提高薄膜太阳能电池光谱响应的光学结构设计

光吸收效率是提高薄膜太阳能电池的光电转换效率的关键,通过增加入射光在太阳能电池中的光程的方法提升电池的吸收效率。采用有限元法对薄膜太阳能电池进行参数和结构优化。首先设计了一维具有分布式布拉格反射器性能,波长范围在400~800nm的的光子晶体DBR结构作为电池的背反射,与单纯的PIN结构的太阳能电池相比,使光吸收效率和光谱响应分别提升了38%和45%,并在此基础上,在DBR表面刻蚀光栅作为薄膜硅太阳能电池的背底反射器。仿真结果表明:通过利用DBR的高反射性和光栅的衍射作用,在400~1 000nm光谱范围内,进一步提高了太阳能电池的光吸收效率和光谱响应,通过与单纯PIN太阳能电池相比较,光吸收率和光谱响应分别提升了61.6%,和85.4%。     

二维亚波长抗反射光栅的制作及其特性分析

运用等效介质理论研究了占空比随深度变化的二维亚波长光栅的抗反射原理。对全息干涉法制得的正弦型光栅进行了详细分析,表明这类光栅形成了渐变折射率的抗反膜结构。设计并利用两柬相干光对称入射到记录介质（光刻胶）分两次曝光的全息方法制备了适用于可见波段的周期为310nm的二维正交正弦型光栅。测试结果表明这种光栅在整个可见光波段具有增透作用,有潜力作为传统抗反膜的替代品。将具有浮雕结构的记录介质为母版并采用模压或浇铸等方法,可将结构复制到其它材料上。这类抗反射材料具有制作简单、成本低、可大批量生产等优点。     

宽带干涉膜的散射损耗

测量了0.4～1.0微米间介质宽带镀膜的散射特性。它表明散射特性完全由表面粗糙度和膜系光学特性所决定。ZnS,ThF_4和MgF_2单层膜的散射损耗大约为10~(-2)％。但是,由于多层结构中的共振条件,宽带反射镜的散射可超过10％。为了计算任何多层膜的散射特性和降低宽带镀层的散射损耗,研制了一种散射模型,其计算值和实验结果一致。     

Ag纳米粒子等离子体共振增强太阳能电池吸收

针对薄膜太阳能电池硅薄膜层吸收效率较低的问题,提出了运用金属纳米粒子局域表面等离子体共振(LSPR)增强太阳能电池的吸收效率,采用时域有限差分(FDTD)法,模拟计算了太阳能电池中不同厚度的硅薄膜层吸收特性,分析了不同几何参数的矩形Ag纳米粒子与Ag背反射膜对增强太阳能电池吸收效率的影响作用。计算结果表明,硅薄膜层厚度为500nm的太阳能电池具有较高的吸收效率,通过调整Ag纳米粒子的相关参数,有效地降低了太阳电池硅薄膜表面的反射损耗,取得最大吸收增强因子为1.35。Ag背反射膜有效地降低了Ag纳米粒子硅薄膜结构的透射损耗,其最大的吸收增强因子达到1.42。     

光学增透膜

本文就1973～1980年间发表的几篇美、英、西德专利介绍数种光学增透膜。其中有四种是全可见光波段用,其它是可见光区间的单波长用。衬底有一种是人造树脂,其它均为折射率在1.42～1.85的玻璃。膜材料用MgF_2、SiO_2、ThF_4、LaF_2、NdF_3、BeONa_3(AlF_4)、Al_2O_3、CeF_3、LaF_3、LiF,折射率为1.32～1.62。中等折射率膜材料用MgO、ThO_2H_2、InO_2及MgO-Al_2O_3混合料,折射率为1.7～1.9。能用的高折射率膜材料有CeO_2、ZrO_2、TiO_2、Ta_2O_5、ZnS、ThO_2,折射率为2～2.3。膜层是2～9层。有一种1/4波长结构四层膜系,最佳反射在500nm波长处为0.06％,在440～620nm波段处为0.14％。另一种膜系,最差反射在500nm波长处为0.5％。     

光学薄膜设计中的色散影响的考虑

本文以近红外干涉截止滤光膜为例,考察了ZnS、MgF_2薄膜色散对光学薄膜特性的影响.分别给出了光谱特性的理论计算曲线和实验曲线.比对结果表明:紫外—可见—近红外波段区,ZnS比MgF_2色散大.必需考虑ZnS的折射率随波长的变化;经过色散修正的光谱特性曲线与实验曲线基本吻合.     

亚波长金属周期结构中表面等离子体相关机理和应用

研究了一种新型的有表面凹槽的亚波长金属光栅结构,通过改变表面凹槽填充物的折射率,可调控该结构的远场透射效率,在光学探测、生物传感等方面具有应用前景;结合金属波导理论,提出一种基于亚波长金属光栅波导结构的新型超分辨光刻方案,入射光波长为436 nm时,最高刻写分辨率可达34 nm.     

