一种高精度过温保护电路的设计

基于UMC 0.25um BCD工艺,设计了一款高精度过温保护电路。通过基准电路中三极管的基极-发射极电压的负温度特性实现温度检测,调节电阻的比值产生迟滞温度量,避免了电路热振荡现象。经过HSPICE仿真验证,电路在温度130℃时,过温保护信号发生翻转,关断芯片,待温度降低到99℃时再次开启,具有31℃迟滞量。在电源电压变化时,过温保护电路的过温阈值和迟滞温度量偏差最大仅为0.24℃。     

一种高精度阈值可调过温保护电路的设计

设计了一种高精度阈值可调过温保护电路。该电路利用与温度无关的电压和一个具有负温度系数的电压相比较,实现温度的检测。通过基准分压得到高、低阈值电压可调的迟滞比较器,具有较高的精度。基于0.18μm BCD工艺模型,利用Hspice软件对电路进行仿真。仿真结果表明,在典型应用下,当温度高于150.5℃时,过温保护电路输出高电平,关断电路;当温度低于130.5℃时,电路重新开启,具有20℃迟滞量。在3~5.5 V电源电压范围内,过温电压阈值和迟滞温度最大偏移量小于0.02℃。     

一种新型过温保护电路

采用CSMC 0.5 μm工艺,设计了一种新型过温保护电路.从检测温度和控制温度两方面考虑,通过优化电路结构,提出一种新型系统解决方案.在不引入热振荡的前提下,实现稳定电路温度和输出关断信号的双重功能.采用Cadence的Spectre仿真器进行仿真,结果表明,温度在-50～200℃时,PTAT电压以10.5 mV/℃变化,过温保护开启温度为105℃,具有滞迟功能.成功流片后对芯片进行测试,结果显示,在20～130 ℃内,PTAT电压灵敏度约为10 mV/℃,过温保护开启温度的实测值与仿真值的偏差小于3℃,滞迟范围为20℃.该保护电路是开关电源IP的重要组成部分,在设计过程中时刻考虑其工艺健壮性和可重用性的约束条件,确保其可移植性.     

0.13μm CMOS高精度过温保护电路的设计

采用0.13 μm CMOS工艺,设计了一款过温保护电路.芯片内部温度超过109℃时,产生过温保护信号,电路停止工作,从而起到保护作用.为了防止产生热振荡,采用滞回方式.设计实现了在109℃时关断,78℃时再次开启,有31℃滞迟.仿真结果显示,在电源电压波动或工艺参数变化时,过温保护电路的热关断及迟滞阈值点漂移最大误差仅为2℃,稳定性好.     

一种应用于LIN收发器的过温保护电路

基于CSMC (Central Semiconductor Manufacturing Corporation)0.5μm CMOS工艺设计一种应用于LIN收发器的过温保护电路.该电路包含比较器,并利用两种不同温度特性的电压作为比较器的输入电压.比较器的输出电压作为过温保护电路的输出信号.使用Cadence Spectre工具进行仿真,仿真结果表明,该电路热关断温度为160℃,热开启温度为120℃,具有40℃的热滞回区间.     

一种具有新型过温保护功能的LED恒流驱动电路

设计了一种具有滞回和过温缓冲保护功能的发光二极管(LED)恒流驱动电路。该电路由恒流驱动模块、滞回和过温关断模块、延时复位模块、滞回和过温缓冲模块组成;实现了电路的双温度滞回和过温缓冲保护功能,可对缓冲阶段所处的时域区间和温度区间进行调节。电路在过温缓冲跳变点和过温关断点附近分别有5 ℃和29 ℃的温度滞回区间,避免了电路发生热振荡,增大了电路正常工作区的范围,可保证电路高效稳定地运行。     

一种用于马达驱动芯片的新型过温保护电路

为简化电路结构,提高精度和降低功耗,提出了一种新型过温保护电路。该电路无需基准电压和比较器,利用PTAT电流源的正温度系数特性,对温度进行检测,同时设计迟滞回路,避免了热震荡的发生。基于HHNEC的0.35μm BCD工艺实现,在电源电压为3V~5.5V下进行测试结果表明,该电路热关断温度为165℃,温度迟滞量为15℃,误差为1℃,与仿真结果一致,可以广泛应用于功率集成芯片中。     

投影机高精度过温保护电路的设计

基于UMC 0.25μm BiCMOS工艺,设计了一款投影机过温保护电路。利用三极管BE结电压的负温度特性实现温度的检测,与传统的过温保护电路不同,该保护电路巧妙地利用比较器的内部正反馈实现热滞回,提高了迟滞的精确度。HSPICE仿真结果表明,该电路能很好地抑制电源电压变化造成的热关断和迟滞阈值点的漂移,性能稳定、可靠。电路能在温度过高时准确地将系统关断,达到保护光源和液晶板的目的,最大限度地保证了投影机的使用寿命。     

一种用于升压型DC-DC变换器的过温保护电路

设计了一种用于升压型DC-DC变换器的过温保护电路。采用具有正负温度系数的电流相减,得到随温度变化更加明显的电流,经过电阻分压控制三极管的通断,并采用推挽反相器整形滤波后得到输出信号,实现了芯片过温关断和迟滞开启的功能。采用HHNEC BCD 0.35μm工艺,使用Cadence软件进行仿真验证。仿真结果显示,在各个工艺角及电源电压波动情况下,电路均能在芯片温度上升到170℃时关断、在芯片温度下降到140℃时开启,迟滞值为30℃(±2℃)。     

基于电流比较的过温保护电路设计

由于芯片集成度的提高,改善电路性能的同时也导致功率密度增加.为了防止芯片过热,保证芯片可靠、稳定的工作,设计了一款基于电流比较的新型过温保护电路.电路通过产生与绝对温度(正/负温度系数PTAT/CTAT)相关的电流并进行电流比较,输出包含温度信息的逻辑控制信号,实现对芯片工作状态的控制.对电路的工作原理进行了详细的分析和推导,并给出了电路中核心器件的参数设置.基于UMC 0.6 μm BiCMOS工艺进行了流片并对电路进行了测量,热关断、开启温度分别为125℃和114℃,具有1 1℃的温度滞回量;转换速率26.2 V/℃,具有高灵敏度、高精度的特点;当供电电压发生变化时,电路性能稳定,具有较好的应用前景.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.