Ka波段分布式MEMS移相器低驱动电平容性开关的机电设计

为降低Ka波段分布式MEMS移相器容性开关的驱动电压,提出不同形状新型低弹性系数铰链梁结构MEMS电容开关的机电设计概念.采用Intelli SuiteTM和ADS软件分析了三种梁结构MEMS电容开关的位移分布、驱动电压、机械振动模式和射频性能等参数,结果表明:所设计新型beam2结构MEMS电容开关具有优越的机电特性和射频特性,即开关的驱动电压为3V,机械振动模式固有频率都大于31kHz,在35GHz处插入损耗和回波损耗分别为0.082dB和18.6dB,而相移量可达到105.9o.     

一种MEMS开关驱动电路的设计

静电驱动MEMS开关可靠工作需要较高的驱动电压,大多数射频前端系统很难直接提供,因此需要一种实现电压转换和控制的专用芯片,以满足MEMS开关的实用化需要。本文基于200V SOI CMOS工艺设计的高升压倍数MEMS开关驱动电路,采用低击穿电压的Cockcroft-Walton电荷泵结构,结合特有的Trench工艺使电路的性能大大提高。仿真结果显示驱动电路在5V电源电压、0.2pF电容和1GΩ电阻并联负载下,输出电压达到82.7V,满足大多数MEMS开关对高驱动电压的需要。     

电容式MEMS开关中弹性膜应力对驱动电压的影响

详细分析了多种参数对 MEMS电容式开关驱动电压的影响 ,包括材料选取和工艺参数变化 ,并对驱动电压理论值进行计算。利用表面微机械加工技术在硅衬底上实现了电容式开关 ,测试结果表明采用 Al0 .96 Si0 .0 4弹性膜和厚胶牺牲层工艺能获得适中的剩余应力释放 ,微桥应力约为 10 6 N/m2 ,这为获得较低的开关驱动电压提供了可能。对长 1m m的 MEMS开关 ,当弹性膜厚为 0 .5μm,桥高为 3μm、桥宽为 30 μm、桥长为 2 50 μm时获得了 2 5V的驱动电压 ,S参数测试表明该电容式开关 1～ 4 0 GHz频段内的插入损耗低于 1d B。     

一种MEMS热驱动可变电容的分析模拟

文中设计并分析了一个MEMS热驱动可变电容,它的下极板固定于衬底,上极板通过热致动器驱动。热致动器由冷臂和热臂组成,一端通过锚点固定于衬底,一端连接在电容器上极板。热驱动器通过电压驱动使MEMS电容器上极板上下运动。文中作者使用有限元方法模拟了150～300μm加热臂长在0～4 V电压条件下的电容变化值和温度变化,有限元模拟结果表明其电容变化率最大可达10倍。     

RFMEMS电容式并联开关的研制

通过分析MEMS电容式并联开关的工作原理,设计并制作出一款适合Ka波段分布式MEMS移相器的电容式开关。通过理论计算和经验选取,初步得到了MEMS电容式并联开关的结构尺寸。采用HFSS软件建立了开关的三维电磁场模型并优化了关键结构参数。仿真表明开关在Ka波段插入损耗小于0．15dB,回波损耗大于15dB。采用CoventorWare软件进行了开关的机电耦合仿真,得出其驱动电压为2．1V。为了满足流片单位的实际工艺约束条件,对开关的设计版图和微加工工艺进行了多轮改进,研制成功MEMS电容式并联开关工艺样品。开关动态特性测试表明,在驱动电压36V时,桥下拉的高度约为2μm。     

多晶硅衬底上的RF MEMS开关

在微机械开关与硅IC工艺设计和兼容方面进行了改进,获得了一种可与IC工艺兼容的RF MEMS微机械开关.采用介质隔离工艺技术把这种RF MEMS微机械开关制作在绝缘的多晶硅衬底上,实现了与IC工艺兼容;采用在金属膜桥的端点附近刻蚀一些孔的优化方法,降低了RF MEMS微机械开关的下拉电压.用TE2819电容测试设备测试开关的电容,测得开关的开态电容、关态电容和致动电压分别为0.32pF、6pF和25V.用HP8753C网络分析仪对RF MEMS微机械开关进行了RF特性测试,得出RF MEMS微机械开关在频率1.5GHz下关态的隔离度为35dB,开态的插入损耗为2dB,用示波器测得该开关的开关速度为3μs.     