U型凹槽电极硅MSM结构光电探测器的研制

为了提高硅MSM结构光电探测器的光电响应度,制备了U型凹槽电极结构的探测器.5 V偏压下,对650 nm波长入射光的绝对光电响应度测试表明,凹槽电极结构的探测器最大光电响应度值为0.486 A/W,比同样尺寸的平版结构光电探测器提高了约6倍.文中也对比了具有抗反射膜和不具有抗反射膜的器件相对响应光谱的差别,并且比较分析了叉指间隙分别为5 μm和10 μm器件光电响应的不同.     

物理冶金多晶硅太阳电池叠层钝化减反射结构模拟

采用PC1D模拟软件对p型物理冶金多晶硅太阳电池的SiO2/Si Nx/SiNx叠层钝化减反射结构进行了计算模拟。结果表明:在SiNx/Si Nx双层减反射结构中引入SiO2钝化层后可以明显改善电池的外量子效率与表面减反射效果,并最终提高电池转换效率;随着SiO2膜厚度的增加,电池表面反射率呈先降低后增加的趋势,而电池外量子效率及转换效率则呈现出相反的趋势。二氧化硅膜厚度在2~8 nm时,电池转换效率变化不大,并在6 nm时效率达到最大值18.04%,当二氧化硅膜厚度大于8 nm后电池转换效率会出现明显下降。     

非垂直入射激光反射镜的性质

介绍用不同折射率和相同有效光学厚度的两层交替膜(ZnS和MgF_2)作基本材料制成的无损失交替介质多层激光反射镜。当偏振光垂直或平行于入射面时,计算了这种反射镜抑止带中心的反射率和抑止带宽度随入射角的变化。文中附图详细讨论了用计算机计算的反射镜(膜层数达20层)的结果。这些曲线图可根据预定的技术要求简化激光反射镜的设计,并可用来区别抑止带中心的最大或最小光谱反射率。     

Design of Ag nanograting for broadband absorption enhancement in amorphous silicon thin film solar cells

Light trapping is one of the key issues to improve the light absorption and increase the efficiency of thin film solar cells. The effects of the triangular Ag nanograting on the absorption of amorphous silicon solar cells were investigated by a numerical simulation based on the finite element method. The light absorption under different angle and area of the grating has been calculated. Furthermore, the light absorption with different incident angle has been calculated. The optimization results show that the absorption of the solar cell with triangular Ag nanograting structure and anti-reflection film is enhanced up to 96% under AM1.5 illumination in the 300–800 nm wavelength range compared with the reference cell. The physical mechanisms of absorption enhancement in different wavelength range have been discussed. Furthermore, the solar cell with the Ag nanograting is much less sensitive to the angle of incident light. These results are promising for the design of amorphous silicon thin film solar cells with enhanced performance.     

硫化锌基底可见-红外多波段的光学薄膜

由于硫化锌(ZnS)晶体透光区域较宽,常被用于多波段可见与红外光学系统中。介绍了在ZnS基底上制备的多波段光学薄膜,在400~700nm的可见波段及8~12μm的中长波红外波段实现高透射率,在1064nm及1540nm两点实现高反射率,其入射角度为45°。选取了ZnS和YbF3作为高低折射率材料,设计并通过软件优化出合理的膜系,采用电子枪离子辅助沉积系统进行镀制。该薄膜能够承受雨淋、盐雾、高低温等环境测试,满足使用要求。这对于红外光学系统的应用具有极其重要的意义。     

Large-scale,adhesive-free and omnidirectional 3D nanocone anti-reflection films for high performance photovoltaics

An effective and low-cost front-side anti-reflection(AR) technique has long been sought to enhance the performance of highly efficient photovoltaic devices due to its capability of maximizing the light absorption in photovoltaic devices. In order to achieve high throughput fabrication of nanostructured flexible and anti-reflection films, large-scale, nano-engineered wafer molds were fabricated in this work. Additionally, to gain in-depth understanding of the optical and electrical performance enhancement with AR films on polycrystalline Si solar cells, both theoretical and experimental studies were performed. Intriguingly,the nanocone structures demonstrated an efficient light trapping effect which reduced the surface reflection of a solar cell by17.7% and therefore enhanced the overall electric output power of photovoltaic devices by 6% at normal light incidence. Notably, the output power improvement is even more significant at a larger light incident angle which is practically meaningful for daily operation of solar panels. The application of the developed AR films is not only limited to crystalline Si solar cells explored here, but also compatible with any types of photovoltaic technology for performance enhancement.     

Sputter-Deposited AlTiO Thin Films for Semi-Transparent Silicon Thin Film Solar Cells

This paper reports on sputter-deposited AlTiO (ATO) thin films and their effects on the performance of semi-transparent silicon thin film solar cells. The electrical resistivity and the transparency of the ATO films depend significantly on the flow ratio of oxygen to argon during the reactive sputtering process. With highly transparent ATO films, transmittances of over 80% were obtained by increasing this flow ratio. When the ATO films were used on silicon substrates, they exhibited an anti-reflection property, where the minimum reflectance at visible light wavelength was decreased to 1.2%. The introduction of ATO thin film layers into solar cells resulted in a 24% increase in transmittance at wavelengths of around 700 nm, due to the film’s anti-reflection characteristic. In addition, the color of the cells changed from green to bright red as the ATO layers were adopted. These beneficial effects of the sputter-deposited ATO films suggest an effective pathway towards the semi-transparent silicon thin film solar cells for building-integrated photovoltaic system applications.     

