SiGe HBT MEXTRAM模型参数的直接提取

提出了一种锗硅异质结双极晶体管(SiGe HBT)MEXTRAM集约模型参数的直接提取方法。该方法通过有效地区分各种器件物理效应对器件性能的影响,无需电路仿真器,就能够提取器件的模型参数,简便实用。通过提取实验制备的SiGe HBT器件的整套MEXTRAM模型参数,仿真曲线与测试数据吻合良好,证实了该方法的精确性和有效性。     

MEXTRAM 504模型及其对SiGe HBT的模拟

针对传统SGP模型的不足,介绍了一种新型的BJT模型MEXTRAM 504及其等效电路,与传统模型相比。MEX-TRAM显示了极高的准确度。由于特别增加了描述基区缓变和基区载流子复合的两个参数,使MAXTRAM适合模拟加入SiGe工艺技术的HBT,模拟曲线与Medici的模拟相当吻合,为射频器件设计和电路模拟奠定了良好的基础。     

Substrate current based avalanche multiplication measurement in 120 GHz SiGe HBTs

A new substrate current-based technique for measuring the avalanche multiplication factor (M - 1) in high-speed SiGe heterojunction bipolar transistors (HBTs) is proposed. The technique enables M - 1 measurement at high operating current densities required for high-speed operation, where conventional techniques fail because of self-heating. Using the proposed technique, M - 1 was measured up to 10 mA//spl mu/m/sup 2/ on SiGe HBTs featuring 120 GHz peak f/sub T/ which occurs at J/sub C/ about 7 mA//spl mu/m/sup 2/. Implications for circuit applications are also discussed.     

极端低温下SiGe HBT器件研究进展

系统地介绍了极端低温下SiGe HBT器件的研究进展。在器件级,分析了能带工程对SiGe HBT器件特性的影响,分析了极端低温下器件的直流、交流、噪声特性的变化,以及器件的特殊现象。在电路级,分析了基于SiGe HBT的运算放大器、低噪声放大器和电压基准源电路的低温工作特性。研究结果表明,SiGe HBT器件在低温微电子应用中具有巨大潜力。     

SiGe HBT非准静态小信号等效电路的参数提取

提出了一种硅锗异质结双极型晶体管（SiGe HBT）非准静态效应的小信号等效电路模型的参数提取方法。整个参数提取过程建立在由非准态效应的小信号等效电路推导出的一系列泰勒级数解析公式并结合参数直接法,该方法依赖于测量的S参数,不使用任何的数值优化法,参数提取结果使用CAD仿真验证。结果表明该参数提取方法简单易行,较为精确,该方法能够用到不同工艺SiGe HBT参数提取。     

异质结位置对缓变集电结SiGe HBT性能的影响

研究了npn型SiGe HBT集电结附近的异质结位置对器件性能的影响.采用Taurus-Medici 2D器件模拟软件,在渐变集电结SiGe HBT的杂质分布不变的情况下,模拟了各种异质结位置时的器件直流增益特性和频率特性.同时比较了处于不同集电结偏压下的直流增益和截止频率.分析发现即使没有出现导带势垒,器件的直流和高频特性仍受SiGe层中性基区边界位置的影响.模拟结果对SiGe HBT的设计和分析都具有实际意义.     

SiGe HBT高频噪声等效模型研究

对硅锗异质结双极型晶体管（SiGe HBT）等效高频噪声模型进行了研究,在建模过程中,SiGe HBT的等效电路为小信号准静态等效电路,使用二端口网络噪声相关矩阵技术从实测噪声参数提取基极和发射极的散粒噪声,提取结果与几种散粒噪声模型进行对比分析,重点研究半经验模型建立过程,对半经验模型与常用的噪声模型使用CAD仿真验证,结果表明了半经验模型的有效性、更具准确性,该半经验模型能够用到不同工艺SiGe HBT的高频噪声模拟。     

一种优化的SiGe HBT集约模型及参数提取方法

通过合理简化和改进MEXTRAM模型,提出了一种优化的SiGe HBT集约模型和参数提取方法;精确提取了一组微波SiGe HBT的模型参数。仿真结果与测试数据的相对误差不超过3%。     

An analysis of base bias current effect on SiGe HBTs

The anomalous dip in scattering parameter S/sub 11/ of SiGe heterojunction bipolar transistors (HBTs) is explained quantitatively for the first time. Our results show that for SiGe HBTs, the input impedance can be represented by a "shifted" series RC circuit at low frequencies and a "shifted" parallel RC circuit at high frequencies very accurately. The appearance of the anomalous dip of S/sub 11/ in a Smith chart is caused by this inherent ambivalent characteristic of the input impedance. In addition, it is found that under constant collector-emitter voltage (V/sub CE/), an increase of base current (which corresponds to a decrease of base-emitter resistance (r/sub /spl pi//) and an increase of transconductance (g/sub m/)) enhances the anomalous dip, which can be explained by our proposed theory.     

