A sensitivity and linearity improvement of a 100-dB dynamic range CMOS image sensor using a lateral overflow integration capacitor

In a CMOS image sensor featuring a lateral overflow integration capacitor in a pixel, which integrates the overflowed charges from a fully depleted photodiode during the same exposure, the sensitivity in nonsaturated signal and the linearity in saturated overflow signal have been improved by introducing a new pixel circuit and its operation. The floating diffusion capacitance of the CMOS image sensor is as small as that of a four transistors type CMOS image sensor because the lateral overflow integration capacitor is located next to the reset switch. A 1/3-inch VGA format (640/sup H//spl times/480/sup V/ pixels), 7.5/spl times/7.5 /spl mu/m/sup 2/ pixel color CMOS image sensor fabricated through 0.35-/spl mu/m two-poly three-metal CMOS process results in a 100 dB dynamic range characteristic, with improved sensitivity and linearity.     

High-sensitivity and no-crosstalk pixel technology for embeddedCMOS image sensor

A high-photosensitivity and no-crosstalk pixel technology has been developed for an embedded active-pixel CMOS image sensor, by using a 0.35-μm CMOS logic process. To increase the photosensitivity, we developed a deep p-well photodiode and an antireflective film, consisting of Si₃N₄ film, for the photodiode surface. To eliminate the high voltage required for the reset transistor in the pixel, we used a depletion-type transistor as the reset transistor. The reset transistor also operates as an overflow control gate, which enables antiblooming overflow when excess charge is generated in the photodiode by high-illumination conditions. To suppress pixel crosstalk caused by obliquely incident light, a double-metal photoshield was used, while crosstalk caused by electron diffusion in the substrate was suppressed by using the deep p-well photodiode. A 1/3-in 330-k-pixel active-pixel CMOS image sensor was fabricated using this technology. A sensitivity improvement of 110% for 550-nm incident light was obtained by using the deep p-well photodiode, while an improvement of 24% was obtained by using the antireflective film. The pixel crosstalk was suppressed to less than 1% throughout the range of visible light     

Light-soaking effects on a-Si:H photodiodes deposited by thelaminar-flow photo-CVD method

A 2/3-in, 2-Mpixel, STACK-CCD imaging sensor has been developed for HDTV solid-state imagers. A new a-Si:H photo-conversion layer, fabricated by the laminar-flow photo-chemical-vapor-deposition method, is overlaid on the vertical CCD scanning circuitry in the sensor. The photodegradation behavior of a-Si:H photodiodes is investigated in terms of dark-current density, electron μτ product and transient photocurrent. These properties are degraded as a result of light-induced defects in the a-Si:H layer. The Staeblar-Wronski constants, C_sw , are estimated to be 7.5×10^-7 at no voltage and 1.1×10^-7 at a reverse voltage of 6 V applied to the photodiode during light-soaking with an AM-1 lamp. The lifetime of the photodiode is determined by the degradation of the transient photocurrent, and is estimated to be about 2.2×10⁸ h for 1 lx light exposure. The lifetime is considered to be improved compared with that of previous-type photodiode reported before (1.5×10⁷ h for 1.5 lx light exposure) and clearly satisfies the needs for practical use of the device     

Optimum Design of Conversion Gain and Full Well Capacity in CMOS Image Sensor With Lateral Overflow Integration Capacitor

An optimum design theory to clarify a possible limit of achieving both high conversion gain (CG) and full well capacity (FWC) at the same time in a CMOS image sensor with a lateral overflow integration capacitor (LOFIC) in a pixel is discussed. The possible limit of both high CG and high FWC is theoretically derived from a signal-to-noise-ratio (SNR) formula at a switching point from a low light signal (S1) to a bright one (S2). Based on this theory, a 1/4-in VGA-format 5.6-mum-pixel-pitch CMOS image sensor has been fabricated through a 0.18-mum 2P3M CMOS technology. A high-quality wide-dynamic-range image sensing has been demonstrated with no significant visible noise, achieving over 32 dB of SNR for an 18% gray card.     

A 200-$mu$V/e$^{-}$ CMOS Image Sensor With 100-ke$^{-}$ Full Well Capacity

A high-sensitivity CMOS image sensor keeping a high full-well capacity has been developed by introducing a new pixel having a small floating diffusion (FD) capacitance connected to a lateral overflow integration capacitor (LOFIC) through a MOS switch. The conceptual advantage of the small FD approach over conventional column amplifier approaches is compared and demonstrated. To ensure both the high sensitivity and the high full-well capacity, the low-light and the bright-light signals (S1 and S2) are output and reproduced without a visible SNR degradation at the S1/S2 switching point. As the most critical problem, the increase of the conversion gain variation in this approach is suppressed by applying a self-aligned offset structure to the small FD. A 1/4-in VGA format CMOS image sensor fabricated through 0.18-mum 2P3M process achieves 2.2-e^- rms noise floor with 200-muV/e^- conversion gain and 100-ke^- full-well capacity.     

