Decreasing-size distributed ESD protection scheme for broad-band RF circuits

The capacitive load, from the large electrostatic discharge (ESD) protection device for high ESD robustness, has an adverse effect on the performance of broad-band RF circuits due to impedance mismatch and bandwidth degradation. The conventional distributed ESD protection scheme using equal four-stage ESD protection can achieve a better impedance match, but degrade the ESD performance. A new distributed ESD protection structure is proposed to achieve both good ESD robustness and RF performance. The proposed ESD protection circuit is constructed by arranging ESD protection stages with decreasing device size, called as decreasing-size distributed electrostatic discharge (DS-DESD) protection scheme, which is beneficial to the ESD level. The new proposed DS-DESD protection scheme with a total capacitance of 200 fF from the ESD diodes has been successfully verified in a 0.25-mum CMOS process to sustain a human-body-model ESD level of greater than 8 kV     

系统级ESD激励源模型研究进展

芯片级和系统级静电放电(ESD)协同设计可以有效地应对电子设备面临的ESD风险,但需要对整个ESD防护网络进行建模,特别是建立精确的系统级ESD激励源模型。文章阐述了静电枪、浪涌等两种常用ESD激励源模型的基本原理、建模和仿真方法。分析了已有模型在仿真预测中面临的挑战和存在的问题。最后,指出了系统级ESD激励源模型的发展趋势。     

静电放电电磁脉冲均匀辐射场模拟

为了研究静电放电电磁脉冲（ESDEMP）的特性,利用传统的静电放电电磁脉冲产生方法,通过静电放电模拟器在静电放电抗扰度试验平台上放电,产生了静电放电电磁脉冲,并测出了静电放电电磁脉冲的时域波形和频谱。在研究电磁脉冲模拟器的基础上,首次通过ESD模拟器和GTEM室的结合,在GTEM室内产生了均匀的、重复性和线性好的ESDEMP。实验表明,用TEMP室、GTEM室等大型装置产生均匀静电放电电磁脉冲辐射场的方案是可行的。     

ESD implantations for on-chip ESD protection with layout consideration in 0.18-/spl mu/m salicided CMOS technology

One method to enhance electrostatic discharge (ESD) robustness of the on-chip ESD protection devices is through process design by adding an extra "ESD implantation" mask. In this work, ESD robustness of nMOS devices and diodes with different ESD implantation solutions in a 0.18-/spl mu/m salicided CMOS process is investigated by experimental testchips. The second breakdown current (I/sub t2/) of the nMOS devices with these different ESD implantation solutions for on-chip ESD protection are measured by a transmission line pulse generator (TLPG). The human-body-model (HBM) and machine-model (MM) ESD levels of these devices are also investigated and compared. A significant improvement in ESD robustness is observed when an nMOS device is fabricated with both boron and arsenic ESD implantations. The ESD robustness of the N-type diode under the reverse-biased stress condition can also be improved by the boron ESD implantation. The layout consideration in multifinger MOSFETs and diodes for better ESD robustness is also investigated.     

深亚微米CMOS电路多电源全芯片ESD技术研究

深亚微米CMOS电路具有器件特征尺寸小、复杂度高、面积大、数模混合等特点,电路全芯片ESD设计已经成为设计师面临的一个新的挑战。多电源CMOS电路全芯片ESD技术研究依据工艺、器件、电路三个层次进行,对芯片ESD设计关键点进行详细分析,制定了全芯片ESD设计方案与系统架构,该方案采用SMIC0.35μm 2P4M Polycide混合信号CMOS工艺流片验证,结果为电路HBM ESD等级达到4 500 V,表明该全芯片ESD方案具有良好的ESD防护能力。     

CMOS集成电路中电源和地之间的ESD保护电路设计

讨论了3种常用的CMOS集成电路电源和地之间的ESD保护电路,分别介绍了它们的电路结构以及设计考虑,并用Hspice对其中利用晶体管延时的电源和地的保护电路在ESD脉冲和正常工作两种情况下的工作进行了模拟验证。结论证明：在ESD脉冲下,该保护电路的导通时间为380ns;在正常工作时。该保护电路不会导通．因此这种利用晶体管延时的保护电路完全可以作为CMOS集成电路电源和地之间的ESD保护电路。     

