合优化模型,通过某8米天线的仿真对比表明了该耦合优化模型的优点,最后将该优化模型应用于某40米大型反射面天线,取得了满意的效果。     

W 波段反射面天线波导馈源赋形设计

研究了一种W 波段反射面天线波导馈源赋形设计方法。在特殊的馈源前置前提下,通过加载介质透镜的办法实 现了对天线馈源的赋形设计。并利用Ansoft HFSS 电磁仿真软件进行分析,得出透镜在不同介电常数、厚度及形状的条 件下对馈源方向图的影响结果。综合仿真结果表明,宜采用介电常数低、厚度较薄的透镜结构。     

反射面天线馈源相位中心的研究

本文提出了任意形状反射面天线馈源相位中心的定义和提高变形反射面天线电气性能的方法,并将其应用于某8米天线的实际计算,取得了满意的结果。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.