A 1.9 $e^{-}$ Random Noise CMOS Image Sensor With Active Feedback Operation in Each Pixel

A 1.9 e^- random noise CMOS image sensor has been developed by applying an active feedback operation (AFO), which uses a capacitive feedback effect to floating diffusion (FD) by a gate-source capacitance of a pixel source follower (SF), in a CMOS image sensor with a lateral overflow integration capacitor (LOFIC) technology. It is described that the AFO is suitable for CMOS image sensors with LOFIC because the design of the full well capacity and the FD can be independently optimized. The AFO theory is found to be explored to a large signal voltage in detail, as well as the conventional analysis of the capacitive feedback effect of the pixel SF for a small signal voltage. A 1/4-in 5.6- mum-pitch 640(H) times 480(V) pixel sensor chip in a 0.18-mum two-poly-Si three-metal CMOS technology achieves about 1.7 times the sensitivity with AFO compared with the case where the feedback operation is not positively used, resulting in an input-referred conversion gain of 210 muV/e^- and an input-referred noise of 1.9 e^-. A high well capacity of 130 000 e^- is also achieved.     

包含交流耦合CTIA与数字CDS的CMOS图像传感器设计

设计了一种带隔直电容的交流耦合CTIA像元电路与数字相关双采样（DCDS）结构的CMOS图像传感器系统。在传统的CTIA像元电路中增加隔直电容,通过控制光电二极管的偏压,达到减小光电二极管暗电流的目的;同时采用片外数字CDS结构,通过在片外实现复位信号与像元积分信号的量化结果在数字域的减法,可以减小图像传感器像元的复位噪声和固定图案噪声（FPN）。基于0.35 m标准CMOS工艺对此CMOS图像传感器进行流片,像元阵列为256256,像元尺寸为16 m16 m。测试结果表明交流耦合CTIA像元电路可以将光电二极管的偏压控制在零偏点附近,此时其暗电流最小;采用了数字CDS结构后,图像传感器像元的时域噪声及固定图案噪声均有不同程度降低。     

A High-Speed, High-Sensitivity Digital CMOS Image Sensor With a Global Shutter and 12-bit Column-Parallel Cyclic A/D Converters

This paper presents a high-speed, high-sensitivity 512times512 CMOS image sensor with column parallel cyclic 12-bit ADCs and a global electronic shutter. Each pixel has a charge amplifier for high charge-to-voltage conversion gain despite of using a large-size photodiode, and two sample-and-hold stages for the global shutter and fixed pattern noise (FPN) canceling. High-speed column-parallel cyclic ADC arrays with 12-bit resolution having a small layout size of 0.09 mm ² are integrated at both sides of image array. A technique for accelerating the conversion speed using variable clocking and sampling capacitance is developed. A digital gain control function using 14-bit temporal digital code is also set in the column parallel ADC. The fabricated chip in 0.25-mum CMOS image sensor technology achieves the full frame rate in excess of 3500 frames/s. The in-pixel charge amplifier achieves the optical sensitivity of 19.9 V/lxmiddots. The signal full scale at the pixel output is 1.8 V at 3.3-V supply and the noise level is measured to be 1.8mV_rms, and the resulting signal dynamic range is 60 dB     

低照度CMOS图像传感器设计与实现

设计了一种基于电容反馈跨阻放大器型（Capacitive Trans-impedance Amplifier,CTIA）像元电路与双采样（Delta Double Sampling,DDS）的低照度CMOS图像传感器系统。采用CTIA像元电路提供稳定的光电二极管偏置电压以及高注入效率,完成在低照度情况下对微弱信号的读取;同时采用数字DDS结构,通过在片外实现像元积分信号与复位信号的量化结果在数字域的减法,达到抑制CMOS图像传感器中固定图案噪声的目的,进一步提高低照度CIS的成像质量。基于0.35 m标准CMOS工艺对此基于CTIA像元电路的CMOS图像传感器芯片进行流片,像元阵列为256256,像元尺寸为16 m16 m。测试结果表明该低照度CMOS图像传感器系统可探测到0.05 lx光照条件下的信号。     

