世界唯一的电子元器件质量评定体系--IECQ-CECC

2003年4月1日,IEC电子元器件质量评定体系(IECQ)与欧洲同类体系CECC按照计划实现了两个组织的聚合。现在IECQ-CECC体系是IEC下设的世界唯一的电子元器件质量评定体系,该体系可独立批准电子元器件制造商的全部系列产品。这种方法被称之为技术批准(Technology Approval),简称为TA。独立的技术批准(TA)体系给电子元器件制造商和使用电子元器件的采购方/用户带来的最大好处就是降低电子元器件的费用。特别对采购方而言,对制造商的评估和对入厂的每一种电子元器件类型的质量检查迄今仍在不断地增加时间消耗和沉重的费用负担。按照要…     

航天产品电子元器件的可靠性控制

主要阐述了航天产品元器件可靠性控制的目的和重要意义;归纳和总结了航天产品研制过程中发现的主要问题;根据电子元器件的质量保证流程,从元器件保证大纲、元器件的合理选用、元器件采购与库存管理、元器件的监制、试验和验收、补充筛选、DPA(破坏性物理分析)、元器件的装机控制、元器件的失效分析方法、元器件质量信息的管理等方面对航天产品电子元器件的可靠性控制提出了明确的质量保证要求。     

国内外电子元器件质量等级体系研究

质量等级是电子元器件设计选择、采购验收、筛选和检验的重要依据,是影响元器件使用可靠性的重要因素之一。全面、深入地剖析了国内外电子元器件生产保证与可靠性预计的两种质量等级体系,给出了国内外详细的质量等级标识及对应关系．并对当今使用中存在的常见误区进行了更正说明。     

军用电子产品中电子元器件的质量控制

电子元器件是电子产品的最基本单元,没有可靠的元器件就不可能有高可靠的电子产品。本文从电子元器件的选用、采购、检验、电装、调试、元器件失效分析以及建立元器件质量数据库几个方面阐述元器件的质量控制。     

电子元器件可信供货商认定活动发布会暨首批电子元器件可信供货商颁证仪式在人民大会堂隆重举行

由中国电子质量管理协会和中国电子企业协会采购分会联合主办的“电子元器件可信供货商”认定活动发布会暨首批电子元器件可信供货商（RECS）颁证仪式，于2008年1月18日上午在人民大会堂隆重举行。     

全球电子元器件在线采购正式启动

千禧年的四月末,随着“‘中电网’全球电子元器件在线采购正式启动”新闻发布会的召开,在中国又出现了一种崭新的服务项目——全球电子元器件在线采购。此项目是继1月18日开通中国电子元器件信息交易网后,经过数月酝酿,逐步臻于成熟的。 “全球电子元器件在线采购”将依托“中电网”在北美、新加坡、中国大量的供货渠道以及拥有包括世界顶     

“分会”会员申请入会及免费索取本刊的填表说明

中国电子企业协会采购分会（简称CEPA）由信息产业部主管，隶属于中国电子企业协会，是由中国境内从事电子元器件采购与销售的单位以及其它相关企事业单位在自愿的基础上组成的全国性的非营利社会团体。其会员分为个人会员和团体会员，由全国电子整机企业及其广大采购人员组成。     

“分会”会员申请入会及免费索取本刊的填表说明

中国电子企业协会采购分会（简称CEPA）由信息产业部主管，隶属于中国电子企业协会，是由中国境内从事电子元器件采购与销售的单位以及其它相关企事业单位在自愿的基础上组成的全国性的非营利社会团体。其会员分为个人会员和团体会员，由全国电子整机企业及其广大采购人员组成。     

“分会”会员申请入会及免费索取本刊的填表说明

中国电子企业协会采购分会（简称CEPA）由信息产业部主管，隶属于中国电子企业协会，是由中国境内从事电子元器件采购与销售的单位以及其它相关企事业单位在自愿的基础上组成的全国性的非营利社会团体。其会员分为个人会员和团体会员，由全国电子整机企业及其广大采购人员组成。     

“分会”会员申请入会及免费索取本刊的填表说明

中国电子企业协会采购分会（简称CEPA）由信息产业部主管，隶属于中国电子企业协会，是由中国境内从事电子元器件采购与销售的单位以及其它相关企事业单位在自愿的基础上组成的全国性的非营利社会团体。其会员分为个人会员和团体会员，由全国电子整机企业及其广大采购人员组成。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.