B3N3H6微波等离子体增强化学气相沉积B—N薄膜

采用Ｂ３Ｎ３Ｈ６－Ｎ２混合气体为原料，余辉微波等离子体增强化学气相沉积ＢＮ薄膜，漫反射富氏变换红外光谱分析表明，在５５０℃沉积温度下，１Ｃｒ１８Ｎｉ９Ｔｉ基片上获得了低含氢量的ｃ－ＢＮ和少量ｈ－ＢＮ相的混合薄膜。薄膜Ｋｎｏｏｐ硬度值为２０．８ＧＰａ。划痕试验法测定薄膜的附着性，临界载荷为８．１Ｎ。     

采用不同载气混合B_3N_3H_6原料制备B－N薄膜

采用Ｎ２、Ｈ２和Ａｒ三种载气混合的Ｂ３Ｎ３Ｈ６原料，余辉微波等离子体增强化学气相沉积ＢＮ薄膜．通过漫反射富氏变换红外光谱，Ｋｎｏｏｐ硬度和附着性划痕试验分析薄膜的结构，成分和性能．结果表明，Ｎ２和Ｈ２混合的Ｂ３Ｎ３Ｈ６原料制备的薄膜具有ｃ～ＢＮ和ｈ－ＢＮ双相组织，Ａｒ混合的Ｂ３Ｎ３Ｈ６原料具有ｈ－ＢＮ单相组织．载气直接参与Ｂ３Ｎ３Ｈ６气相合成ＢＮ的反应过程，决定薄膜的结构特征，影响薄膜的性能．     

采用不同载气混合B3N3H6原料制备B—N薄膜

采用Ｎ２，Ｈ２和Ａｒ三种载气混合的Ｂ３Ｎ３Ｈ６原料，余辉微波等离子体增强化学气相沉积ＢＮ薄膜。通过漫反射富氏变换红外光谱，Ｋｎｏｏｐ硬度和附着性划痕试验分析薄膜的结构，成分和性能。结果表明，Ｎ２和Ｈ２混合的Ｂ３Ｎ３Ｈ６原料制备的薄膜具有ｃ－ＢＮ和ｈ－ＢＮ双相组织，Ａｒ混合的Ｂ３Ｎ３Ｈ６原料具有ｈ－ＢＮ单相组织。     

用微波等离子体CVD制备C3N4薄膜

采用微波等离子体化学气相沉积法（ＭＰＣＶＤ）,使用高纯Ｎ２（９９．９９９％）和ＣＨ４（９９．９％）作反应气体,在多晶Ｐｔ（９９．９９％）基片上沉积Ｃ３Ｎ４薄膜。Ｘ射线能谱（ＥＤＸ）分析结果表明Ｎ／Ｃ原子比为１．０～１．４,接近Ｃ３Ｎ４的化学比;Ｘ射线衍射谱（ＸＲＤ）说明薄膜主要由β－和α－Ｃ３Ｎ４组成;Ｘ射线光电子谱（ＸＰＳ）、傅立叶变换红外谱（ＦＴ－ＩＲ）和喇曼（Ｒａｍａｎ）谱说明在Ｃ３Ｎ４薄膜     

PECVD法淀积氮化硼薄膜场发射特性研究

用 Ｂ２Ｈ６和 ＳｉＨ４作反应气体,通过射频等离子体增强化学气相淀积（ＲＦ－ＰＥＣＶＤ）方法,在 Ｓｉ（１００）面上沉积生长ＢＮ薄膜,用Ｓ－５２０扫描电子显微镜对所得薄膜进行观测,并用红外透射光谱测试分析了膜的成分。在室温、压力为 ８ × １０－４ Ｐａ条件下,对 ＢＮ薄膜的电流一电压特性进行测量,并得到了 Ｆｏｗｌｅｒ－Ｎｏｒｄｈｅｉｍ特性曲线,ＢＮ膜的场发射开启电场为９ Ｖ／μｍ,在电场３７．５ Ｖ／μｍ时,电流密度达到２４．８ ｍＡ／ｃｍ２。     

C3N4膜的制备,结构和性能

采用微波等离子体化学气相沉积法，用高纯氮气（９９．９９９％）和甲烷（９９．９％）作反应气体，在多晶铂（Ｐｔ）基片上沉积Ｃ３Ｎ４薄膜。利用扫描电子显微镜和扫描隧道显微镜观察薄膜形貌表明，薄膜由针状晶体组成。Ｘ射线能谱分析了这种晶态Ｃ－Ｎ膜的化学成分，对不同样品不同区域的分析结果表明，Ｎ／Ｃ比接近于４：３。Ｘ射线衍射结构分析说明，该厝主要由α－Ｃ３Ｎ４和β－Ｃ３Ｎ４和β－Ｃ３Ｎ４组成。ａｎｏ Ｉｎｄｅ     