微型加速计全差分Σ-Δ接口IC

主要描述一种加速度感应系统全差分Σ-ΔCMOS接口IC。电容传感器接口由一个前端可配置开关电容(SC)电荷放大器和一个末端,一阶SCΣ-Δ调制器组成。本设计采用开关双采样技术(CDS)来消减低频噪声,能有效地隔离高性能Σ-Δ调制器和MEMS传感器。采用0.35μm CMOS技术,在3.3 V电源环境下能够理想工作。仿真结果显示该设计能达到0.55 V/g的精度。     

一种用于RF MEMS移相器及开关可变电容的复合微桥膜结构

提出了一种基于微机械工艺的新型复合微桥膜结构，由低应力SiN／SiO2(0.5μm／50nm)及Cr／Au(30nm／1μm)构成。相应的工艺流程较为简单。对影响其特性的因素进行了理论分析，并提出了3种桥膜的平面结构；利用静电／力耦合有限元法分析了各种结构的静电驱动特性以及各阶模态，结果得到了令人满意的驱动和机械性能；通过有限元高频仿真软件对桥膜结构与共面波导形成的可调电容结构进行了分析，结果表明其具有良好的射频／微波性能。该桥膜结构适用于RF MEMS开关、移相器及开关式可调电容和滤波器等。     

一种用于RF MEMS移相器及开关可变电容的复合微桥膜结构

提出了一种基于微机械工艺的新型复合微桥膜结构,由低应力SiN/SiO2 (0.5μm/50nm)及Cr/Au(30nm/1μm)构成.相应的工艺流程较为简单.对影响其特性的因素进行了理论分析,并提出了3种桥膜的平面结构;利用静电/力耦合有限元法分析了各种结构的静电驱动特性以及各阶模态,结果得到了令人满意的驱动和机械性能;通过有限元高频仿真软件对桥膜结构与共面波导形成的可调电容结构进行了分析,结果表明其具有良好的射频/微波性能.该桥膜结构适用于RF MEMS开关、移相器及开关式可调电容和滤波器等.     

硅基MEMS红外光源制造及其辐射特性研究

结合现有微机电系统(MEMS)制造工艺加工设计了一种新型的硅基MEMS红外辐射光源,该光源采用辐射功能层悬浮结构,主要包括微米量级多晶硅辐射层、重掺杂单晶硅反射层、二氧化硅保护层、支撑层和金属电极层;采用硼离子注入技术对多晶硅辐射层进行掺杂改性,实现多晶硅辐射层良好的电阻加热和体辐射效应;采用光谱辐射计对MEMS红外光源辐射光谱进行测试,显示光谱辐射波段为2~14μm;光源驱动电压为5.8 V时,电光转化效率达9.76%,光源开启时间约为20 ms,关断时间约为10 ms,总驱动响应时间为30 ms。     

Phase-noise analysis of MEMS-based circuits and phase shifters

The effect of Brownian, acceleration, acoustic, and power-supply noise on MEMS based circuits has been calculated for MEMS.-based circuits (phase shifters, delay circuits). The calculations are done for capacitive shunt MEMS switches and metal-to-metal contact series MEMS switches. It is found that these effects result in both an amplitude and phase noise, with the phase noise being around 100× larger than the amplitude noise. The phase noise due to Brownian motion is negligible for MEMS switches with k ≃ 1.0 N/m, g₀ > 2 μm, Q > 0.5, and f₀ ≃ 50 kHz. The effect of acceleration and acoustic noise is negligible for a total acceleration noise of 10 g or less and a total acoustic noise of 74-dB sound pressure level. The power-supply noise depends on the bias conditions of the MEMS element, but is negligible for MEMS switches with a bias voltage of 0 V and a total noise voltage of 0.1 V or less. It is also found that metal-to-metal contact series switches result in much less phase noise than standard capacitive shunt switches. The phase noise increases rapidly for low spring-constant bridges (k = 0.24 N/m), low-height bridges, and bridges with a large mechanical damping (Q < 0.3). Also, varactor-based designs result in 30-40 dB more phase noise than switch-based circuits. This paper proves that microwave passive circuits built using MEMS switches (with a proper mechanical design) can be used in most commercial and military applications without any phase-noise penalty     

一种新型低压电容式RF MEMS开关的设计与分析

介绍了一种基于扭转的新型低压电容式RFMEMS开关的设计.此开关在保留传统挠曲变形的基础上,引入了扭转变形,并利用Intelli Suite等软件进行仿真分析.理论分析和仿真结果表明:与传统弯曲变形不同,在扭转变形中,变形对臂的厚度远比宽度敏感;在保留传统挠曲变形的基础上,增加了扭转变形,将有效降低驱动电压.理论分析还表明增长扭转臂、从动臂可使驱动电压明显下降.通过优化结构设计,在扭转臂、从动臂长为180μm、120μm,臂宽为5μm,厚为1μm,驱动电极面积为120μm×120μm时,仿真得到驱动电压为1.5V.     

