基于自适应遗传算法的摆镜动态优化设计

为了满足正弦摆动过程中较高面型精度,实现相关跟踪系统摆镜的高度轻量化设计,在直径110 mm圆平面反射镜的设计过程中引入了基于自适应遗传算法的摆镜结构优化。对背部粘结支撑点的大小进行了计算,同时对摆镜的有限元模型进行了轴对称的简化,提高了优化过程中的效率。介绍了自适应遗传算法结构优化的原理及优越性,并提出了两种正弦振动过程中的面型求解方案。最后将自适应遗传算法的结果与传统算法进行了比较。结果证明,基于自适应遗传算法的摆镜动态参数优化方案正确可靠,具有较高的寻优能力,对类似工程结构参数优化具有一定的指导性与借鉴性。     

大口径反射镜水平集拓扑优化设计

为了设计适用于空间望远镜的具有质量轻、刚度高、高面形精度特点的大尺寸反射镜,提出了基于水平集方法的反射镜拓扑优化设计方法。首先,在口径1 m反射镜镜体初始结构模型的基础上建立有限元模型,基于SIGFIT采用DRESP2建立面形RMS的目标响应函数,将镜面面形精度直接作为目标函数,在重量约束条件下,基于变密度算法与水平集拓扑方法分别进行优化设计,并基于OSSmooth功能对设计结果分离阈值进行研究。通过对优化模型分离阈值进行分析,得到最优化的输出结构模型。采用水平集方法的拓扑优化设计方法的中间密度单元格数目远小于变密度方法,输出结构边界连接性更好。优化模型面形RMS值小于/50（=632.8 nm）,满足设计指标。     

机载红外系统主反射镜的拓扑优化设计

反射镜轻量化设计一直是光机结构设计领域的一项挑战性课题。针对某机载红外光学系统的主反射镜,提出了一种基于SIMP拓扑优化方法的反射镜轻量化设计流程,建立了反射镜拓扑优化的数学模型,以最小化镜体自重和抛光载荷作用下的镜面矢高位移RMS值为优化目标,同时考虑对称约束和拔模约束,对反射镜进行了拓扑优化设计。根据拓扑优化结果设计了新的反射镜轻量化结构,并将其与传统结构进行了对比。采用拓扑优化方法设计的反射镜具有更高的轻量化率,同时能够获得较高的面形精度。     

空间天文仪器中的铍镜结构优化设计分析

为了满足空间太阳望远镜的技术要求,进行了铍摆镜研制,掌握了高精度铍镜研制技术路线。光学检测面形精度RMS为0.012λ,满足技术要求。对铍摆镜结构进行优化设计改进。介绍了铍摆镜结构优化方法,用ANSYS中的APDL语言编译了摆镜结构优化程序,进行了铍摆镜结构优化。并利用Matlab软件编写了改进遗传算法组合优化程序,再次完成了铍镜结构优化,并进行了横向对比分析。结果表明:两结果都满足技术要求。以扇形孔铍摆镜为例,改进的遗传算法组合方法的优化结果(RMS,1.470E-6mm)比ANSYS零阶优化方法的优化结果(RMS,2.099E-6mm)降低了29.96%,优于铍镜检测结果,说明改进后的摆镜结构方案可行。铍镜的成功研制,为我国空间天文仪器大口径铍镜研究和应用奠定了基础。组合优化方法结合了改进遗传算法和ANSYS软件的优势,具有适应性高、优化能力强等特点,具有较好的鲁棒性,对类似工程结构或天文仪器结构优化具有一定的借鉴意义。     

激光通信平背伺服摆镜支撑结构优化设计EI北大核心CSCD

为了保证平背伺服摆镜的镜面精度和支撑刚度,设计了一种周边柔性支撑的方案,通过对摆镜与镜座粘接处机械结构进行切口处理形成铰链结构,降低结构刚度,减小结构变形产生应力的影响。由于摆镜形状、粘接点位置、柔性支撑结构参数较多,并且相互耦合,首先采用正交实验法对摆镜主要参数进行分析与优化,确定摆镜形状尺寸参数和粘接点位置,随后优化设计摆镜柔性支撑结构。仿真分析和实验表明,采用该周边柔性支撑后,摆镜组件一阶频率为446.66 Hz,在±5℃温升(温降)和标准地球重力共同作用下,最大面形误差RMS为λ/42.87,能够满足动、静态刚度和热尺寸稳定性要求。随后使用ZYGO干涉仪在(23±5)℃温度范围内对加工装配后的摆镜面形进行检测,结果表明,摆镜面形PV值优于λ/5.1,RMS优于λ/43.28,满足RMS≤λ/40的指标要求。实验结果表明,柔性支撑参数设计可靠,满足使用要求。     

