折射/衍射长焦距红外系统的设计

基于衍射光学原理的衍射元件(DOE)有着传统光学元件无法比拟的特点,其独特的色散性质有利于校正系统色差.通过理论分析得到衍射元件设计方法,并以此为基础设计仅含有两片锗透镜的红外成像系统.系统焦距达到300 mm,系统F数1.5,像高20 mm.设计结果表明,红外折射/衍射系统与传统红外系统比较,在要求的光谱范围内系统成像质量有明显提高.     

折/衍射双波段共光路齐焦光学系统设计

为了提高双波段光学系统成像性能,结合可见光和中波红外的特点,设计了无光路补偿的折/衍射双波段共光路齐焦光学系统。对系统的4片透镜波段间消色差以及焦距补偿表达式进行了推导,采用4片透镜并引入二元衍射面,通过合理匹配光学系统光焦度,实现了系统共用一组光路,在可见光和中波红外两个波段的焦距一致,提高了双波段观测目标信息的一致性。设计的双波段共口径/共光路成像光学系统的工作波长为0.38~0.76 m,3~5 m,系统的焦距为90 mm,视场角为0.5,F数为3,在-40~+60℃的温度范围内采用光学被动式进行消热差设计。设计结果表明:系统结构简单,体积小,成像质量接近衍射极限。     

折反式中波红外双视场变焦系统无热化设计

利用折/衍混合透镜实现了宽温度范围双视场变焦系统的光学被动无热设计。系统工作波段为3～5 m,使用320240红外制冷探测器,像元大小为30 m30 m,焦距为400 mm和800 mm两档,F数分别为2和4。两系统通过机械结构改变冷光栏大小分别实现100%冷光栏效率。在两档共用组份采用一片折衍混合透镜,对双视场系统两焦距位置消热差,实现了一个衍射面对两档系统的无热化设计,结构简单。设计结果表明:在-40 ～60 ℃温度范围内,空间频率18 lp/mm处系统MTF值接近衍射极限,成像质量良好,实现了双视场变焦系统的无热化设计。     

双视场折/衍混合中波红外变焦系统

传统的红外变焦系统结构通常比较复杂,因此限制了红外变焦系统的应用范围。通过将二元光学元件引入红外变焦系统中达到了简化系统结构的目的,并给出了具体的设计实例及衍射元件进行公差分析。系统采用透镜4片构成,有效焦距为92 mm,F数为1时与有效焦距276 mm,F数为2时,在17 lp/mm的传递函数值均接近衍射极限。设计结果表明,在传统折射系统中引入二元光学元件,可简化系统、改善相质。     

双波段/双视场红外光学系统设计

研究了双波段/双视场红外光学系统的设计,设计了双波段/双视场红外光学系统,引入衍射光学实现双波段成像,采用移动单个透镜实现视场切换.结果表明,该系统可以实现焦距为37mm/100mm,工作波段为3.7～4.3μm/8 12μm的双波段/双视场光学系统,F数为1.2,在空间频率201p/mm处的光学传递函数值＞0.5.应用结果表明,该系统结构简单,像质好.     

用于DVD光学成像系统的非球面透镜设计

分析了DVD光学成像系统中采用非球面透镜的意义．进而确定了系统的参数,其读出激光波长为0．65μm,NA为0．6．系统焦距为3．39mm。采用光学树脂。应用ZEMAX光学设计软件,设计了满足要求的DVD光学成像系统．并对结果进行了分析．其聚焦光斑尺寸小于衍射极限。     

宽光谱可见-短波红外成像光学系统设计

针对目前的红外成像光学系统在机器视觉工业检测领域难以同时实现成像质量好和结构紧凑设计的问题,提出了一种宽光谱可见-短波红外成像光学系统的设计方法。运用光学设计软件ZEMAX设计了一种适用于可见光和短波红外的红外成像光学系统。该系统由7组10片透镜组成,利用多组双胶合透镜来消色差,在第15个面使用非球面提高成像质量,最后对系统的成像质量进行研究。设计结果表明：该系统的的工作波长为0.4～1.7μm,全长为79.6 mm,F数为2.8,焦距为25.7 mm,畸变小于1.4%,调制传递函数值在奈奎斯特频率100 lp/mm处均大于0.4,接近衍射极限,成像质量良好。该系统可以对光滑表面的装配件进行缺陷检测,具有结构简单、易于加工装调的优点,有助于高效地完成机器视觉检测。     

薄膜衍射消热差红外光学系统设计

设计了一种薄膜衍射消热差红外光学系统。此光学系统口径为200 mm,焦距为200 mm,相对孔径为1,全视场角为3°,工作波段为10.7~10.9 μm。该系统采用薄膜衍射镜作为主镜,厚度为微米量级,具有口径大、重量轻的优点,解决了现有红外光学系统重量和口径无法调和的矛盾。利用含有衍射面的折衍混合透镜进行校正主镜带来的强色散,有效解决薄膜衍射主镜成像视场小、谱段范围窄等问题。采用薄膜衍射主镜、折衍混合透镜,很好地利用了衍射面良好的消热差特性,再结合透镜材料的选择,对光学系统消热差起到了良好的作用,并且,衍射面的使用为系统设计优化过程中增加了自由度。薄膜衍射消热差红外光学系统重量轻、成像质量好、消热差性能优良,在红外遥感成像探测领域具有良好的应用前景。     

折/衍混合多光谱红外成像光谱仪离轴系统设计

采用二元光学透镜作为分光元件的多光谱成像光谱仪,由于焦距随波长的变化改变了系统的F数,因此改变了系统的放大率,从而引起光谱图像的像元配准误差。为改进基于二元光学透镜的多光谱成像光谱仪的性能,首次提出将离轴三反射镜系统与具有二元光学透镜的变焦距系统相结合的新技术方案。设计了由三片二次非球面生成的无中心遮拦的前置望远镜,该望远镜不仅有利于提高多光谱成像光谱仪的集光能力,且有利于系统的小型轻量化。同时设计了含二元光学透镜的三片型变焦距组件,用来消除多光谱成像光谱仪的像元配准误差。整个多光谱成像光谱仪系统仅有6个单片,非常简单。另外,该系统在空间频率为20 c/mm时MTF超过0.3,充分满足红外焦平面探测器对多光谱成像系统分辨率的要求,像面尺寸为7.2 mm。适用于探测单元尺寸为25μm、规格为128×128元的红外焦平面探测器。     

基于红外波段的大视场谐衍射透镜设计

针对目前光学设计中,通过增加光学元件数量、限制视场角等方法来平衡像差,导致光学系统较复杂的问题,提出了一种基于红外波段的大视场谐衍射透镜设计方法。使用光学设计软件Zemax进行光学设计,使用DLL编写了一种可以自定义的表面面型,使用这种表面进行分区优化,并结合标量衍射理论进行了成像效果分析。结果显示,所设计的谐衍射透镜具有21°的视场角,截止频率(以0.1作为对比度极限)为11.4 lp/mm,并通过实验验证了该透镜的大视场单透镜成像的可行性。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.