界面极化层引起P(VDF-TrFE)电容器的电容-电压的不对称（英文）

通过研究Au/P(VDF-TrFE)/Al电容器的变温(200 K到310 K)电容-电压曲线,室温下观察到两个极化方向下的电容不对称,这个现象可以应用于非挥发性存储器.电容不对称程度随着温度的降低而变小,当温度低于230 K,电容不对称现象消失.P(VDF-TrFE)与Al电极之间的界面极化层可以解释观察到的电容不对称现象.     

P(VDF-TrFE)/Ag复合薄膜的铁电以及介电性能研究

利用旋涂法制备并采用氢气退火处理得到P(VDF-TrFE)/Ag复合薄膜,在XRD图像上可以观察到在2θ=38.1°的Ag(111)相的衍射峰,同样在SEM图像上观察到银纳米粒子的存在.在薄膜的红外透射光谱上可以观察到β相特征峰的蓝移,这可归结为银纳米粒子与偶极子的相互作用.银纳米粒子的掺杂增强了薄膜的铁电和介电性能.与传统退火方式处理的纯P(VDF-TrFE)薄膜相比,纳米银掺杂比例为10％的P(VDF-TrFE)/Ag复合薄膜的铁电剩余极化强度和介电常数分别提高了32.5％和13.3％.介电损耗不随纳米银掺杂比例的增加而变化的现象不符合渗流理论.     

自支撑P(VDF-TrFE)红外探测器（英文）

制备了具有自支撑绝热结构的Al/P(VDF-TrFE)/NiCr红外探测器单元,其中NiCr半透明膜作为探测器的上电极和吸收层.实验结果表明:P(VDF-TrFE)薄膜具有很好的铁电性和热释电性,其铁电剩余极化强度和热释电系数分别为7.1μC/cm~2和27μC/m~2K;探测器单元在10 Hz工作频率下对黑体温度500 K的辐射源的电压响应率和探测率分别为1500 V/W和5×10~7 cmHz~(1/2)W~(-1);通过对电压响应率随频率变化的实验数据进行拟合,得到探测器单位面积的热导和吸收率分别为2.5×10~(-3) W/cm~2K和0.1;利用P(VDF-TrFE)探测器单元可对目标物体实现热成像.     

自支撑P(VDF-TrFE)红外探测器

本文中制备了具有自支撑绝热结构的Al/P(VDF/TrFE)/NiCr红外探测器单元,其中NiCr半透明膜作为探测器的上电极和吸收层。实验结果表明：P(VDF/TrFE)薄膜具有很好的铁电性和热释电性,其铁电剩余极化强度和热释电系数分别为7.1 μC/cm2 和27 μC/m2K;探测器单元在500 K温度下的电压响应率和探测率分别为4436 V/W和3.3×108 cmHz1/2W-1;通过对电压响应率随频率变化的实验数据进行拟合,得到探测器单位面积的热导和吸收率分别为2.6×10-3 W/cm2K 和0.1;利用P(VDF-TrFE)探测器单元可对目标物体实现热成像。     

PVDF/P（VDF-TrFE）混合薄膜形貌的原子力显微镜研究

利用原子力显微镜研究PVDF/P（VDF-TrFE）混合薄膜的结晶形貌受退火温度的影响,发现随着退火温度的升高,两种成份的结晶情况各异,并受到分子链间的作用而互相影响。α相的PVDF大球晶结构受P（VDF-TrFE）分子链的影响不易转化成β相的小球晶。在P（VDF-TrFE）的熔融温度以上退火后,P（VDF-TrFE）结晶成长纤维状晶体,并随着退火温度的升高而长大。共混薄膜中发生了两种类型的相分离,P（VDF-TrFE）的结晶可以使整个混合薄膜的宏观相容性得到提高,使两种成份的分层现象消失。     

利用二次谐波产生研究Al2O3/Al(111)表面的动力学变化

主要介绍了当激光入射到单晶金属Al2O3／Al(111)表面时将发生二次谐波产生(SHG)现象的实验装置和实验方法,利用该装置可以研究SHG和从Al2O3／Al(111)表面反射的SHG在空间各向异性的变化情况,从而可以探测Al2O3／Al(111)表面结构对称性。实验中发现,当脉冲激光功率在2×106 W／cm2-9．6×106W／cm2范围内变化时,没有检测到SHG信号的各向异性变化;当使用P-极化泵浦激光时,发现Al2O3／Al(111)样品绕法线旋转360度时,P-极化的SHG信号在空间三个方向上呈现最大值相等;当使用脉冲强度为12×100 W／cm2的1064 nm P-极化泵浦激光时, Al2O3／Al(111)表面被损坏,损坏后的表面其SHG信号并不呈现对称的各向异性变化,当使用脉冲强度为11×106W／cm2的1064 nm P-极化泵浦激光时产生表面退火现象,从退火表面所产生的反射532 nm P-极化SHG信号中发现,SHG信号呈现衰减的各向异性成分。     

发光二极管负电容与角频率的关系

利用正向交流(AC)小信号方法对发光二极管(LED)的电容-电压特性进行测量,可以观察到发光二极管中的负电容现象.提出了测量到的负电容现象是表象,不存在负电容;发光二极管p-n结的结电容在特定的正向电压范围内等效于可变电容.分析可变电容对交流小信号响应得到:特定参数的可变电容使电流的相位移相π,使得在测量中表现为负电容;得到了发光二极管负电容与角频率的关系表达式.     