An approach for SiGe HBT small-signal modelling up to 40 GHz

In this article, a simple method for the small-signal equivalent-circuit modelling of SiGe heterojunction bipolar transistors (HBTs) fabricated with a 0.13-μm BiCMOS technology is proposed. The presented transistor model is compatible with BiCMOS processes and takes into account the parasitic effects such as substrate effect and the extrinsic capacitances. The parameter-extraction approach is based on the analytically derived equations in conjunction with the optimisation technology. The intrinsic parameters are described as the function of extrinsic resistances. The extrinsic resistances are iteratively extracted by the variance of the intrinsic elements as an optimisation criterion. The proposed modelling approach is validated by SiGe HBTs with 0.2 × 5.9 μm² emitter occupying area from 50 MHz to 40 GHz. The agreements between the measured and modelled data are excellent in the desired frequency range over a wide range of bias points with different bias conditions.     

异质结位置对缓变集电结SiGe HBT性能的影响

研究了npn型SiGe HBT集电结附近的异质结位置对器件性能的影响.采用Taurus-Medici 2D器件模拟软件,在渐变集电结SiGe HBT的杂质分布不变的情况下,模拟了各种异质结位置时的器件直流增益特性和频率特性.同时比较了处于不同集电结偏压下的直流增益和截止频率.分析发现即使没有出现导带势垒,器件的直流和高频特性仍受SiGe层中性基区边界位置的影响.模拟结果对SiGe HBT的设计和分析都具有实际意义.     

An improved parameter extraction method of SiGe HBTs' substrate network

In this letter, an improved method for substrate network parameter extraction of SiGe heterojunction bipolar transistors (HBTs) is proposed. It is found that, without taking the intrinsic circuit elements into consideration, the conductance of substrate network will be underestimated while the susceptance of substrate network will be overestimated. Therefore, an iteration procedure is developed to determine the intrinsic circuit elements of SiGe HBTs first. The intrinsic circuit elements are then applied to remove their influence on the substrate network parameter extraction. Compared with the conventional method, the proposed one can avoid some unphysical modeling results and provide reliable substrate network parameters.     

A New Analytical Method for Robust Extraction of the Small-Signal Equivalent Circuit for SiGe HBTs Operating at Cryogenic Temperatures

We present a new analytical direct parameter-extraction methodology for obtaining the small-signal equivalent circuit of HBTs. It is applied to cryogenically operated SiGe HBTs as a means to allow circuit design of SiGe HBT low-noise amplifiers for cooled radio astronomy applications. We split the transistor into an intrinsic transistor (IT) piece modeled as a Pi-topology, and the quasi-intrinsic transistor (QIT), obtained from the IT after that the base resistance (R_b) has been removed. The relations between Z-Y-parameters of the IT and QIT are then established, allowing us to propose a new methodology for determining R_b. The present extraction method differs from previous studies in that each of the model elements are obtained from exact equations that do not require any approximations, numerical optimization, or post-processing. The validity of this new extraction methodology is demonstrated by applying it to third-generation SiGe HBTs operating at liquid-nitrogen temperature (77 K) across the frequency range of 2-22 GHz.     

SiGe HBT的脉冲中子及γ辐射效应

测量了反应堆脉冲中子及γ辐照SiGe HBT典型电参数变化.在反应堆1×1013cm-2的脉冲中子注量和256.85Gy(Si)γ总剂量辐照后,SiGe HBT静态共射极直流增益减小了20%.辐照后基极电流、结漏电流增大,集电极电流、击穿电压减小.特征截止频率fT基本不变,fmax略有减小.初步分析了SiGe HBT反应堆脉冲中子及γ辐射的损伤机理.     

