自适应偏置的低噪声放大器设计与实现

低噪声放大器作为射频接收系统中的关键器件，其噪声系数与线性度影响整个系统的性能。本文基于0.25μm GaAs pHEMT工艺设计了一款应用于DC～3 GHz的低噪声放大器。放大器采用耗尽型晶体管构成自适应偏置电路提升低噪声放大器线性度，通过源极高Q值电感优化噪声系数。该低噪声放大器芯片的测试结果表明，与传统偏置结构的放大器相比，随着输入功率的增大，该电路具有良好的栅电压补偿功能，噪声系数比传统结构减小0.5 dB以上，相同工作电流下输出功率1 dB压缩点提高11 dB,相同射频输出功率下直流功耗减小40%以上。     

S 频段pHEMT 双通道低噪声放大器芯片的设计

采用GaAs 0.13μmp HEMT MMIC流片工艺设计和制作了一种S频段双通道低噪声放大器芯片,芯片内部集成了两个低噪声放大器通道、一级单刀双掷(SPDT)开关和一个晶体管-晶体管逻辑(TTL)电平转换电路。低噪声放大器电路采用一级共源共栅场效应管(Cascode FET)结构实现,使其具有比单管更高的增益,简化了芯片拓扑,降低了芯片设计难度。经流片测试,在1.9~2.1GHz的工作频带内,芯片噪声系数优于1.4dB,增益大于22.5dB,输入驻波优于1.8,输出驻波优于1.4,输出1dB压缩点(P1dB)为10dBm。大量芯片样本在片测试统计数据表明该低噪声放大器成品率大于90%,性能指标优于目前同类商业芯片指标。     

一种ISM 2.4GHz的低功耗低中频射频接收机前端

本文描述了一种工作在2.4GHz ISM频段的低功耗、低中频射频接收机前端电路,使用TSMC 0.13um CMOS工艺。整个前端包括一个低噪声放大器以及两次变频下变换混频器。低噪声放大器通过在输入级引入额外的栅-源电容实现了低功耗与低噪声的设计;在下变换混频器设计中,分别使用一个单平衡射频混频器以及两个双平衡低中频混频器实现两次变频下变换技术;射频混频器输入晶体管源极串联电感-电容谐振网络以及低噪声放大器输出级的电感-电容谐振网络总共实现了30dB的镜像抑制率。整个前端占用芯片面积约0.42mm2,在1.2V的供电电压下,仅耗功率4.5mW,实现了4dB的噪声系数,在高增益模式下,获得-22dBm的三阶交调线性度,整个链路电压增益为37dB。     

一种新型900MHz CMOS低噪声放大器的设计

对两种低噪声放大器(LNA)的构架进行了比较,详细推导了共源LNA的噪声系数与输入晶体管栅宽的关系及优化方法,设计了一种采用0.6 μ m标准CMOS工艺,工作于900MHz的新型差分低噪声放大器.在900MHz时,噪声系数为1.5 dB的情况下可提供22.5 dB的功率增益,-3dB带宽为1 50MHz,S11达到-38dB,消耗的电流为5mA.     

基于GaAs pHEMT的1.0～2.4 GHz放大衰减多功能芯片

基于0.25 μm GaAs赝高电子迁移晶体管(pHEMT)工艺,研制了一种1.0～2.4 GHz的放大衰减多功能芯片,该芯片具有低噪声、高线性度和增益可数控调节等特点。电路由第一级低噪声放大器、4位数控衰减器、第二级低噪声放大器依次级联构成,同时在片上集成了TTL驱动电路。为获得较大的增益和良好的线性度,两级低噪声放大器均采用共源共栅结构(Cascode)。测试结果表明,在1.0～2.4 GHz频带范围内,该芯片基态小信号增益约为36 dB,噪声系数小于1.8 dB,输出1 dB压缩点功率大于16 dBm,增益调节范围为15 dB,调节步进1 dB,衰减RMS误差小于0.3 dB,输入输出电压驻波比小于1.5。其中放大器采用单电源+5 V供电,静态电流小于110 mA,TTL驱动电路采用-5 V供电,静态功耗小于3 mA。整个芯片的尺寸为3.5 mm×1.5 mm×0.1 mm。     