发光二极管负电容与角频率的关系

利用正向交流(AC)小信号方法对发光二极管(LED)的电容-电压特性进行测量,可以观察到发光二极管中的负电容现象.提出了测量到的负电容现象是表象,不存在负电容;发光二极管p-n结的结电容在特定的正向电压范围内等效于可变电容.分析可变电容对交流小信号响应得到:特定参数的可变电容使电流的相位移相π,使得在测量中表现为负电容;得到了发光二极管负电容与角频率的关系表达式.     

铁电薄膜电滞回线测量的快速数值补偿方法研究

测量铁电薄膜电滞回线必须补偿漏电阻和线性电容的影响.本文采用Sawyer-Tower改进电路,分析了在正弦激励电场下漏电阻和线性电容对自发极化的影响,指出二者分别关于饱和极化点奇对称和偶对称;利用正峰值饱和极化点及其前后相邻两点共3对激励电压和极化电压,推导出漏电阻和线性电容计算公式,进而可实现电滞回线快速数值补偿.本算法漏电阻和线性电容的计算时间仅为二分法用时的2%.     

ALD氧化铝薄膜介电性能及其在硅电容器的应用

硅基高密度电容器是利用半导体3D深硅槽技术和应用高介电常数(高K)材料制作的电容。相比钽电容和多层陶瓷电容(MLCC),硅基电容具有十年以上的寿命、工作温度范围大、容值温度系数小以及损耗低等优点。文章研究原子层沉积(ALD)制备的Al2O3薄膜的介电特性,通过优化ALD原子沉积温度和退火工艺,发现在沉积温度420℃和O3气氛退火5 min下,ALD生长的Al2O3薄膜击穿强度可大于0.7 V/nm,相对介电常数达8.7。制成的硅基电容器电容密度达到50 nF/mm2,漏电流小于5 nA/mm2。     

朗缪尔铁电聚合物薄膜的电学特性:高热释电系数和低介电常数

研究了利用朗缪尔技术(LB)生长在柔性基底上的聚偏氟乙烯和三氟乙烯的共聚物(P(VDF-TrFE))薄膜的电学性质.通过测量相对介电常数和热释电系数,发现薄膜在室温1kHz时的优值因子达到1.4 Pa~(-1/2).这表明利用LB技术生长的P(VDF-TrFE)薄膜是热释电探测器的优良候选材料.优值因子的提高可能来源于LB薄膜的良好结晶性和分子链在平面内的高度有序性.     

Characterization of current transport in ferroelectric polymer devices

We report the charge injection characteristics in poly(vinylidene fluoride-trifluoroethylene), P(VDF-TrFE), as a function of electrode material in metal/ferroelectric/metal device structures. Symmetric and asymmetric devices with Al, Ag, Au and Pt electrodes were fabricated to determine the dominant carrier type, injection current density, and to propose transport mechanisms in the ferroelectric polymer. Higher work function metals such as Pt are found to inject less charges compared to lower work function metals, implying n-type conduction behavior for P(VDF-TrFE) with electrons as the dominant injected carrier. Two distinct charge transport regimes were identified in the P(VDF-TrFE) devices; a Schottky-limited conduction regime for low to intermediate fields (E < 20 MV/m), and a space-charge limited conduction (SCLC) regime for high fields (20 < E < 120 MV/m). Implication of these results for degradation in P(VDF-TrFE) memory performance are discussed.     

背照射波长延伸InGaAs面阵焦平面探测器

在MBE外延生长的In0.8Al0.2As/In0.8Ga0.2As材料上,采用台面成型方法制备了背照射32?32元InGaAs探测器,其中心距为30μm,并详细分析了探测器及其焦平面光电性能。结果表明,温度高于220K时吸收层材料热激活能为0.443eV,300K时在所考虑的偏压范围内,暗电流主要由扩散电流、产生复合电流及其欧姆漏电流构成。对组件焦平面特性也进行了研究,并通过读出电路的变积分电容测试结构测试结果提取出积分电容上的寄生电容,在测试温度范围内约为10fF左右。     

Size effect on polarization switching kinetics of P(VDF-TrFE) copolymer nanodots

We demonstrate polarization switching kinetics of poly(vinylidene fluoride-ran-trifluoroethylene) P(VDF-TrFE) nanodots depending on their sizes. Ferroelectric copolymer P(VDF-TrFE) nanodots, ranging from 20 to 250 nm in lateral size, were deposited on a Nb-doped SrTiO₃ substrate by a position-controlled dip-pen nanolithography technique. Ferroelectric switching characteristics of P(VDF-TrFE) nanodots was investigated by piezoresponse force microscopy. Asymmetric switching behavior was observed during switching process, indicating that the threshold electric fields for polarization reversal were measured differently under the same conditions according to the switching polarity. Significantly, when the size of P(VDF-TrFE) nanodot approached around 250 nm, electric fields for polarization switching were compatible with those of the P(VDF-TrFE) thin film. We suggest that the electric fields required for polarization reversal of the P(VDF-TrFE) nanodots present asymmetric switching behaviors, and asymptotic behavior be observed as the nanodots increase in lateral size.     