A 0.2-μm 180-GHz-fmax 6.7-ps-ECL SOI/HRS self-alignedSEG SiGe HBT/CMOS technology for microwave and high-speed digitalapplications

A technology for combining 0.2-μm self-aligned selective-epitaxial-growth (SEG) SiGe heterojunction bipolar transistors (HBTs) with CMOS transistors and high-quality passive elements has been developed for use in microwave wireless and optical communication systems. The technology has been applied to fabricate devices on a 200-mm SOI wafer based on a high-resistivity substrate (SOI/HRS). The fabrication process is almost completely compatible with the existing 0.2-μm bipolar-CMOS process because of the essential similarity of the two processes. SiGe HBTs with shallow-trench isolations (STIs) and deep-trench isolations (DTIs) and Ti-salicide electrodes exhibited high-frequency and high-speed capabilities with an f_max of 180 GHz and an ECL-gate delay of 6.7 ps, along with good controllability and reliability and high yield. A high-breakdown-voltage HBT that could produce large output swings for the interface circuit was successfully added. CMOS devices (with gate lengths of 0.25 μm for nMOS and 0.3 μm for pMOS) exhibited excellent subthreshold slopes. Poly-Si resistors with a quasi-layer-by-layer structure had a low temperature coefficient. Varactors were constructed from the collector-base junctions of the SiGe HBTs. MIM capacitors were formed between the first and second metal layers by using plasma SiO₂ as an insulator. High-Q octagonal spiral inductors were fabricated by using a 3-μm thick fourth metal layer     

Direct parameter extraction of SiGe HBTs for the VBIC bipolar compact model

An improved direct parameter extraction method of SiGe heterojunction bipolar transistors (HBTs) for the vertical bipolar intercompany (VBIC)-type hybrid-/spl pi/ model is developed. All the equivalent circuit elements are extracted analytically from S-parameter data only and without any numerical optimization. The proposed technique of the parameter extraction, differing from the previous ones, focuses on correcting the pad de-embedding error for an accurate and invariant extraction of intrinsic base resistance (R/sub bi/), formulating a new parasitic substrate network, and improving the extraction procedure of transconductance (g/sub m/), dynamic base-emitter resistance (r/sub /spl pi//), and base-emitter capacitance (C/sub /spl pi//) using the accurately extracted R/sub bi/. The extracted parameters are frequency-independent and reliable due to elimination of any de-embedding errors. The agreements between the measured and model-calculated data are excellent in the frequency range of 0.2-10.2 GHz over a wide range of bias points. Therefore, we believe that the proposed extraction method is a simple and reliable routine applicable to the optimization of transistor design, process control, and the improvement of VBIC compact model, especially for SiGe HBTs.     

基于HICUM模型的高速锗硅异质结双极性晶体管可缩放模型研究

针对高速锗硅异质结双极性晶体管,在基于HICUM模型的基础上,建立了HICUM可缩放模型,并且在ADS和Hspice中都得到了很好的应用.可缩放模型是基于不同的尺寸的器件而建立的,所有可缩放模型中的参数都是直接从不同尺寸器件的测量数据中取得的,并且通过比较直流、电压电容关系、截止频率和S参数的测量和仿真数据,可以看出拟合结果比较好,HICUM可缩放模型得到了很好的验证.     

一种低噪声SiGe微波单片放大电路

介绍了一种利用SiGe技术制作的低噪声SiGe微波单片放大电路(MMIC)。该电路以达林顿结构的形式级联,由两个异质结双极型晶体管(HBT)和4个电阻组成;HBT采用准自对准结构,其SiGe基区为非选择性外延。在1 GHz频率下,电路噪声为1.59 dB,功率增益为14.3 dB,输入驻波比为1.6,输出驻波比为2.0。     

MEXTRAM modeling of Si-SiGe HPTs

The integration of the photodetector is essential for optical communication chips. The heterojunction phototransistor (HPT) is integrable with the SiGe HBT process and can be modeled by a modified MEXTRAM model for the circuit simulation. The impact ionization to obtain an extra gain for the optoelectronic conversion and the "early voltage reduction" under constant illumination are well modeled in a modified model. The base recombination current (nkT current) and the substrate contact to enhance the HPT speed are incorporated in ac model. It shows a good agreement between measurement and simulation.     

一种2.4 GHz全集成SiGe BiCMOS功率放大器

针对2.4 GHz 802.11 b/g无线局域网(WLAN)的应用,该文设计了一种单片全集成的射频功率放大器(PA)。由于在自适应偏置电路中采用异质结晶体管(HBT)和电容构成的简单结构提高PA的线性度,因此不增加PA的直流功耗、插损和芯片面积。在基极偏置的DC通路中采用电阻负反馈实现温度稳定功能,有效避免热崩溃的同时不引起射频损耗。采用了GRACE 0.18mSiGe BiCMOS 工艺流片,芯片面积为1.56 mm2,实现了包括所有偏置电路和匹配电路的片上全集成。测试结果表明,在2.4-2.5 GHz工作频段,PA的小信号S21增益达23 dB,输入回波损耗S11小于-15 dB。PA的 1 dB 输出压缩点的线性输出功率为19.6 dBm,功率附加效率为20%,功率增益为22 dB。