数控系统的静电防护设汁

静电放电(ESD)是数控系统损坏失效的主要因素。论述了ESD的产生原因以及危害与影响,探讨了ESD防护措施以及静电放电抗扰度试验。     

ESD protection design for 1- to 10-GHz distributed amplifier in CMOS technology

Two distributed electrostatic discharge (ESD) protection schemes are presented and applied to protect distributed amplifiers (DAs) against ESD stresses. Fabricated in a standard 0.25-/spl mu/m CMOS process, the DA with the first protection scheme of the equal-sized distributed ESD (ES-DESD) protection scheme, contributing an extra 300 fF parasitic capacitance to the circuit, can sustain the human-body model (HBM) ESD level of 5.5 kV and machine-model (MM) ESD level of 325 V and exhibits the flat-gain of 4.7 /spl plusmn/ 1 dB from 1 to 10 GHz. With the same amount of parasitic capacitance, the DA with the second protection scheme of the decreasing-sized distributed ESD (DS-DESD) protection scheme achieves better ESD robustness, where the HBM ESD level over 8 kV and MM ESD level is 575 V, and has the flat-gain of 4.9 /spl plusmn/ 1.1 dB over the 1 to 9.2-GHz band. With these two proposed ESD protection schemes, the broad-band RF performances and high ESD robustness of the DA can be successfully codesigned to meet the application specifications.     

Investigation and Design of On-Chip Power-Rail ESD Clamp Circuits Without Suffering Latchup-Like Failure During System-Level ESD Test

On-chip power-rail electrostatic discharge (ESD) protection circuit designed with active ESD detection function is the key role to significantly improve ESD robustness of CMOS integrated circuits (ICs). Four power-rail ESD clamp circuits with different ESD-transient detection circuits were fabricated in a 0.18-$mu{hbox{m}}$ CMOS process and tested to compare their system-level ESD susceptibility, which are named as power-rail ESD clamp circuits with typical RC-based detection, PMOS feedback, NMOS+PMOS feedback, and cascaded PMOS feedback in this work. During the system-level ESD test, where the ICs in a system have been powered up, the feedback loop used in the power-rail ESD clamp circuits provides the lock function to keep the ESD-clamping NMOS in a “latch-on” state. The latch-on ESD-clamping NMOS, which is often drawn with a larger device dimension to sustain high ESD level, conducts a huge current between the power lines to perform a latchup-like failure after the system-level ESD test. A modified power-rail ESD clamp circuit is proposed to solve this problem. The proposed power-rail ESD clamp circuit can provide high enough chip-level ESD robustness, and without suffering the latchup-like failure during the system-level ESD test.      

Design of differential low-noise amplifier with cross-coupled-SCR ESD protection scheme

The pin-to-pin electrostatic discharge (ESD) stress was one of the most critical ESD events for differential input pads. The pin-to-pin ESD issue for a differential low-noise amplifier (LNA) was studied in this work. A new ESD protection scheme for differential input pads, which was realized with cross-coupled silicon-controlled rectifier (SCR), was proposed to protect the differential LNA. The cross-coupled-SCR ESD protection scheme was modified from the conventional double-diode ESD protection scheme without adding any extra device. The SCR path was established directly from one differential input pad to the other differential input pad in this cross-coupled-SCR ESD protection scheme, so the pin-to-pin ESD robustness can be improved. The test circuits had been fabricated in a 130-nm CMOS process. Under pin-to-pin ESD stresses, the human-body-model (HBM) and machine-model (MM) ESD levels of the differential LNA with the cross-coupled-SCR ESD protection scheme are >8 kV and 800 V, respectively. Experimental results had shown that the new proposed ESD protection scheme for the differential LNA can achieve excellent ESD robustness and good RF performances.     