Low-voltage,high speed inkjet-printed flexible complementary polymer electronic circuits

We report the development of high-performance inkjet-printed organic field-effect transistors (OFETs) and complementary circuits using high-k polymer dielectric blends comprising poly(vinylidenefluoride-trifluoroethylene) (P(VDF-TrFE)) and poly(methyl methacrylate) (PMMA) for high-speed and low-voltage operation. Inkjet-printed p-type polymer semiconductors containing alkyl-substituted thienylenevinylene (TV) and dodecylthiophene (PC12TV12T) and n-type P(NDI2OD-T2) OFETs showed high field-effect mobilities of 0.1–0.4 cm² V^?1 s^?1 and low threshold voltages down to 5 V. These OFET properties were modified by changing the blend ratio of P(VDF-TrFE) and PMMA. The optimum blend – a 7:3 wt% mixture of P(VDF-TrFE) and PMMA – was successfully used to realize high-performance complementary inverters and ring oscillators (ROs). The complementary ROs operated at a supplied bias (V_DD) of 5 V and showed an oscillation frequency (f_osc) as high as ～80 kHz at V_DD = 30 V. Furthermore, the f_osc of the complementary ROs was significantly affected by a variety of fundamental parameters such as the electron and hole mobilities, channel width and length, capacitance of the gate dielectrics, V_DD, and the overlap capacitance in the circuit configuration.     

铝电解电容器阴极箔的后处理和稳定化处理

研究硝酸后处理对阴极箔比容的影响和稳定化处理形成氧化膜的机理。硝酸浓度和温度低 ,侵蚀箔稳定化处理后氧化膜不稳定 ,容量衰减快。浓度和温度高 ,侵蚀箔容量损失大 ,侵蚀箔的初始比容低。加入硫脲和六偏磷酸钠可提高铝箔的初始比容。磷酸和钼酸钠迭加处理使侵蚀箔获得高的初始比容和低的容量衰减率 ,磷酸处理形成氧化膜可分为 Al PO4结构的表面层及 Al PO4和部分 Al被 P代替的水合氧化铝的过渡层。钼酸钠处理形成的氧化膜可分为 Al2 (Mo O4) 3结构的表面层及 A12 (Mo O4) 3和部分 Al被 Mo代替的水合氧化铝过渡层     

Influence of nano-embossing on properties of poly(VDF-TrFE)

Poly(vinylidene fluoride-trifluoroethylene), P(VDF-TrFE), copolymer films nanostructures are attracting increasing interests for potential applications in FERAM, NEMS and sensors. In this work we apply hot embossing lithography to fabricate P(VDF-TrFE) copolymer nanostructures and investigate the influence of this patterning process on the material and electrical properties by using AFM, XRD, FTIR and Precision Ferroelectric Tester. It was found that nano-embossing technique offers not only a low-cost and effective way to fabricate nanoscale structures but also a way to control the orientation and crystal quality of P(VDF-TrFE) films. The electrical measurement also indicated superior ferroelectric characteristics for the imprinted structure to the un-imprinted area of P(VDF-TrFE) films.     

Charge transport mechanism of Al/Bi2Te3/Al thin film devices

Results of dielectric and conduction properties of vacuum evaporated Bi₂Te₃ thin film capacitors (Al/Bi₂Te₃/Al) have been reported in the frequency range 12 Hz to 100 kHz at various temperatures (303–423 K). The variation of capacitance and dielectric constant was found to be temperature and frequency dependent. The capacitance of the film decrease with increasing temperature which may be due to the expansion of the lattice and also due to the excitation of charge carriers at the sites of imperfection. The dielectric constant decreases with frequency at all temperature. This can be attributed to an interfacial polarization caused by space charge. The prevailing ac conduction mechanism in these films is hopping type. The activation energies were evaluated for various thicknesses and it is found to be 0.016 and 0.014 eV for the frequencies 200 Hz and 1 kHz, respectively.     

Al_xGa_(0.52-x)In_(0.48)P/GaAs异质结双极晶体管高温特性的计算分析

建立了适用于缓变 Alx Ga0 .5 2 -x In0 .48P/Ga As HBT的解析模型。考虑了 Al组分 x的变化对 HBT温度特性的影响。分析结果表明 ,在实用的电流范围 (Jc在 1 0 3 A/cm2 左右 )内 ,Alx Ga0 .5 2 -xIn0 .48P/Ga As HBT随着 x的增大 ,其电流增益的稳定性也上升 ,当 x=0 .3时工作温度可超过 70 0K。文章还分析了高温时 HBT电流增益下降的原因