超硬薄膜β-C3N4的制备和表征

本文采用微波等离子体化学气相沉积（ＭＰＣＶＤ）法,用高纯敢（９９．９９９％）和甲烷（９９．９％）作反应气体,在单晶硅多晶铂基片上沉积β－Ｃ３Ｎ４薄膜。Ｘ射线能谱（ＥＤＸ）分析了这种晶态Ｃ＝Ｎ膜的化学成分,对不同样品的分析结果表明,Ｎ／Ｃ原子比在１．１－２．０范围内,Ｘ射线衍射结构分析结果与计算的α－和β－Ｃ３Ｎ４单相Ｘ射线的峰位和强度相比较,说明它共价键的存在。薄膜的体弹性模量达到３４９ＧＰＡ。     

在不锈钢上电沉积烧结Cr_2O_3－Y_2O_3薄膜及其改性后的抗高温氧化性能

分别在Ｃｒ（ＮＯ３）３、Ｙ（ＮＯ３）３及二者混合溶液中以１Ｃｒ１８ＮｉｇＴｉ不锈钢为阴极，电沉积Ｃｒ（ＯＨ）３、Ｙ（ＯＨ）３及Ｃｒ（ＯＨ）３－Ｙ（ＯＨ）３复合薄膜，然后经烧结生成Ｃｒ２Ｏ２－Ｙ２Ｏ３及其复合薄膜层。通过研究末沉积试样与具有不同［Ｃｒ３＋］和［Ｙ３＋］配比的薄膜试样在高温下静态氧化行为及表面氧化膜形貌、组成等，来探讨１Ｃｒｌ８Ｎｉ９Ｔｉ表面经Ｙ、Ｃｒ的氧化物改性后的抗高温氧化性能。     

IBAD薄膜与基体界面的显微结构

采用中能离子束辅助沉积（ＩＢＡＤ）技术，在单晶Ａｌ２Ｏ３（０００１）基片上沉积Ｍｏ膜，在ＧＡＡｓ（００１）基片上合成Ｆｅ１６Ｎ２薄膜，用ＨＲＥＭ等研究了Ｍｏｅａｊｄ－Ａｌ２Ｏ３（０００１），Ｆｅ１６ｎ２膜－ＧａＡｓ（００１）界面的显微结构，结果表明：Ｍｏ膜的晶粒呈细小柱状或纤维状，晶粒平均尺寸约８ｎｍ，Ｆｅ１６Ｎ２薄膜为等轴晶，晶粒平均尺寸约为１０ｎｍ，在Ｍｏ膜－Ａｌ２Ｏ３（０００１）界面及Ｆｅ１     

离子束增强沉积Si3N4／Si多层红外干涉滤波薄膜

利用离子束增强沉积工艺，在硅基片上制备Ｓｉ３Ｎ４／Ｓｉ多层红外干涉滤波薄膜。结构表明，Ｎ＾＋２＋Ｎ＋的辅助轰击对于合成接近化学配比的Ｓｉ３Ｎ４薄膜起了关键作用。薄膜的折射率可达１．７４－１．８４。实验测得的多层滤波薄膜的红外反射谱与值相当接近。     

Time evolution of electronegativity in a pulsed inductively coupled oxygen plasma

The electronegativity in a continuous wave (CW) and pulsed mode plasmas was calculated using the measured results of both the single Langmuir probe and the retarding field analyzer. For the pulsed mode measurement, both of the measurements were performed in a time-resolved method using a boxcar sampling technique. For the conversion of the retarding field analyzer measurement results into absolute positive ion densities, argon plasma was used as a reference. The pulsed oxygen plasma was generated using the inductively coupled antenna and modulated at a repetition rate of 5 kHz and the duty ratio of 50%. The gas pressure was changed from 5 to 30 mTorr. The time evolution of the electronegativity shows that there is a pressure regime where the electron attachment reaction during the RF on-time is very active, indicating that the negative ion density reaches its maximum value during the RF on-time. Compared to the CW oxygen plasma, the electronegativity of the pulsed oxygen plasma varies within a wider range of values.     

Thermal plasmas in material processing

Thermal plasmas are partially ionized gases at atmospheric pressures, characterized by temperatures in the range of 2000–20,000 K and charged particle number densities in the range of 10¹⁹–10²¹ per m³. Thermal plasmas are produced by plasma torches as a highly constricted jet. The high temperatures, enthalpies and heat fluxes in the plasma jet make it amenable to many chemical and metallurgical processes of industrial importance. The processing environment can be inert as in the case of argon or nitrogen plasmas or can be made reactive by introducing suitable gases. Reactive thermal plasma processing is a novel technique, wherein the plasma enters the reaction scheme, with ions and excited species opening up new channels. This technique is versatile in producing a wide variety of materials like oxides, carbides, borides, aluminides and coatings of diamond, superconductors and bioceramics. In this paper, the basic design of the plasma devices and some of the significant materials-related activities carried out recently at BARC are reported.     

