滚仰式红外导引头视线角速率提取方法研究

由于滚仰式导引头的结构特殊性,制导控制系统需要的视线角速率信息是不能够直接测量得到的,因此提出了一种基于跟踪微分器的视线角速率提取方法。根据滚仰式导引头的结构特点,分析了滚仰式导引头的运动学原理,并根据滚仰式导引头的结构推导出视线角与弹体姿态角、框架角和失调角的关系,然后设计了有限时间收敛跟踪微分器求解视线角速率信息。经数字仿真,对比了直接差分法和跟踪微分器法对视线角速率的提取效果,证明了利用跟踪微分器提取视线角速率的有效性。     

滚仰式光学滑环的测角分析

滚仰式光学滑环被广泛应用在小型化位标器中。由于引入了折转光路,其对目标的空间角位置测量比传统的跟踪成像系统更复杂。基于光线反射定律和等距变换理论研究滚仰式光学滑环对目标的空间角位置测量,得到理论计算公式和近似计算公式,最后通过数值仿真验证了分析结果的正确性。     

红外成像制导中前视图的仿真技术研究

红外成像制导技术已发展成为精确制导技术的重要方向之一.但由于成像制导过程中获取的前视图像存在几何失真,它是影响图像匹配性能的一个很重要的因素.分析了前视传感器末制导的工作方式,在此基础上,建立了成像的视场模型.广义坐标系可以把透视变换化为线性变换以便于计算,本文采用广义坐标表示图像的透视变换,推导了从世界坐标系到成像坐标系的变换矩阵,以及变换前后图像问的坐标对应关系.在假定成像平台俯仰角、滚动角参数条件下,应用该算法实现了正摄图对前视红外图像的模拟仿真.     

滚仰式捷联导引头视线角速度提取技术研究

滚仰式捷联导引头具有很好的应用前景,但在过顶跟踪时提取稳定的视线角速度问题一直没有妥善的解决方法。提出一种利用导引头提供的失调角、框架角及框架角速度等信息构建"虚拟偏仰式导引头"的方法,设计Kalman滤波器对目标垂直视线运动信息进行估计,进而间接提取出视线角速度信息,用于产生制导指令。仿真结果表明,在过顶跟踪时该方法能有效抑制视线角速度抖动,视线角速度精度显著提高。     

低轨凝视卫星动态跟踪对成像的影响分析

为实现凝视卫星动态跟踪清晰成像,建立了卫星对地实时跟踪成像的数学模型,推导了卫星凝视跟踪成像时本体坐标系相对轨道坐标系的姿态角和角速度的变化,设计了物像位置与速度矢量映射算法,搭建了焦平面像点与地面景物点位置与速度变化的一一对应关系,结合蒙特卡洛方法统计分析了动态跟踪成像过程中卫星的姿态变化及姿态动态跟踪精度对成像的影响。最后,利用CMOS相机和小卫星姿态控制系统全物理仿真平台对凝视成像进行了仿真分析。结果表明:卫星凝视成像过程中,像面存在卫星姿态变化及姿态动态跟踪精度引起的像在探测元上的驻留时间小于探测器的积分时间,分析及仿真得出,为满足驻留时间大于或等于积分时间的要求,仿真平台动态跟踪精度优于0.002(°)/s时,可实现500 km凝视卫星2 m分辨率动态跟踪清晰成像。     

捷联成像制导系统的若干问题探讨

对比捷联成像导引头和传统成像导引头的特点, 指出捷联成像寻的制导技术应用到实际的导弹系统中, 需要解决视线角速率提取、数学平台的实现以及制导和控制系统综合设计等问题。给出了各坐标系之间的转换关系, 据此推导了捷联成像寻的制导的弹体姿态解耦算法, 针对捷联成像导引头的大测量噪声以及系统的非线性, 介绍了采用Unscented 卡尔曼滤波器估计视线角速率的基本原理, 并对捷联成像制导与控制系统进行了分析, 给出了制导与控制系统综合设计的思路。     

红外/激光双模导引头的光学系统

为了实现防空导弹的自主精确制导,提出了一种共孔径红外成像/激光雷达双模导引头的系统方案,并设计了其中的光学系统.该方案采用被动红外成像与主动激光雷达制导两种模式,通过被动红外方式进行视场搜索并确认目标,然后切换为激光雷达制导方式进行目标锁定与精确跟踪.整个系统共用同一个接收口径,结构紧凑,符合导引头小型化的要求,并且既能满足目标搜索阶段大视场的要求,又能满足目标的精确识别与跟踪的要求.随后文中给出了光学系统参数的确定方法,并用CODE V光学设计软件设计了光学系统.所设计的光学系统具有较好的成像质量,可满足系统的性能要求.     

捷联成像制导系统的若干问题探讨

对比捷联成像导引头和传统成像导引头的特点，指出捷联成像寻的制导技术应用到实际的导弹系统中，需要解决视线角速率提取、数学平台的实现以及制导和控制系统综合设计等问题。给出了各坐标系之间的转换关系，据此推导了捷联成像寻的制导的弹体姿态解耦算法。针对捷联成像导引头的大测量噪声以及系统的非线性，介绍了采用Unscented卡尔曼滤波器估计视线角速率的基本原理，并对捷联成像制导与控制系统进行了分析，给出了制导与控制系统综合设计的思路。     

弹载大视场红外线扫图像几何畸变仿真研究

高速机动、大视场、线扫等均会引起弹载大视场线列扫描红外图像的几何畸变,从而影响巡飞弹的整体战术效能。利用探测器像面参数、坐标变换、地表模型、物像共线方程和墨卡托地图投影模型分别建立了相机的像方坐标方程、位姿变换方程、物像转换方程和物方地图投影方程,进而构成了从像面坐标系到地图坐标系的完整严格成像模型,利用Matlab对该模型进行静态仿真,确定航高、摆扫角度、地表模型等模型参数造成的几何畸变特性的强度,为弹载几何畸变校正算法的工程优化提供了依据。     

烟幕对红外制导武器的干扰研究

烟幕是对抗红外制导武器的有效手段,分析了红外成像系统的组成及工作原理,论述了对抗红外成像系统的干扰机理及烟幕对红外成像制导的干扰原理,并详细论述了烟幕对成像系统的视频信号处理、跟踪处理器以及红外成像系统的信噪比的影响,得出了其作用机理,为烟幕在光电对抗中的应用提供了一定的理论基础.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.