共查询到20条相似文献,搜索用时 109 毫秒
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等离子体处理提高金属镀层与有机基底附着力的研究 总被引:2,自引:0,他引:2
利用反应磁控溅射技术在有机玻璃(亚克力板)上完成Al的膜层制备,并进行了膜层表面的光泽度、附着力和耐腐蚀性等研究。实验发现,采用这种技术制备的Al膜具有较高的光泽度。在Al膜上沉积一层氧化硅薄膜可以提高耐腐蚀性但不会对Al膜的光泽度产生影响。但是金属薄膜在有机基材上的附着力较差,大约在6 N左右。为此可以利用Ar、O2等离子体对有机玻璃表面进行清洗,或者在薄膜表面添加过渡层,即在镀膜之前先在基材上镀一层其他材料,然后再镀金属膜。实验发现环氧材料或SiO2作为过渡层,薄膜的附着力有显著提高。但需注意提高耐腐蚀性的同时不能影响薄膜光泽度和附着力。 相似文献
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Ti掺杂及Ti应力缓和层对类金刚石薄膜附着力的影响 总被引:4,自引:0,他引:4
研究了Ti掺杂对磁控溅射类金刚石(DLC)薄膜附着力及硬度的影响,同时在Ti掺杂类金刚石(Ti-DLC)薄膜的基础上,通过引入Ti应力缓和层制备了Ti/Ti-DLC/Ti/Ti-DLC……软硬交替多层薄膜,研究了Ti应力缓和层对进一步提高薄膜附着力特性的作用.采用纳米划痕仪和显微硬度计分析测试了薄膜的附着力和硬度.研究表明,金属Ti的掺杂有利于DLC薄膜附着力特性的改善,但对硬度有一定的影响.Ti应力缓和层的导入进一步改善了Ti-DLC薄膜的附着力特性,使其达到或超过了TiN薄膜的水平,对于附着力的改善Ti应力缓和层存在最佳的厚度值.采用特殊的变周期多层结构设计即在应力集中的膜基界面附近采用较小的调制周期,薄膜项层附近采用较大的调制周期不但可以保持足够的附着力,还可维持Ti-DLC薄膜原有的硬度. 相似文献
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基于直流磁控溅射的基本原理,通过对小圆形磁控溅射平面靶的特点分析,建立了磁控溅射系统的几何模型,推导出了膜厚分布的数学理论模型.借助MATLAB数学软件,计算了不同靶基距下膜厚分布的理论数据,分析了靶基距变化时膜厚分布的特点.实测了两种不同靶基距下膜厚的分布,通过与理论数据的对比,验证了模型的可靠性.理论模型与实测数据... 相似文献
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钛阳极磁控溅射钽的工艺研究 总被引:5,自引:1,他引:5
涂层钛阳极在使用中会因氧化而失效.为了开发新型的涂层钛阳极,进行了磁控溅射钽作钛阳极底层的研究.通过改变溅射功率、氩气压力及溅射时间,对不同工艺条件下沉积的钽膜进行了分析.用XRD分析了溅射层的成分及相结构;通过SEM,AFM观察了钽膜的微观形貌和颗粒尺寸;用拉开法测定了钽膜的附着力.综合分析了影响钽膜质量的因素,推荐磁控溅射3~4靘钽膜的优化工艺为:功率100~130 W,氩气压力0.1~0.3 Pa,溅射时间45~50 min.钽膜作为底层可提高二氧化铅阳极的使用寿命40倍以上. 相似文献
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等离子体轰击致聚酰亚胺表面亲水性研究 总被引:2,自引:1,他引:1
等离子体轰击聚酰亚胺表面会提高挠性印制电路板中溅射铜膜与聚酰亚胺基板的附着力,同时聚酰亚胺表面亲水性随之改变.本文通过改变轰击等离子体种类、轰击电流、轰击时间和轰击气压等条件,研究这些工艺参数与聚酰亚胺表面亲水性的相互关系.在等离子体轰击处理后的聚酰亚胺上磁控溅射镀铜并电镀加厚,利用剥离强度测试仪测量铜膜与聚酰亚胺基板的附着力,并分析亲水性与附着力之间的关系.研究发现,等离子体轰击可以增强聚酰亚胺的亲水性及聚酰亚胺基板与铜膜的附着力,且亲水性越好的样品,溅射镀铜后铜膜与基板的附着力也越好,并得到了等离子体轰击参数与亲水性的关系;研究表明可以把测量亲水性作为聚酰亚胺表面等离子体轰击效果的一种评价方法. 相似文献
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电子束蒸发与磁控溅射镀铝的性能分析研究 总被引:7,自引:0,他引:7
通过对半导体器件电极制备的两种方法即电子束蒸发与磁控溅射镀铝的比较,详细分析了两种方法的膜厚控制、附着力,致密性、电导率和折射率等重要性能指标,测试结果分析表明磁控溅射铝膜的综合性能优于电子束蒸发。 相似文献
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针对制取C/Al复合材料、C/Al间润湿与结合牢固度问题,以及CVD法涂Al在高温损伤碳纤维等难题,采用磁控溅射镀加溅射离子镀膜方法,在碳纤维表面镀Al膜。系统地研究了碳纤维镀Al的界面变化、组分分布、受热强度变化等内容,讨论C/Al复合材料的复合工艺问题。研究结果表明,磁控溅射法碳纤维镀Al膜表面光洁、均匀、规整、C/Al润湿、结合牢固,无化学反应损伤碳纤维现象。镀铝碳纤维受热后拉伸强度稍有降低,但无化学反应及生成Al4C3的现象。研究结果能给C/Al复合材料的制备创造工艺条件。 相似文献
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采用柱弧离子镀和中频孪生靶非平衡磁控溅射镀膜技术制备了Ti-N-C多层复合黑色硬质膜.采用轮廊仪扫描电子显微镜(SEM)、分光光度计、显微硬度计等手段研究了所得膜层的各项性能.结果表明,两种工艺都可以获得颜色较深的黑色硬质膜,柱弧离子镀制备黑色硬质膜的效率高、力学性能更好;中频孪生靶非平衡磁控溅射制备的黑色硬质膜表面光滑、颜色更深. 相似文献
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采用射频磁控溅射技术在改性氟塑料表面沉积铝层,制备了金属/氟化高聚物复合薄膜.利用场发射扫描电镜(FESEM)及能量散射谱(EDS)分析仪对沉积的铝层进行了表面形貌的表征和化学组分的分析.初步探讨了溅射功率、气压和时间等不同溅射参数对铝层结构和铝层在氟塑料表面附着情况的影响.结果表明:溅射功率是决定复合薄膜质量的重要因素,功率过低得不到致密的铝层结构,而且铝层容易从氟塑料表面脱离,功率过高则会产生很强的热效应而使复合薄膜弯曲.溅射气压和时间分别影响铝层在氟塑料表面的沉积速率和生长厚度. 相似文献
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氮化钽薄膜的制备及其血液相容性研究 总被引:3,自引:0,他引:3
本文利用磁控反应溅射技术制备氮化钽薄膜,对磁控反应溅射制备氮化钽薄膜的工艺参数(包括氮分压比、加热温度、溅射压力、溅射电流)用正交设计进行优化。研究表明,影响氮化钽薄膜结合力的主要因素为溅射压力和加热温度,氮分压比、溅射电流为次要因素;氮分压对氮化钽薄膜的硬度影响较大。动态凝血及血小板粘附实验研究表明,氮化钽薄膜的血液相容性性能优于热解碳(LTIC)。 相似文献
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《Materials Science & Technology》2013,29(7):838-842
