K波段低相位噪声频率综合器的设计与实现

采用双锁相环混频设计方案,设计了一种低相位噪声频率综合器,实现了单锁相环难以实现的低相位噪声指标。在系统理论分析的基础上,优化了电路布局,实际的电路尺寸为45.0 mm×30.0 mm×12.0 mm,实现了小型化K波段低相位噪声频率综合器。对频率综合器电路进行了测试,输出信号相位噪声为 -95 dBc/Hz @1 kHz和 -99 dBc/Hz @≥40 kHz,杂散为-72 dBc,完全满足设计指标的要求。     

3.1~4.9 GHz宽带低相位噪声频率源的研制

基于LTC6946-2频率合成器设计了3.1~4.9 GH频率源,给出了参数设计过程和实物测试结果。该频率源具有宽带、低相位噪声、低杂散、低成本和占用面积小等特点。经过硬件调试达到的主要指标为:输出频率3.1~4.9 GHz,步进10 MHz,相位噪声优于-97.8 dBc/Hz@1 kHz和-99.3 dBc/Hz@10 kHz,杂散优于-90 dBc。     

基于ADF4360系列的小型化频率综合器设计

结合频率综合器发展小型化的趋势,给出了基于ADF4360系列芯片的小型化频率综合器设计的应用实例,重点介绍了设计关键参数和实现方法。测试结果表明,该频率综合器满足工程应用中小体积、低功耗、低相噪、低杂散的要求。     

一种超宽带捷变频源的研制

本文介绍了一种超宽带捷变频源的设计与实现过程，该频率源采用直接模拟合成方式，通过合理的频率划分和高性能的开关滤波组件技术实现了超宽带、捷变频、低相噪、低杂散的优异性能，并给出了最终测试结果。实测结果表明该频率源在 Ku 波段 6GHz 带宽范围内具有杂散抑制优于-70dBc，相位噪声优于-103dBc/Hz@1kHz，跳频时间小于 200ns 等的性能。     

基于锁相环技术的X 波段频率源的研制

介绍了一种X 波段频率源的设计方案及相关理论。采用数字锁相环内混频技术实现的该X 波段频率源具有频带宽,相位噪声低,杂散低等特点。其主要技术指标如下：输出频率范围为9.8GHz～10.8GHz,频率步进为5MHz,在偏离1KHz 处相位噪声优于-85dBc/Hz,在偏离10KHz 处相位噪声优于-88dBc/Hz,杂散抑制优于60dBc。由最后的测试结果可 知,采用该方法设计的频率源既能保证低杂散又能显著改善相位噪声水平,可广泛用于通信设备和测试系统中。     

C波段小型化低相噪全相参频率综合器

提出了一种小型低相噪、低杂散的C波段全相参频率综合器设计方案。基带信号由DDS芯片产生,通过对环路滤波器和电路印制板的优化设计改善相噪和杂散性能,并与PLL输出的C波段点频信号进行上变频,得到所需信号。介绍了实现原理、相位噪声模型及设计方法。测试结果表明,在7.8GHz处,频综相位噪声≤-103dBc/Hz@100kHz,杂波抑制≤-61dBc。     

基于锁相环的L波段频率源设计与实现

介绍了一种L波段的频率合成源的设计与实现方法,采用电荷泵锁相环来实现.该法设计的频率源具有低相位噪声、低杂散和高频率稳定度等特点,经过测量所做实物表明:相位噪声为-80.4dBc/Hz@1kHz;杂散抑制优于-55dBc;输出功率大于6dBm.满足项目的指标要求,并且,电路结构简单,体积小巧,性能优良,能够用于实际电路...     

P波段频率源的设计

文中介绍了一种P波段频率源的设计和实现方法及相关理论,采用锁相技术实现的该P波段频率源具有相位噪声低,杂散低等特点,已经用于某通信设备中。其主要技术指标如下:输出频率为800MHz,在10kHz处的相位噪声优于-90dBc/Hz,杂散抑制优于65dBc,由最后的测试结果可知,采用该方法设计的频率源能保证低杂散的指标要求同时又能显著地改善相位噪声水平,可广泛用于通信设备和测试系统中。     

一种L频段快速跳频频率合成器的设计和实现

结合数字式频率合成器(DDS)和集成锁相环(PLL)各自的优点,研制并设计了以DDS芯片AD9851和集成锁相芯片ADF4112、4106构建的高分辨率、低杂散、宽频段频率合成器,并对该频率合成器进行了分析、仿真和试验,从仿真和实际测试结果看,该频率合成器达到了设计目标。该频率合成器能在L波段上实现每赫兹频率步进,相位噪声能满足-73dBc/Hz@1kHz、-83dBc/Hz@10kHz、93dBc/Hz@10kHz,杂散优于-60dBc,频率转换速度优于为50μs。     

一种低相噪频率综合器设计

针对军事、工业、通信等许多领域对高精度、高分辨率、低相噪频率综合器的需求,分析了影响频率综合器相噪特性的主要因素,设计了一种窄带锁相环滤波器,用于两级小数分频锁相环级联组成的频率综合器之间进行降噪,使前级锁相环相噪特性对后级锁相环恶化相噪特性的影响得到很好的抑制,该窄带锁相环滤波器采用4个不同频率低相噪VCXO切换作为后级锁相环的鉴相频率,使频率综合器输出信号频率与整数边界的距离大于后级锁相环环路带宽且尽可能的远,有效抑制了频率综合器输出信号中整数边界杂散(IBS)功率,改善了频率综合器的相噪性能,对频率综合器输出622.08MHz(用于雷达)、1561.098MHz(用于北斗)信号的相位噪声分别为:-96dBc/Hz@100Hz,-105dBc/Hz@10kHz和-91dBc/Hz@100Hz,-100dBc/Hz@10kHz。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.