Study on formation process of surface plasma

A suitable equation group used to describe the establishment process and characteristics of induced dielectric barrier discharge (IDBD) plasma have been determined. Some experiments have been done which are used to examine whether the equation group is right or not. The examination results show that the equation groups are correct and can be used to design an IDBD device.     

底喷式等离子体发生器的输出特性研究

等离子体点火是发射药燃烧的一种新型点火方式,等离子体发生器性能会影响等离子体的输出效果。为了实现发射药高效的等离子体点火作用而研究等离子体发生器的输出性能。通过调整底喷式等离子体发生器内部关键参量,分析了发生器输出特性影响规律,优化了等离子体发生器内部结构参数,并在30 mm火炮中进行了试验。结果表明:等离子体发生器效率和输出电压及等离子体射流压强随毛细管孔径增加而下降,但随放电通道长度增加而增加;增加脉冲功率源的充电电压能够提高等离子体射流动能和压强峰值;聚乙烯(PE)和聚四氟乙烯(PTFE)两种材质对等离子体发生器输出特性影响不显著;经优选后的底喷式等离子体发生器能够在火炮装置中有效地点燃发射药。     

电池隔膜表面空心阴极等离子体接枝聚合研究

应用自制的空心阴极等离子体装置,引发丙烯酸在丙纶表面的接枝聚合,研究了等离子体接枝聚合作用机理,分析了等离子体接枝聚合各参数(放电功率、气体流量、丙烯酸蒸气流量、样品位置等)对聚合速率的影响。通过红外光谱、扫描电镜等对丙纶接枝聚合膜表面的化学组成和形态结构等进行了表征分析,证明了亲水基团的引入,改善了丙纶隔膜的亲水性能。     

直流非转移弧等离子喷枪中电弧的工作特性研究

利用计算机数值模拟技术，采用有限容积方法，针对自制的低能耗、高效率内送粉等离子喷涂设备，对喷枪内部电弧长度及其对流体特性的影响进行了分析研究。结果表明，通过增加进气流量和减少电流的大小，均使得等离子电弧长度增加，阳极弧根位置逐渐向下游移动，但是产生这两种现象的机理以及对气流温度和速度的影响是不同的。     

Cold atmospheric plasma: Sources, processes, and applications

Atmospheric pressure gas discharge plasmas, especially those operated at energy non-equilibrium and low gas temperatures, have recently become a subject of great interest for a wide variety of technologies including surface treatment and thin-film deposition. A driving force for these developments is the avoidance of expensive equipment required for competing vacuum-based plasma technologies. Although there are many applications where non-equilibrium (cold) plasma at atmospheric and higher pressures represents a substantial advantage, there are also a number of applications where low-pressure plasmas simply cannot be replaced due to specific properties and limitations of the atmospheric plasma and related equipment. In this critical review, the primary principles and characteristics of the cold atmospheric plasma and differences from vacuum-based plasma processes are described and discussed to provide a better understanding of the capabilities and limits of emerging atmospheric plasma technologies.     

潘宁气体真空等离子体天线的基本特性研究

根据潘宁气体放电的物理特性,定性分析了等离子体天线中氦氩潘宁气体放电的特性,实验测量了充满氦氩潘宁气体的等离子体天线与充满纯氦或纯氩等离子体天线的等离子体长度、等离子体密度,得出等离子体天线中充入氦氩潘宁气体时,在同等条件下能使等离子体天线的有效长度更长,等离子体密度更高。等离子体密度对天线的辐射效率和隐身性能影响很大,因此研究氦氩潘宁效应存在时表面波等离子体柱的等离子体长度与所加射频功率的关系和等离子体密度沿天线的分布对于提高天线的辐射效率和隐身性能至关重要。     

Change of the argon-based atmospheric pressure large area plasma characteristics by the helium and oxygen gas mixing

Oxygen and helium gases, often used in many plasma processes, were added to argon-based glow plasmas, produced at the atmospheric pressure, in order to study the controllability of the plasma characteristics by the supply gas mixing. Based on the electrical and optical diagnostics, the plasma parameters, such as the breakdown voltage, the rotational temperature, and the plasma uniformity, and their changes due to the gas mixing were investigated. The experimental results showed that the helium gas addition reduced the breakdown voltage (from 430 V to 300 V), the rotational temperature (from 465 K to 360 K), and the plasma uniformity. On the other hand, a small amount of oxygen gas increased the breakdown voltage (from 435 V to 463 V) and the rotational temperature (from 520 K to 600 K) due to various energy loss channels of the oxygen gas. The experimental results showed that it was possible to control the plasma characteristics by the gas mixing.     

乙炔等离子体聚合及其聚合物的结构与性能

应用外部耦合式等离子体聚合装置，研究了乙炔等离子体聚合规律，找到了最佳的聚合条件。通过元素分析，红外光谱，电子衍射和接触角测定等研究了聚合物结构与性能。电导率测定表明等离子体聚乙炔具有半导体性质。