共查询到19条相似文献,搜索用时 656 毫秒
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在n-型掺杂弱耦合GaAs/AlAs超晶格中,沿着垂直于超晶格平面方向加一个静态磁场,研究电子的隧穿过程.随着磁场的增加,相邻量子阱基态间的隧穿电流增加.这是由于磁场导致电子的隧穿机制发生了变化,即由低磁场下电子的非共振隧穿或跳跃电导向高磁场下电子的共振隧穿的转变. 相似文献
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在n-型掺杂弱耦合GaAs/AlAs超晶格中,沿着垂直于超晶格平面方向加一个静态磁场,研究电子的隧穿过程.随着磁场的增加,相邻量子阱基态间的隧穿电流增加.这是由于磁场导致电子的隧穿机制发生了变化,即由低磁场下电子的非共振隧穿或跳跃电导向高磁场下电子的共振隧穿的转变. 相似文献
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文中通过求解薛定谔方程得到抛物型形量子阱的变换矩阵与透射系数。利用这一结果计算透射系数可以达到任意高的精度,最后,讨论了结构变化对抛物型量子阱的共振隧穿的影响。 相似文献
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GeSi/Si共振隧穿二极管主要包括空穴型GeSi/SiRTD、应力型GeSi/SiRTD和GeSi/Si带间共振隧穿二极管三种结构。着重讨论了后两种GeSi/Si基RTD结构;指出GeSi/Si异质结的能带偏差主要发生在二者价带之间(即ΔEv>ΔEc),形成的电子势阱很浅,因此适用于空穴型RTD的研制;n型带内RTD只有通过应力Si或应力GeSi来实现,这种应力型RTD为带内RTD的主要结构;而带间GeSi/SiRITD则将成为更有应用前景的、性能较好的GeSi/SiRTD器件结构。 相似文献
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AlAs/GaAs/In0.1Ga0.9As/GaAs/AlAs double-barrier resonant tunneling diodes(DBRTDs) grown on a semi-insulated GaAs substrate with molecular beam epitaxy is demonstrated.By sandwiching the In0.1Ga0.9As layer between GaAs layers,potential wells beside the two sides of barrier are deepened,resulting in an increase of the peak-to-valley current ratio (PVCR) and a peak current density.A special shape of collector is designed in order to reduce contact resistance and non-uniformity of the current;as a result the total current density in the device is increased.The use of thin barriers is also helpful for the improvement of the PVCR and the peak current density in DBRTDs.The devices exhibit a maximum PVCR of 13.98 and a peak current density of 89kA/cm2 at room temperature. 相似文献
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Stability criteria for resonant tunneling diodes are investigated. Details of how extrinsic elements, such as series inductance and parallel capacitance, affect the stability are presented. A GaAs/AlAs/InGaAs/AlAs/GaAs double-barrier diode is investigated, showing the effect of different modes of low-frequency oscillation and the extrinsic circuit required for stabilization. The effect of device stabilization on high-frequency power generation is described. The main conclusions of the paper are: (1) stable resonant tunneling diode operation is difficult to obtain, and (2) the circuit and device conditions required for stable operation greatly reduce the amount of power that can be produced by these devices 相似文献
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The GaAs/InAs high-strain resonant interband tunneling diodes (HSRITDs) have been implemented by metal organic chemical vapor deposition (MOCVD). The current-voltage characteristics of variable quantum well and barrier thickness grown on (1 1 1) GaAs substrates are investigated. Experimental results reveal that the quantum barrier and well layer will influence current-voltage properties such as the peak current density, valley current density, and peak-to-valley current ratio (PVCR). Both peak current and valley current density decrease with increasing layers width. This result also exhibits the variation of PVCR with layers width. 相似文献
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Fabrication of an AlAs/In0.53Ga0.47As/InAs Resonant Tunneling Diode on InP Substrate for High-Speed Circuit Applications 总被引:2,自引:2,他引:0
在InP衬底上采用感应耦合等离子体刻蚀技术制备了高性能的AlAs/In0.53Ga0.47As/InAs共振隧穿二极管.正向偏压下PVCR=7.57,Jp=39.08kA/cm2;反向偏压下PVCR=7.93,Jp=34.56kA/cm2.在未去除测试电极和引线等寄生参数影响下,面积为5μm×5μm的RTD的阻性截止频率为18.75GHz.最后对非对称的I-V特性进行了分析讨论. 相似文献
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We report on GaAs/AlAs triple-barrier quantum well intraband (TBQWI) heterostructures grown by molecular beam epitaxy (MBE) on n+ GaAs substrate. Heterostructure quality was evaluated by X-ray diffraction and photoluminescence spectrum measurements. The position of the broad peak near 65.84° corresponds well to the diffraction from the (4 0 0) face of AlAs layers assuming intensity of total AlAs spacers and barriers. The 10K photoluminescence (PL) data has a strong peak at 8140 Å. The PL spectrum is dominated by a sharp peak centered at the emission energy of 1.52 eV attributed to the energy of e1-hh bond exciton of GaAs layer. TBQWI heterostructures were grown and processed into resonant tunneling diode (RTD). Room temperature electrical measurement of the TBQWI RTD yielded maximum peak to valley current ratio (PVCR) of 120 with peak current density (Jp) of 2.1 kA/cm2. The high PVCR of this GaAs/AlAs TBQWI RTD is, to the better of our knowledge, one of the higher PVCRs obtained in any intraband tunnel device. 相似文献
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对基于Top-Down加工技术的纳米电子器件如:单电子器件、共振器件、分子电子器件等的研究现状、面临的主要挑战等进行了讨论. 采用CMOS兼容的工艺成功地研制出单电子器件,观察到明显的库仑阻塞效应;在半绝缘GaAs衬底上制作了AlAs/GaAs/In0.1Ga0.9As/GaAs/AlAs双势垒共振隧穿二极管,采用环型集电极和薄势垒结构研制的共振隧穿器件,在室温下测得其峰谷电流比高达13.98,峰电流密度大于89kA/cm2;概述了交叉阵列的分子存储器的研究进展. 相似文献
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带间共振隧穿二极管(RITD)是导带与价带间发生共振隧穿的两端器件,其特点是启始电压VT和峰值电压Vp较低,电流峰谷比PVCR较大。在导出RITD物理模型和其电流密度方程的基础上重点介绍了InAs/AlSb/GaSbⅡ类异质结RITD、n+InAlAs/InGaAs/InAlAs/In-GaAs/p+InAlAsp-n结双势阱Ⅰ类RITD以及δ掺杂RITD三种RITD的器件结构、材料结构、工作原理、器件特性和参数等,并对这三种RITD的特点进行了比较和讨论。 相似文献