基于反射光谱的单层抗反射膜的非在位膜厚精确控制

提出一种基于反射光谱分析的非在位膜厚控制技术,首先利用椭圆偏振光谱仪确定波长300～1 700 nm范围内的薄膜折射率,由此确定对应于特定波长(如1 550 nm)的最佳抗反射(AR)镀膜沉积条件。然后计算最佳AR镀膜厚度所对应的反射谱,得到相应的CIE标准色谱坐标。通过对比实测镀膜颜色和计算得到的最佳颜色,可以实现小尺寸器件端面上AR镀膜厚度的优化控制。利用这一方法,由等离子体增强化学气相沉积(PECVD)制备的SiNx单层AR镀膜,获得了4.4×10-4的反射率。     

色散效应对钝化硅太阳电池减反射膜系设计的影响

在考虑折射率色散效应基础上,以加权平均反射率作为评价函数,通过智能优化算法对空间硅太阳电池减反射膜进行优化设计,得到了最佳的膜厚参数,并与不考虑色散下设计的减反射膜进行了比较。对MgF2/TiO2,SiO2/TiO2双层减反射膜,与不考虑色散情形相比,考虑色散下优化后的最小加权平均反射率分别减小了36.6%和37.6%;对具有厚度为15 nm的SiO2钝化层的硅太阳电池的MgF2/TiO2,SiO2/TiO2减反射膜重新优化设计,与不考虑色散情形相比,考虑色散下优化后的最小加权平均反射率分别减小了43.9%和33.7%;对具有不同厚度钝化层的空间硅太阳电池,在考虑色散下进行了减反射膜的优化设计。结果发现,随着钝化层厚度的增加,所得减反射膜的最小加权平均反射率也随之增大,减反射效果越来越弱。最后,在考虑与未考虑色散情形下,将钝化层膜厚也作为反演参量后重新设计。结果表明:在色散情形下所设计的减反射膜更佳,对于MgF2/TiO2/SiO2（钝化层）膜系,最佳膜厚参量为d1（MgF2）=97.6 nm,d2（TiO2）=40.2 nm,d3（SiO2）=4.9 nm;对于SiO2/TiO2/SiO2（钝化层）,最佳膜厚参量为d1（SiO2）=85.1 nm,d2（TiO2）=43.4 nm,d3（SiO2）=1.8 nm。     

1×3光栅光阀式光开关分析与设计

文章结合光栅光阀响应时间短和反射光栅衍射效率高的特点,设计了一种光栅光阀式1×3微型光开关.理论计算和对比实验表明,在波长为1.3 μm,闪耀角和入射角分别为5.4 °和0 °的情况下,开关时间为微秒级.与同类光开关相比,这种开关具有开关时间短、衍射效率高和工作电压低的优点.     

单片集成倾斜SOA的宽可调谐取样光栅分布布拉格反射激光器

高功率和宽调谐范围的单片集成倾斜SOA的宽可调谐取样光栅分布布拉格反射激光器被成功制备。倾斜的SOA结构和端面增透膜有效的降低了端面的反射率。器件调谐范围大于38nm,波长覆盖较好,调谐范围内波长输出功率均大于9mW。     

Monolithic integration of widely tunable sampled grating DBR laser with tilted semiconductor optical amplifier

High output powers and wide range tuning have been achieved in a sampled grating distributed Bragg reflector laser with an integrated semiconductor optical amplifier. Tilted amplifier and anti-reflection facet coating are used to suppress reflection. We have demonstrated sampled grating DBR laser with a tuning range over 38 nm, good wavelength coverage and peak output powers of more than 9 mW for all wavelengths.     

Light trapping effect of submicron surface textures in crystalline Si solar cells

Recently, submicron textures have been researched and applied to multicrystalline silicon solar cells in order to improve their optical performance. In this study, the antireflection and light trapping effects of submicron surface textures in crystalline Si (c‐Si) solar cells were quantitatively investigated by numerical simulations based on Maxwell's equations with a simple two‐dimensional (2D) surface grating model. The calculated results showed that the surface reflection loss can be effectively reduced by using submicron Si surface gratings with appropriate aspect ratios. On the other hand, higher order diffractions that are caused by surface gratings that increase optical path lengths and light absorption near the band gap wavelength are dominant only for those with periods greater than 0·5 µm. From these results, it was inferred that submicron textures are effective for light trapping as well as for antireflection in thin c‐Si solar cells if appropriate dimensions are chosen. Copyright © 2007 John Wiley & Sons, Ltd.