基于ATF54143平衡式低噪声放大器的设计

基于低噪声放大器(LNA)的噪声系数和驻波比之间的矛盾,本文采用安捷伦公司的ATF54143晶体管计了一款工作于890～960 MHz平衡式低噪声放大器.该设计分为两部分:3 dB 90.相移定向耦合器和并联的低噪声放大器.本文中首先介绍LNA相关理论,然后通过安捷伦公司的ADS仿真软件进行电路仿真,仿真结果满足设计要求,达到了低噪声系数和良好地驻波比要求.此文也为后面电路的设计和调试提供了理论支持.     

一种高性能宽带直接变频射频前端设计

提出一种宽带(250 MHz~4.7 GHz)无电感BiCMOS射频前端结构,包含低噪声跨导放大器(LNTA)、带电阻无源混频器和跨阻级。低噪声跨导放大器使用了噪声和线性度消除技术,例如输入交叉耦合结构、互补输入和电流复用技术。带电阻无源混频器采用退化电阻来提高线性度。仿真结果表明, 当电源电压为3.3 V时,总电流为9.38 mA, 噪声系数为9.8 dB(SSB),电压转换增益为20 dB,输入3阶交调为+11.8 dBm。     

4～20GHz超宽带低噪声放大器单片电路

采用分布式放大器设计原理,基于GaAs PHEMT低噪声工艺技术,研制了一款超宽带低噪声放大器单片电路。该款放大器选用分布式拓扑结构,由五级电路构成,为了进一步提高分布式放大器的增益,在每一级又采用了两个场效应晶体管(FET)串联结构。放大器采用了自偏压单电源供电,因为每级有两个FET串联,自偏压电路更为复杂,通过多个电阻分压的方式确定了每个FET的工作点。测试结果表明,该放大器在频率4～20 GHz内,增益大于14 dB,噪声系数小于3.0 dB,增益平坦度小于±1.0 dB,输入驻波比小于1.5∶1,输出驻波比小于1.8∶1,1 dB压缩点输出功率大于10 dBm。放大器的工作电压为8 V,电流约为50 mA,芯片面积为2.0 mm×2.0 mm。     

S波段低噪声放大器的ADS仿真与设计

介绍低噪声放大器设计的理论基础,并重点介绍了低噪声放大器的主要性能指标:噪声系数、功率增益、驻波比、稳定性等。以ATF38143晶体管为例介绍了ADS仿真软件设计低噪声放大器的方法和主要步骤。采用三级级联结构设计出满足指标的S波段低噪声放大器链路。该放大器链路的指标为噪声系数小于1.2,功率增益大于50dB,增益平坦度小于0.5dB,VSWR小于1.8的低噪声放大器,带宽为6MHz,并具有一定的带外抑制能力。     

2～18 GHz GaAs超宽带低噪声放大器MMIC

基于90 nm GaAs赝配高电子迁移率晶体管(PHEMT)工艺设计并制备了一款2～18 GHz的超宽带低噪声放大器(LNA)单片微波集成电路(MMIC)。该款放大器具有两级共源共栅级联结构，通过负反馈实现了超宽带内的增益平坦设计。在共栅晶体管的栅极增加接地电容，提高了放大器的高频输出阻抗，进而拓宽了带宽，提高了高频增益，并降低了噪声。在片测试结果表明，在5 V单电源电压下，在2～18 GHz内该低噪声放大器小信号增益约为26.5 dB,增益平坦度小于±1 dB,1 dB压缩点输出功率大于13.5 dBm,噪声系数小于1.5 dB,输入、输出回波损耗均小于-10 dB,工作电流为100 mA,芯片面积为2 mm×1 mm。该超宽带低噪声放大器可应用于雷达接收机系统中，有利于接收机带宽、噪声系数和体积等的优化。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.