Low-capacitance ESD protection design for high-speed I/O interfaces in a 130-nm CMOS process

Electrostatic discharge (ESD) protection design for high-speed input/output (I/O) interface circuits in a 130-nm CMOS process is presented in this paper. First, the ESD protection diodes with different dimensions were designed and fabricated to evaluate their ESD levels and parasitic effects in gigahertz frequency band. With the knowledge of the dependence of device dimensions on ESD robustness and the parasitic capacitance, whole-chip ESD protection scheme were designed for the general receiver and transmitter interface circuits. Besides, an ESD protection scheme is proposed to improve the ESD robustness under the positive-to-V_SS (PS-mode) ESD test, which is the most critical ESD-test pin combination. With a silicon-controlled rectifier (SCR) between the I/O pad and V_SS, the clamping voltage along the PS-mode ESD current path can be reduced, so the PS-mode ESD level can be improved. Besides, the parasitic P-well/N-well diode in the SCR can provide the NS-mode ESD current path. Thus, SCR is the most promising ESD protection device in ESD protection design with low-capacitance consideration. The ESD protection scheme presented in this paper has been practically applied to an IC product with 2.5-Gb/s high-speed front-end interface.     

Do ESD fails in systems correlate with IC ESD robustness?

Integrated circuits (ICs) are qualified for their electrostatic discharge (ESD) robustness according to the well-known IC ESD standards Human Body Model, Machine Model, and Charged Device Model in order to guarantee safe handling in ESD protected areas. For electronic systems like mobile phones which are in direct use by consumers, certain robustness against system level ESD is demanded, too. As the ESD test methods of device and system level stress are completely different (waveforms, stress application, operating condition of the DUT, etc.), correlations between models of both worlds are difficult to establish. Therefore, the system vendors more and more demand a specified ESD robustness for devices (ICs) according to an ESD system level standard. Testing ICs to a system level ESD standard requires careful considerations; first ideas are summarized in the new Standard Practice “Human Metal Model” of the ESDA/ANSI. However, the approach of deriving system ESD robustness from IC robustness is currently too much simplified and bears severe potential risks. Nevertheless, there are methodologies and approaches to use IC ESD characterization for defining ESD protection concepts for systems. Appropriate high-current characterization of ICs can be the cornerstone for a successfully optimized system ESD protection.     

Design of 2.4-GHz T/R switch with embedded ESD protection devices in CMOS process

As CMOS processes advanced, the integration of radio-frequency (RF) integrated circuits was increasing. In order to protect the fully-integrated RF transceiver from electrostatic discharge (ESD) damage, the transmit/receive (T/R) switch of transceiver frond-end should be carefully designed to bypass the ESD current. This work presented a technique of embedded ESD protection device to enhance the ESD capability of T/R switch. The embedded ESD protection devices of diodes and silicon-controlled rectifier (SCR) are generated between the transistors in T/R switch without using additional ESD protection device. The design procedure of RF circuits without ESD protection device can be simplified. The test circuits of 2.4-GHz transceiver frond-end with T/R switch, PA, and LNA have been integrated and implemented in nanoscale CMOS process to test their performances during RF operations and ESD stresses. The test results confirm that the embedded ESD protection devices can provide sufficient ESD protection capability and it is free from degrading circuit performances.     

Whole-chip ESD protection design with efficient VDD-to-VSS ESDclamp circuits for submicron CMOS VLSI

A whole-chip ESD protection design with efficient VDD-to-VSS ESD clamp circuits is proposed to provide a real whole-chip ESD protection for submicron CMOS IC's without causing unexpected ESD damage in the internal circuits. The efficient VDD-to-VSS ESD clamp circuit has been designed to provide a low-impedance path between the VDD and VSS power lines of the IC during the ESD-stress condition, but this ESD clamp circuit is kept off when the IC is under its normal operating condition. Due to the parasitic resistance and capacitance along the VDD and VSS power lines, the ESD-protection efficiency is dependent on the pin location on a chip. Therefore, an experimental test chip has been designed and fabricated to build up a special ESD design rule for whole-chip ESD protection in a 0.8-μm CMOS technology. This whole-chip ESD protection design has been practically used to rescue a 0.8-μm CMOS IC product with a pin-to-pin HBM ESD level from the original level of 0.5 kV to become above 3 kV     