IP over WDM网络中一种新型虚拓扑构造算法

对IP over WDM的虚拓扑设计算法进行了研究，选择网络整体流量的均衡性作为优化目标，提出了一种新型的虚拓扑构造算法。在算法中，选择负载分布方差作为评价流量均衡性的指标，并给出其定义和计算方法。主要针对拥塞概率性能，在光层和IP层将提出的新型虚拓扑构造算法与其他算法进行比较。在光层的算法比较部分，选择负载均衡启发式路由算法（RLBH，routing with load balancing heuristics）与提出的算法进行比较；在IP层的算法比较部分，选择固定路径最小拥塞路由算法（FPLC，fixed-path least-congestion）与提出的算法进行比较，并对比较结果进行了讨论。比较结果显示在拥塞概率性能方面，提出的新型虚拓扑构造算法优于RLBH算法和FPLC算法。     

空间光学遥感器长圆形反射镜组件优化设计与分析

为了减轻空间光学遥感器反射镜的镜体质量,并降低反射镜在恶劣空间环境下的面形误差,利用有限元技术对某长圆形反射镜组件进行了优化设计。首先在反射镜进行轻量化后,对其进行支撑点位置优化和结构拓扑优化;其次对柔性支撑进行优化设计,引入了一种新型柔性铰链,解决了因背板热变形导致反射镜径向变形的问题,改善了反射镜面形精度。优化后的反射镜面形RMS 最大值为14.6 nm,小于/30（=632.8 nm）,一阶固有频率大于100 Hz,满足了设计要求,证明了该优化设计方法合理可行。     

基于MILP模型的光网络逻辑拓扑优化算法

网络逻辑拓扑的最优化是光网络的设计核心。针对分组业务的需要,要求光网络能够实时、动态调整网络的逻辑拓扑结构。对小规模的网络进行逻辑拓扑优化,可以用混合整数线性规划法(Mixed-Integer Linear Programming,MILP)解决。采用MILP算法对4节点网络进行逻辑拓扑优化设计仿真,首先设定约束条件并建立模型,以拥塞率最小化为目标函数做仿真实验,并对实验结果进行分析。     

基于Matlab的飞机机翼结构拓扑优化设计

为达到飞机机翼结构的最优设计要求,文中提出一种智能化的飞机机翼结构拓扑优化改进设计方法。该设计方法在经典的变密度法的基础上,选用RAMP模型作为材料插值模型,改进了相应的数学模型,最终提出了对飞机机翼结构进行优化的设计方法。文中使用Matlab语言对该设计方法进行了仿真验证,仿真结果证明了该设计方法的可行性和正确性。     

空间相机用摆镜的轻量化优化设计及其对像质的影响分析

提出了一种空间相机用摆镜轻量化优化设计方法,并对尺寸为360 mm×560 mm的空间相机用摆镜进行了轻量化优化设计。以镜体厚度、切角大小、镜面厚度和轻量化筋的厚度为设计变量,以最小重量为设计目标,以面形峰值(Peak Value,PV)和均方根值(Root-Mean-Square,RMS)不大于55 nm和11 nm为边界条件进行了优化,并将整体反射镜重量从初始模型的4kg减到了1.72 kg(其面密度为8.0 kg/m~2)。然后以微重力变形条件下的最小面形为目标,对轻量化处理后的反射镜进行了侧边支撑点位置优化,其面形PV为54 nm。采用有限元分析方法对反射镜在微重力、旋转惯性和温度载荷条件下的变形及反射镜模态进行了计算和校核,其结果均满足空间使用要求。最后采用光机热集成仿真方法对空间环境条件综合作用下产生的变形对像质的影响进行了分析。结果表明,由于该空间相机用摆镜产生变形,摆扫式光学遥感器系统的传递函数下降,在70 lp/mm处由设计值0.735降至0.703,相对降幅约为4.4%,满足设计要求。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.