神经网络在空空导弹自动驾驶仪中的应用

研究了神经网络模型预测控制在导弹自动驾驶仪中的应用.针对导弹飞行动态的不确定性和非线性,采用了近年发展起来的神经网络控制,在模型未知的情况下,有效地实现了导弹的飞行控制.并应用MATLAB进行论证,显示了神经网络控制方法在空空导弹应用上的广泛性.     

人工智能技术在电气自动化控制中的应用分析

人工智能技术的应用,简化了电气自动化控制的设计,同时也提高了控制的水平,满足电气自动化的需求。电气自动化控制内,积极推进人工智能技术的应用,同时体现人工智能技术的实践应用,逐步改善其在电气自动化的控制状态,弥补技术缺陷。本文重点分析人工智能技术,分析其在电气自动化控制中的应用。     

PLC控制在电厂化学水处理系统中的应用研究

本文对电厂化学水处理系统及PLC控制进行了简单介绍,阐述了PLC控制在在电厂化学水处理系统中的应用特点,最后提出了PLC控制在电厂化学水处理中的具体应用,以供参考.     

WiFi传输技术在控制领域的应用探讨

在对WiFi无线传输技术的发展过程和WiFi的使用方法进行讨论的基础上,分析了WiFi技术的应用特点。通过对WiFi在控制领域中的应用所需基本条件的研究,指出WiFi无线覆盖和具有WiFi模块的终端设备的普及应用,是构成WiFi传输技术在控制领域应用的关键。最后通过应用事例进一步探讨了WiFi应用于控制领域将带来的社会影响。研究认为,WiFi在控制领域的推广应用必将为人们带来更多的便利。     

基于云服务实现智能家居应用控制的方案

智能家居设备如何接入网络,智能控制终端如何控制智能家居设备,智能家居设备及应用管理平台如何对用户和设备进行管理,这些问题的解决方案伴随着智能家居应用的快速发展不断变化。首先讨论了智能家居业务的应用控制方式,然后引出应用控制的关键逻辑分层结构,在关键逻辑分层结构的基础上,讨论基于云服务的应用控制方案,最后给出总结。     

真空控制系统的发展现状

主要介绍真空应用设备中可视化界面控制的发展概况.回顾了真空控制系统的发展历程,以几个典型界面为例,介绍了国内外有关真空设备可视化界面控制发展概况,分析了其控制特点,并对真空应用系统可视化控制界面的未来发展提出了自己的看法.     

探析工业自动化控制中计算机控制技术应用路径

将计算机控制技术应用在工业自动化控制中能够显著提高工业自动化控制的水平和质量,同时能够较好地实现工业生产和发展的相关战略目标。我国已经进入了信息化时代,计算机技术应用在工业自动化控制中的范围逐渐扩大,且取得了良好的应用效果。因此应该重视将计算机控制技术应用在工业自动化控制中,通过这种方式来提高我国的工业化水平,对实现工业企业的经济效益和社会效益目标也能够起到良好的推动作用。本文主要针对工业自动化、计算机控制技术进行概述,计算机控制技术应用在工业自动化控制中的重要作用进行分析,进而提出一些计算机控制技术应用在工业自动化控制中的建议,旨在更好地推动工业自动化提高效率和质量,以供参考。     

PLC技术在电气自动化控制中的应用

文章对PLC技术进行了分析,包括PLC技术的组成结构、工作流程、应用优势与核心应用场景,充分论证了PLC技术的应用可行性。结合实际应用需要,阐述PLC技术在电气自动化控制项目中的实践应用方法,明确技术应用要点及注意事项。通过PLC技术的应用,能够实现自动化控制体系,PLC技术通过逻辑化分析处理输入信号,使其通过输出形式实现智能化控制,从而强化电气自动化控制能力。     

智能控制在中厚板控制冷却中的应用

本文深入研究了神经网络与模糊控制,再结合优化算法,将其应用到中厚板控制冷却系统中,进行模型辨识与参数估计,并对终冷温度进行控制,仿真结果表明了智能控制在中厚板控制冷却中应用的可行性。     

电气工程自动化控制智能技术的应用探讨

电气工程自动化控制中,智能化技术的应用能够提高自动化控制的水平,提高工作效率,降低工作强度,因此具有非常重要的意义。对智能技术应用的基础进行了介绍,阐述了电气工程自动化控制中智能技术的优势,对电气工程自动化控制中智能化技术的应用进行了较为详细探讨。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.