Unique ESD failure mechanisms during negative to Vcc HBM tests

HBM ESD tests on two types of 0.6 μm DRAM devices showed that internal circuit or output driver failures would occur after the input or I/O pins were ESD stressed negative with respect to Vcc at ground. These failures occurred at lower than expected ESD stress voltages due to power-up circuit interactions that either turned-on unique internal parasitic ESD current paths or disrupted the normal operation of the output pin’s ESD protection circuit. ESD analysis found there exists a set of power-up sensitive circuits and if placed near a Vcc bond pad can result in low voltage ESD failures.     

How to defeat electrostatic discharge

The generation of electrostatic discharge (ESD) and the ways in which it causes failure are explained. Three ways of solving ESD problems are described and evaluated. They are: preventing ESD altogether; preventing the coupling of ESD noise into circuits or devices; and increasing the inherent noise immunity of devices and circuits. Firmware and software solutions to ESD upsets are also considered, and ESD testing is discussed     

Design and implementation of configurable ESD protection cell for 60-GHz RF circuits in a 65-nm CMOS process

The configurable electrostatic discharge (ESD) protection cells have been implemented in a commercial 65-nm CMOS process for 60-GHz RF applications. The distributed ESD protection scheme was modified to be used in this work. With the consideration of parasitic capacitance from I/O pad, the ESD protection cells have reached the 50-Ω input/output matching to reduce the design complexity for RF circuit designer and to provide suitable ESD protection. Experimental results of these ESD protection cells have successfully verified the ESD robustness and the RF characteristics in the 60-GHz frequency band. These ESD protection cells can easily be used for ESD protection design in the 60-GHz RF applications, and accelerate the design cycle.     

ESD reliability and protection schemes in SOI CMOS output buffers

The electrostatic discharge (ESD) protection capability of SOI CMOS output buffers has been studied with Human Body Model (HBM) stresses. Experimental results show that the ESD voltage sustained by SOI CMOS buffers is only about half the voltage sustained by the bulk NMOS buffers. ESD discharge current in a SOI CMOS buffer is found to be absorbed by the NMOSFET alone. Also, SOI circuits display more serious reliability problem in handling negative ESD discharge current during bi-directional stresses. Most of the methods developed for bulk technology to improve ESD performance have minimal effects on SOI. A new Through Oxide Buffer ESD protection scheme is proposed as an alternative for SOI ESD protection. In order to improve ESD reliability, ESD protection circuitries can be fabricated on the SOI substrate instead of the top silicon thin film, after selectively etching through the buried oxide. This scheme also allows ESD protection strategies developed for bulk technology to be directly transferred to SOI substrate.<>     

A strategy for characterization and evaluation of ESD robustness of CMOS semiconductor technologies

This paper proposes an ESD technology strategy for characterization, evaluation and benchmarking the ESD “robustness” of CMOS semiconductor technologies. The ESD methodology uses a set of CMOS “building block” ESD test structures, matrices of critical ESD layout variables, electrical characterization parameters, and testing and extraction procedures, and ESD metrics. This work is the first step in the development of a common ESD language.     

一种系统级封装的ESD保护技术

介绍了一种系统级封装(SiP)的ESD保护技术。采用瞬态抑制二极管(TVS)构建合理的ESD电流泄放路径,实现了一种SiP的ESD保护电路。将片上核心芯片的抗ESD能力从HBM 2 000 V提升到8 000 V。SiP ESD保护技术相比片上ESD保护技术,抗ESD能力提升效果显著,缩短了开发周期。该技术兼容原芯片封装尺寸,可广泛应用于SiP类产品开发中。