矽感GM二维条码成为国际标准

近日,国际标准组织AIM global（全球自动识别和移动技术协会）正式批准中国矽感科技公司的网格矩阵码（简称GM码）二维条码为国际标准。这是我国所取得的第一个条码行业的国际码制技术标准,填补了我国在该领域的空白。     

二维条码自主知识产权标准亟待推广应用

2006年5月25日，信息产业部正式颁布了SJ／T 11349—2006《二维条码网格矩阵码》（GM码）和SJ／T 11350—2006《二维条码紧密矩阵码》（CM码）两项推荐性行业标准，并于5月30日开始实施。它的颁布填补了中国自主知识产权二维条码标准的空白。     

汉信码

汉信码是一种矩阵式二维条码,它具有汉字编码能力强、抗污损、抗畸变、信息容量大等特点,是一种十分适合在中国广泛应用的二维条码,具有广阔的市场前景. 由中国物品编码中心完成的国家"十五"重大科技专项--<二维条码新码制开发与关键技术标准研究>取得了突破性成果,研究成果包括:研究开发汉信码新码制、开发汉信码生成软件、开发汉信码识读技术及算法、汉信码硬件设备研发、汉信码装备研制、汉信码通讯技术研发以及编制汉信码国家标准等的系列工作.     

二维码

二维码也叫二维条码或二维条形码,二维条码／二维码（2－dimensional bar code）是用某种特定的几何图形按一定规律在平面（二维方向上）分布的黑白相间的图形记录数据符号信息的：在代码编制上巧妙地利用构成计算机内部逻辑基础的“0”、“1”比特流的概念,使用若干个与二进制相对应的几何形体未表示文字数值信息,     

二维码

二维码也叫二维条码或二维条形码,二维条码／二维码（2－dimensional bar code）是用某种特定的几何图形按一定规律在平面（二维方向上）分布的黑白相间的图形记录数据符号信息的：在代码编制上巧妙地利用构成计算机内部逻辑基础的“0”、“1”比特流的概念,使用若干个与二进制相对应的几何形体未表示文字数值信息,     

基于手机的二维条码识读系统研究与开发

为了有效开展手机的二维条码业务,研究并设计一种可嵌入各类手机平台的通用型二维条码识读软件系统。选用完全开放的QR（Quick Response）码作为识读的二维码型,规避了国际专利追偿风险。采用一种高效的低复杂度图像预处理算法,并根据这种解码算法,利用VC＋＋编程开发出QR码识读软件,先在PC机的Windows XP下进行测试;将代码优化后,再嵌入Symbian手机软件平台测试。测试结果表明,这种二维条码识读软件在复杂环境条件下有良好的识别率,识别时间也较短,可满足实时性要求。     

QR码图像处理及识别算法的研究

随着信息技术的发展,二维条码技术的应用越来越广泛。QR码作为一种优秀的二维条码,在我国有特别的发展优势。首先本文系统地介绍了QR码的概念以及优势。最后重点的介绍了在各种可能的噪声存在的情况下,讨论了对QR码数字图像处理和识别软件的算法。     

广西联通开发“联通名片录”

汉信码是一种矩阵式二维条码，它具有汉字编码能力强、抗污损、抗畸变、信息容量大等特点，是一种十分适合在中国广泛应用的二维条码，具有广阔的市场前景。     

基于IBE的二维码加密技术的研究与实现

二维码加密是证件防伪和信息保护领域的研究热点。将二维条码和加密技术相结合,能有效提高二维条码的安全性和保密性。文章以QR码为例,运用基于身份的加密算法实现了QR码的加密,具有高安全保密性和实际推广价值。     

基于嵌入式系统的二维条码数据采集器

本文设计了一种基于Intel XScale PXA255硬件平台和嵌入式操作系统WinCE的二维条码数据采集器,可以有效地进行二维条码信息的译码.将应用程序分解成多任务,简化了应用系统软件设计.使用CMOS数字图像传感芯片,获取二维条码的原始图像,再由硬件平台中的图像处理程序对图像数据进行处理,然后在条码中定位单个码字符号的图像,利用算法识别出单个码字符号.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.