A Nyquist-rate pixel-level ADC for CMOS image sensors

A multichannel bit-serial (MCBS) analog-to-digital converter (ADC) is presented. The ADC is ideally suited to pixel-level implementation in a CMOS image sensor. The ADC uses successive comparisons to output one bit at a time simultaneously from all pixels. It is implemented using a 1-bit comparator/latch pair per pixel or per group of neighboring pixels, and a digital-to-analog-converter/controller shared by all pixels. The comparator/latch pair operates at very slow speeds and can be implemented using simple robust circuits. The ADCs can be fully tested by applying electrical signals without any optics or light sources. A CMOS 320×256 sensor using the MCBS ADC is described. The chip measures 4.14×5.16 mm². It achieves 10×10 μm² pixel size at 28% fill factor in 0.35 μm CMOS technology. Each 2×2 pixel block shares an ADC. The pixel block circuit comprises 18 transistors. It operates in subthreshold to maximize gain and minimize power consumption. The power consumed by the sensor array is 20 mW at 30 frames/s. The measured integral nonlinearity is 2.3 LSB, and differential nonlinearity is 1.2 LSB at eight bits of resolution. The standard deviation of the gain and offset fixed pattern noise due to the ADC are 0.24 and 0.2%, respectively     

A 128×128-pixel standard-CMOS image sensor with electronicshutter

A 128×128-pixel image sensor with a 20 s-10^-4 s electronic shutter has been integrated in a 1.2-μm digital CMOS technology. The pixel cell consists of four PMOS transistors and a photodiode with antiblooming suppression. Each pixel measures 24 μm by 24 μm and has a fill factor of 25%. Current is used to transfer pixel signals to the column readout amplifiers in order to minimize voltage swings on the highly capacitive column lines. Correlated double sampling is used to reduce intracolumn fixed pattern noise. The saturation voltage is 470 mV. The peak output signal to noise ratio is 45 dB, and the optical dynamic range is 56 dB. The frame transfer rate is 1.7 ms per frame     

A high-packing density pixel with punchthrough read-out method foran HDTV interline CCD

A new pixel structure for a high-packing-density interline CCD is proposed, in which signal charges are read out from the photodiodes to the vertical CCD by a punchthrough mechanism. This read-out method makes it possible to reduce the depth of the VCCD channel and the second p-well by implanting these two layers after diffusion of the photodiode n layer. Spreading resistance measurements on dummy wafers show that the depths of these layers are 0.28 μm and 0.6 μm, respectively. Moreover, the photodiode n-layer is covered with a surface p⁺-layer, even at the transfer region. We describe the results of simulations and experiments on a test image sensor with pixel dimensions of 7.3 μm (H)×7.6 μm (V). From the experimental data, we estimate the characteristics of an image sensor with pixel dimension 5.0 μm (H)×5.2 μm (V). Such a device should have a maximum charge handling capability of 1.4×10⁵ electrons, a smear level of -88 dB, a sensitivity of 1.5×10³ electrons/Ix with a 30% fill factor, no image lag, and a low photodiode dark signal of less than 14 electrons at 60°C. These results indicate that an IL-CCD with a punchthrough readout structure is suitable for image sensors with a high pixel density such as 2/3 inch 2 million pixel image sensors for high-definition TV applications     

The effect of size on photodiode pinch-off voltage for small pixel CMOS image sensors

The electron potential of a photodiode in a CMOS image sensor should be designed precisely since the charge capacity of the photodiode decreases as the pixel area shrinks. The pinch-off voltage of a photodiode, which also affects the electron capacity, is dependant on the doping profile of the pn junction as well as the size of the photodiode. The pinch-off voltage is lower in a smaller photodiode. A simple method that uses the lateral depletion of a photodiode for an estimate of the pinch-off voltage in small photodiodes is proposed, and is compared to the measured experimental data. Two constants are used to account for the doping profile and photodiode size. The measurement data shows the error of the estimation of the pinch-off voltage to be <0.05 V.     

CMOS有源像素传感器特性分析与优化设计

设计了一个三管有源像素和其用开关电容放大器实现的双采样读出电路.该电路被嵌入一64×64像素阵列CMOS图像传感器,在Chartered公司0.35μm工艺线上成功流片.在8μm×8μm像素尺寸下实现了57%的填充因子.测得可见光响应灵敏度为0.8V/(lux·s),动态范围为50dB.理论分析和实验结果表明随着工艺尺寸缩小,像素尺寸减小会使光响应灵敏度降低.在深亚微米工艺条件下,较深的n阱/p衬底结光电二极管可以提供合理的填充因子和光响应灵敏度.     