AbstractChromium (Cr) films were deposited on plain carbon steel sheets by dc and rf magnetron sputtering as well as by electroplating. Effects of dc or rf sputtering power on the deposition rate and properties such as, hardness, adhesion strength, surface roughness and corrosion resistance of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. Salt fog tests were used to evaluate the corrosion resistance of the samples. The deposition rate, hardness and surface roughness of the Cr film deposited by either dc or rf sputtering increase with the increase in sputtering power but the adhesion strength is nearly independent of the sputtering power. The deposition rate, hardness and adhesion strength of the Cr film deposited by dc sputtering are higher than those of the Cr film deposited by rf sputtering, but rf sputtering offers smoother surface and higher corrosion resistance. The sputter deposited Cr film is harder and has a smoother surface than the electroplated one. The sputter deposited Cr film also has higher corrosion resistance than the electroplated one, which may be attributed to the smoother surface of the sputter deposited film. 相似文献
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Friction and adhesion properties of fluorocarbon polymer thin films prepared by magnetron sputtering
Fluorocarbon polymer thin films were deposited onto a SUS302 substrate with a poly(tetrafluoroethylene) (PTFE) target by three different types of r.f. magnetron sputtering systems with strong, weak and unbalanced magnetic fields. Friction and adhesion properties of these polymer thin films were evaluated.Friction coefficient of polymer thin films prepared with strong magnetic field, unbalanced magnetron and without magnetron (r.f. sputtering) was almost the same level, however, that prepared with the weak magnetic field was slightly lower than those of other thin films. Wear durability of polymer thin film increased with increase of the magnetic field.Adhesion strength between these thin films and SUS302 substrate and shear stress were measured by SAICAS. Both of the adhesion strength and shear stress of polymer thin films prepared with r.f. sputtering (without magnetron) were slightly higher than those prepared by magnetron sputtering systems. 相似文献
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A novel magnetron sputtering system, which included simply designed two grids between target and substrate, was developed in our laboratory for the synthesis of high-density MgO films. In order to investigate the effect of grids assisted magnetron sputtering, MgO films were deposited by conventional magnetron, one grid assisted magnetron and two grids assisted magnetron. The saturated ion current density and Mg ion fraction in MgO discharges generated by grids assisted magnetron were increased in comparison with those obtained in conventional magnetron, which means that grids assisted magnetron led to the enhancement of plasma density. As a result of microstructure analysis, grids assisted magnetron produced a higher density MgO film with smoother surface compared to that obtained in conventional magnetron. 相似文献