云原生通信大数据平台安全与隐私保护研究

文章首先介绍了云原生通信大数据平台的研究背景和意义,明确了当前国内外研究的现状。接着,对云原生架构及其特点进行了概述,并阐述了通信大数据平台的概念和作用。此外,还探讨了云原生通信大数据平台所面临的机遇和挑战。在安全问题分析部分,针对云原生通信大数据平台可能面临的安全威胁进行了分析,并提出了相应的安全保护机制和措施。针对隐私保护问题,进行了隐私保护需求分析和隐私保护技术研究。文章的研究成果对于提升云原生通信大数据平台的安全性和隐私保护能力具有重要的意义。     

云存储中的数据安全研究

由于社会分工和资源共享的必然,公共云平台必将成为和电网、互联网等同等重要的国家基础设施。云计算面临的安全问题制约着云计算的广泛使用,数据安全在云计算中尤为重要,保证数据的安全性是云计算安全的核心。文章从数据的完整性检查、数据的加密存储、数据访问权限控制以及云数据的安全删除等方面,对已有研究工作进行了分类和总结,为后续云计算中数据的安全性研究提供参照。     

基于云平台构建的数据安全保护技术及策略

云平台作为信息技术变革的热点,能赋予用户和互联网资源在交互层面上更多的移动性。目前,数据计算和数据存储已成为云平台建设的核心,这为人们的工作、生活以及社会经济发展做出了重要的贡献。然而,在云平台建设加速的背景下,与之相关的数据信息安全问题也层出不穷,越来越多的人开始重视云平台数据安全。文章通过分析大数据背景下云平台建设所面临的问题和挑战,提出云平台数据安全体系架构需解决的几大问题,并在此研究基础上,总结出基于云平台的数据安全策略,以期为相关人士提供参考。     

电信云业务运营平台安全研究

随着电信云技术的迅速发展及普遍应用,用户数据资源被盗用等信息安全问题日益凸显,电信云业务运营安全受到广泛关注,研究基于电信云的业务运营平台安全解决方案,提供用户信息安全、用户数据防盗的业务运营能力,具要重要的现实意义。文章通过分析现有基于电信云业务运营平台的不足,研究基于电信云的业务运营平台安全解决方案,提出基于电信云的业务运营平台安全系统技术架构,并进一步预测基于电信云业务运营平台安全解决方案的未来发展趋势。     

一种云教育平台下移动学习内不可信任数据的特征提取方法

通过云教育平台的移动学习我们发现有些数据的可信度较低,不利于学习的展开,因此对这种不可信任数据的特征提取方法就显得十分重要。文章提出云教育平台下移动学习内不可信任数据的特征提取方法,在云教育平台的框架下分析和研究移动学习内不可信任数据的构成特点,并针对这些数据进行基本统计处理并分析数据的波动趋势,实现对不可信任数据的特征提取。     

云计算环境网络空间安全思考

探讨云计算环境的网络空间安全问题。首先分析了云计算的技术特点;然后从云基础设施、云平台、云服务以及以大数据为代表的云应用四个方面研究了云计算可能存在的安全隐患,特别针对云平台虚拟化实现和管理中固有的局限,分析了由此可能遭受的网络攻击;最后提出以云的方式对云计算实施安全增强的设计框架。     

云存储技术及其应用研究

云计算是一种新的网络应用模式,云存储是一个以数据存储和管理为核心的云计算系统。阐述云计算与云存储的原理及应用特点,设计一种基于云存储的高校智慧教学环境——云教学平台,分析该平台的原理、特点等。     

探讨一种虚拟化环境下采用的微代理防病毒方案

在云计算技术发展迅速的今天,建设云平台已经成为许多IT解决方案中的一种主流方案,而在一个云平台的建设过程中,要考虑的安全问题也非常广泛,包括物理设施安全、网络安全、平台安全、数据安全、等级保护等多个内容。而病毒防护则是其中一个重要的方面,文章主要介绍一种在云计算虚拟化环境中采用的防病毒方案。     

一种海量军事信息的数据云管理系统

采用云计算的思想与技术平台,针对军事数据海量和异构的特点,研究了网络环境下跨域、异构、动态、海量数据组织与服务提供等关键技术,构建了对海量军事数据云存储的管理系统.测试结果表明,该系统能较好地解决海量军事数据云的分布式存储、透明访问和并发处理等问题,为民用技术在军事上的应用进行了有益的探索.     

基于虚拟资源自动化交付的云存储平台的设计与实现

随着计算机技术的飞速发展,人们已经全面进入互联网时代。数据化存储、多人资源共享已经成为现代信息传播的重要方式,但云存储平台的安全性一直令广大用户担忧。同时,云存储平台还存在数据隐私、性能不足等问题。文中提出了一种基于虚拟资源自动化交付的云存储平台,应用了虚拟资源自动化交互技术,以确保数据在传输和存储时的安全性与隐私性,满足了用户的性能需求。该设计将服务器、存储和网络虚拟化,选择了云存储的技术栈,设计了云存储的体系结构,并实施了数据加密与故障恢复策略。针对云存储平台的设计与实现,文中通过开源云存储平台,利用开源虚拟化技术搭建了云存储平台架构,最后对该云存储平台进行了测试。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.