A fully integrated SOI RF MEMS technology for system-on-a-chip applications

In this paper, a silicon-on-insulator (SOI) radio-frequency (RF) microelectromechanical systems (MEMS) technology compatible with CMOS and high-voltage devices for system-on-a-chip applications is experimentally demonstrated for the first time. This technology allows the integration of RF MEMS switches with driver and processing circuits for single-chip communication applications. The SOI high-voltage device (0.7-/spl mu/m channel length, 2-/spl mu/m drift length, and over 35-V breakdown voltage), CMOS devices (0.7-/spl mu/m channel length and 1.3/-1.2 V threshold voltage), and RF MEMS capacitive switch (insertion loss 0.14 dB at 5 GHz and isolation 9.5 dB at 5 GHz) are designed and fabricated to show the feasibility of building fully integrated RF systems. The performance of the fabricated RF MEMS capacitive switches on low-resistivity and high-resistivity SOI substrates will also be compared.     

低压驱动RF MEMS开关设计与模拟

RF MEMS开关存在驱动电压高、开关时间长等问题,利用ANSYS对电容式开关加以改进,设计扭转臂杠杆与打孔电容膜相结合的新型开关。通过静电耦合与模态分析的仿真,可以在理论上改善RF MEMS开关的射频性能,并有工艺的可行性。     

单刀双掷RF MEMS开关的研究与设计

介绍了一种基于横向金属接触的DC-5GHz单刀双掷RF MEMS开关的研究与设计．横向金属接触开关包括了一套有限的共面波导（FGCPW）传输线和左右摆动的悬臂梁．为了降低开启电压,设计了一种曲折型的折叠梁结构,通过理论分析与仿真实验验证了该结构的可行性,并利用MetalMUMPs工艺加以实现．测试结果显示,该开关在5GHz处的插入损耗为0．8dB,回波损耗大于20dB,隔离度为40dB．测得最低开启电压为33V．     

Measurement and analysis of substrate leakage current of RF mems capacitive switches

This paper focused on a new direction of study on leakage current called substrate charge injection. The substrate leakage current of capacitive RF micro-electro-mechanical-system (MEMS) switches was measured, and the conduction mechanism was estimated. The study of the leakage current conduction mechanisms of the substrate dielectric film shows that leakage is mainly induced by hopping conduction at low electric fields, whereas both Schottky emission and hopping conduction may contribute to the leakage current at high fields. The quantitative relationship between the substrate leakage current and the dielectric layer leakage current was also determined for the first time. In the case of low drive voltage (0–30 V), the substrate leakage current significantly contributes to the total leakage current. Results show that the charging properties of the substrate should not be neglected at low drive voltage because such properties could significantly affect the functionality and reliability of RF MEMS switches.     

Low-voltage high-isolation DC-to-RF MEMS switch based on an S-shaped film actuator

This paper presents a new electrostatically actuated microelectromechanical series switch for switching dc to radio frequency (RF) signals. The device is based on a flexible S-shaped film moving between a top and a bottom electrode in touch-mode actuation. This concept, in contrast to most other microelectrochemical systems (MEMS) switches, allows a design with a low actuation voltage independent of the off-state gap height. This makes larger nominal switching contact areas for lower insertion loss possible, by obtaining high isolation in the off-state. The actuation voltages of the first prototype switches are 12 V to open, and 15.8 V to close the metal contact. The RF isolation with a gap distance of 14.2 /spl mu/m is better than -45 dB up to 2 GHz and -30 dB at 15 GHz despite a large nominal switching contact area of 3500 /spl mu/m/sup 2/.     

A 90 μW continuous-time front-end with 10b SAR-ADC for capacitive MEMS accelerometers

This paper presents a low power read-out front-end for 3-axis MEMS capacitive accelerometer. The front-end includes the analog preamplifier (to sense the signal coming from the MEMS) and a Successive-Approximation 10b A/D Converter, for digitalization and off-chip digital-signal-processing. Power minimization is achieved by using a continuous-time sensing preamplifier (i.e. constant-charge capacitance-to-voltage conversion) and SAR-ADC with bridge capacitive reduction. Preamplifier programmable in-band gain allows to accommodate different MEMS sensitivities. A very high-impedance MOS transistor is used for MEMS biasing, thus providing very low frequency (<1 Hz) AC coupling. In a 0.13 μm CMOS technology, the full channel consumes 90 μW from a single 1.2 V supply voltage, and achieves an equivalent 67.9 dB_Full-Scale@SNR in [1 Hz–4 kHz] bandwidth by exploiting oversampling ratio.     

静电式RF MEMS开关的可靠性

MEMS开关是最常见的RF MEMS控制元件,是RF结构中一个关键的MEMS器件。长期可靠性是目前制约MEMS开关商业化进程中的一个主要问题。主要综述了静电式RF MEMS开关可靠性的新进展。欧姆式开关通常由于黏附或接触电阻的增大而失效,电容式开关的主要失效机理则与电介质层的充电有关。接触材料的选择是决定欧姆开关可靠性最重要的一个因素,"主动断开/被动接触"MEMS开关适用于软金属材料欧姆接触的可靠性要求。改善电容式开关可靠性的途径是改善介电层、优化驱动电压波形等以减小介质层的充电。