CMOS数字像素传感器噪声研究

在研究CMOS数字像素传感器(DPS)噪声特性的基础上,利用脉冲宽度调制(PWM)原理建立了关于PWM DPS完善的系统噪声数学模型。相比于传统CMOS图像传感器噪声研究,该模型考虑了系统中各像素单元积分时间不同和像素级模数转换的特点,推导出总噪声表达式。研究表明,低照度时噪声由暗电流散粒噪声主导,光强大时主要来源为光电二极管散粒噪声。模型中光电二极管散粒噪声与光照无关、暗电流散粒噪声与光照有关。研究结果表明针对PWM DPS系统,适当增大节点电容和比较器参考电压、改善比较器失配可有效降低噪声。     

A photodiode cell for applications to position and motionestimation sensors

An optical cell has been designed and fabricated using standard digital 1.6 μm CMOS technology. It has been designed for applications to sensors where the image acquisition time of fast moving objects or documents is of primary importance. The cell contains a photodiode working in storage mode and a shielded MOS capacitor acting as analog frame buffer. A chip prototype containing 64 linear arrays of 64 cells whose size is 36×36 μm² has been tested and measurements have proved the functionality down to microsecond-range of exposure times. By virtue of the proposed read-out technique, the sensor architecture provides simultaneous image acquisition of irregular moving objects allowing precise detection of position and motion     

A 1/4-inch 330 K square pixel progressive scan CMOS active pixelimage sensor

In this paper, three pixel structures have been studied as candidates to realize high density CMOS active pixel sensors. A novel cell structure, the “I-shaped” cell, in which the active regions are formed along a straight line, has been proposed for high-packing density devices. The “I-shaped” cells can realize minimum cell area of 16F², 14F², and 14F ² (F: design rule) for three-transistor-type, two-transistor-type, and one-transistor-type pixels, respectively. A 1/4-inch format progressive scan CMOS active pixel sensor with 640 (H)×480 (V) pixels has been fabricated using a 0.6-μm CMOS process. The sensor operates with 5.0 V single power supply, and power consumption is below 30 mW     

基于标准CMOS工艺的光敏传感单元结构的研究

基于0.6μm标准N阱CM O S工艺,研究了光敏管的结深及其侧墙结构对有源感光单元的感光面积百分比、光电响应信号幅值、感光灵敏度以及感光动态范围等参数的影响。研究了包括传统N+/P衬底的光敏管结构,以及网格状N+/P衬底,N阱/P衬底,网格状N阱/P衬底,P+/N阱/P衬底的光敏管结构。测试结果表明,不同深结深的光敏管结构,可以将器件感光灵敏度提高8~16.5 dB;网格状光敏管结构可以增加光敏管的侧墙面积,改善器件感光灵敏度;非网格状光敏管结构具有较低的暗电流和较大的感光动态范围,其中P+/N阱/P衬底光敏管结构的传感单元在变频两次扫描的工作方式下的感光动态范围可达139.8 dB。     

Ge-on-SOI-Detector/Si-CMOS-Amplifier Receivers for High-Performance Optical-Communication Applications

In this paper, an overview and assessment of high-performance receivers based upon Ge-on-silicon-on-insulator (Ge-on-SOI) photodiodes and Si CMOS amplifier ICs is provided. Receivers utilizing Ge-on-SOI lateral p-i-n photodiodes paired with high-gain CMOS amplifiers are shown to operate at 15 Gb/s with a sensitivity of -7.4 dBm (BER=10^-12) while utilizing a single supply voltage of only 2.4 V. The 5-Gb/s sensitivity of similar receivers is constant up to 93 degC, and 10-Gb/s operation is demonstrated at 85 degC. Error-free (BER<10^-12) operation of receivers combining a Ge-on-SOI photodiode with a single-ended high-speed receiver front end is demonstrated at 19 Gb/s, using a supply voltage of 1.8 V. In addition, receivers utilizing Ge-on-SOI photodiodes integrated with a low-power CMOS IC are shown to operate at 10 Gb/s using a single 1.1-V supply while consuming only 11 mW of power. A perspective on the future technological capabilities and applications of Ge-detector/Si-CMOS receivers is also provided     

Study of CMOS APS responsivity enhancement: ring-shaped photodiode

In this brief, the possibilities of complementary metal-oxide-semiconductor (CMOS) active pixel sensor (APS) spectral response improvement are discussed. Thorough submicrometer scanning results obtained from various ring-shaped pixel photodiodes with different inner radius, implemented in a standard CMOS 0.35-/spl mu/m technology, are compared with numerical computer simulations and verified analytically. The functional dependence of the pixel response on the ring opening size was discovered and formulated for various wavelengths illumination. We show that the photodiodes with a small ring-opening exhibit better sensitivity in the blue spectrum range (420-460 nm). Comparison between the simulation and measurement results shows a good agreement, hence, proving that specific photodiode designs enable to selectively improve pixel color sensitivity.