EHR系统中报表分析技术的应用

为了提高人力资源管理的效率和水平,EHR系统在唐钢得到了广泛的应用,而在人力资源管理中的数据分析又是至关重要的一个环节,本文介绍了EHR系统中报表分析技术的应用。根据人事、劳资等业务需要,完成各级单位各个部门的数据分析工作,为企业的战略、决策和分析提供依据。     

基于情景和偏好的CPCE模型对电信绿色供应商评价研究

将决策者的风险偏好和情景依赖相结合,构建电信设备制造企业绿色供应商CPCE（基于决策偏好和情景依赖的交叉效率数据评估）评价模型。在该模型中,根据决策情景设定DEA（数据包络分析）有效前沿面,依据有效前沿面的边界值设定参考点,引入吸引值和改进值对决策单元进行综合评价。通过案例分析,将该评价方法应用到某电信设备制造企业绿色供应商评价中,与传统DEA评价效果对比。     

卫星转发器市场的数学模型及仿真分析（上）

做决策的过程就是处理未来情景中所固有的不确定性的过程。 没有人可以准确地预测未来,但是将未来的不确定性进行准确地数学描述是可以做到的,例如没有人会准确的预知明天是否会下雨,但是根据各种天气数据进行分析,得出明天的降雨概率甚至是降雨概率的分布区间是可以做到的。     

互联网背景下的企业智能支持决策系统

文章研究了互联网背景下的企业智能支持决策系统。决策是每个人都会面临的问题。复杂多变的社会环境,激烈的市场竞争力,使企业管理者、经营者和政府面对着越来越复杂的决策问题。而互联网技术的飞速发展,对现代企业的管理产生了划时代的影响。随着互联网中的各种信息在企业当中的应用,企业将会收集更多关于客户、产品、包括销售情况在内的种种信息,并通过互联网技术分析此类信息对企业管理的影响,来帮助各个企业更准确地预测现状和把握未来。     

电子信息技术研发项目投资决策中的实物期权应用

"十二五"规划中明确提出,战略新兴产业是国家未来重点扶持的对象,而新一代电子信息技术又是其中的重中之重。目前,我国电子信息技术发展水平相对世界发达国家较为落后,要实现"十二五"规划发展目标,企业需要加大对核心关键技术、共性技术等的研发投入力度。电子技术研发项目具有技术和市场不确定性的特点,鉴于传统的项目决策方法在电子信息技术研发项目决策中的局限性,本文针对其项目投资特性,应用实物期权方法构建了更具科学性和适用性的电子信息项目投资决策分析框架。     

论竞争环境中的企业信息工作

信息是实现有效管理的必要条件，特别是在市场经济环境下，信息已经成为企业管理和决策的至关重要的资源要素，在企业发展中的作用日益重要。文中分析信息工作在电信企业管理和决策中的作用，探讨应如何做好电信企业的信息工作。     

计算机技术在现代企业决策中的应用研究

计算机技术在现代企业决策中具有重要的应用价值,通过使用大数据技术、神经网络、云计算等技术,可以提高企业决策的效率和准确性。文章通过分析现代企业决策面临的挑战以及计算机技术为其带来的机遇,阐述计算机技术在企业决策中的相关应用,进而对基于计算机技术的现代企业决策系统的构建思路进行探讨。     

数据挖掘与现代企业的商务智能

二十世纪九十年代之后，以信息技术、计算机和网络技术等高新技术发展为标志，商业信息化得到了前所未有的发展。商业企业在信息平台和网络建设上投入了大量财力和物力，从而改善了信息存储、交互和管理的效率。企业为实现差异化竞争能力和可持续发展能力，就必须发挥出信息资源在企业决策上的支持作用，增强企业内部对市场的判断力，     

决策支持在邮电行业的应用

决策支持在邮电行业的应用１决策支持概述决策是领导者的基本职能，无论是行政管理、科技管理或是企业的经营管理活动，都贯穿着一系列决策。科学地进行决策是保证社会、政治、经济、文化、科教卫生等工作顺利发展的重要条件，也是领导水平的重要标志。决策是随着人类社会...     

一种电网规划方案决策的灵敏度分析算法

方案决策中的不确定因素越来越多,对决策结果在不确定环境下的灵敏度分析显得尤为重要。传统灵敏度分析方法常常忽略不确定性或只是简单平均将导致规划方案决策的偏差甚至错误。针对上述问题,提出一种基于概率盒理论的削减分析算法,首先对不确定性变量进行概率盒建模,其次将各指标概率盒输入决策方程计算并得到决策基数,然后依据决策基数对方案中各指标逐一消减,并计算得到其灵敏度。最后将该方法应用于电网规划方案决策中,实验结果表明该方法具有较强的实用性。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.