低能离子束轰击对Ti和Ti—N膜组织与性能的影响

研究了用能量为3．0keV－4．0keV，束流为80mA－200mA的低能氮和氩离子束对Ti膜进行轰击的作用以及用低能氮离子束对真空电弧沉积Ti－N膜层辅助沉积作用。结果表明：用低能氮离子束对Ti膜进行轰击可以形成Ti2N相，在（204）晶面出现一定的择优取向，并对Ti膜层有一定的强化作用；在低能氮离子束对真空电弧辅助沉积过程中，膜层表现为较高的显微硬度；随低能离子束能量的增大，真空电弧沉积膜层中Ti2N相增多，在（002）晶面出现择优取向，膜层晶粒有粗化的趋势，但显微硬度却增加，这与Hall-Petch公式不符。     

STRUCTURE AND PROPERTIES OF Fe-Dy MULTILAYER IMPLANTED WITH Ar~(+)

用真空双源蒸镀法在Ｓｉ单晶衬底上制备了Ｆｅ，Ｄｙ原子数比为３：２的Ｆｅ─Ｄｙ成分调制多层膜．用ＡＥＳ、ＲＢＳ、Ｘ射线衍射（ＸＲＤ）以及磁性测量分析了Ａｒ~（＋）混合前后Ｆｅ─Ｄｙ多层膜的相交．Ａｒ~（＋）离子注入能量１１０ｋｅＶ，剂量５×１０~（１５）─１×１０~（１７）／ｃｍ~２．结果表明，注入剂量为１×１０~（１７）／ｃｍ~２时，Ｆｅ，Ｄｙ完全混合，并且由晶态的Ｆｅ，Ｄｙ完全转变为Ｆｅ_（６０）Ｄｙ_（４０）（近似于该化学配比）的非晶态合金，随Ａｒ~（＋）注入量的增加，Ｆｅ一Ｄｙ多层膜的Ｍ_ｓ下降，在剂量５０×１０~（１５）／ｃｍ~２时下降幅度最大。     

Ar^（＋）混合Fe－Dy多层膜的结构及性能SCIEI

用真空双源蒸镀法在Ｓｉ单晶衬底上制备了Ｆｅ，Ｄｙ原子数比为３：２的Ｆｅ─Ｄｙ成分调制多层膜．用ＡＥＳ、ＲＢＳ、Ｘ射线衍射（ＸＲＤ）以及磁性测量分析了Ａｒ^（＋）混合前后Ｆｅ─Ｄｙ多层膜的相交．Ａｒ^（＋）离子注入能量１１０ｋｅＶ，剂量５×１０^（１５）─１×１０^（１７）／ｃｍ~２．结果表明，注入剂量为１×１０^（１７）／ｃｍ~２时，Ｆｅ，Ｄｙ完全混合，并且由晶态的Ｆｅ，Ｄｙ完全转变为Ｆｅ_（６０）Ｄｙ_（４０）（近似于该化学配比）的非晶态合金，随Ａｒ^（＋）注入量的增加，Ｆｅ一Ｄｙ多层膜的Ｍ_ｓ下降，在剂量５０×１０^（１５）／ｃｍ~２时下降幅度最大。     

Ar~（＋）混合Fe－Dy多层膜的结构及性能

用真空双源蒸镀法在Ｓｉ单晶衬底上制备了Ｆｅ，Ｄｙ原子数比为３：２的Ｆｅ─Ｄｙ成分调制多层膜．用ＡＥＳ、ＲＢＳ、Ｘ射线衍射（ＸＲＤ）以及磁性测量分析了Ａｒ~（＋）混合前后Ｆｅ─Ｄｙ多层膜的相交．Ａｒ~（＋）离子注入能量１１０ｋｅＶ，剂量５×１０~（１５）─１×１０~（１７）／ｃｍ~２．结果表明，注入剂量为１×１０~（１７）／ｃｍ~２时，Ｆｅ，Ｄｙ完全混合，并且由晶态的Ｆｅ，Ｄｙ完全转变为Ｆｅ_（６０）Ｄｙ_（４０）（近似于该化学配比）的非晶态合金，随Ａｒ~（＋）注入量的增加，Ｆｅ一Ｄｙ多层膜的Ｍ_ｓ下降，在剂量５０×１０~（１５）／ｃｍ~２时下降幅度最大。     

碳离子注入纯钛表面改性的研究

使用MEVVA强流金属源离子注入机对医用纯钛表面进行C离子注入，注入能量为40和60keV、剂量为（2.0～ 6.0×10^17）ions／cm^2。使用TRIM2003程序模拟计算饱和注入剂量；用XRD和XPS分析注入前后试样表面物相及原子结合状态，并使用SEM观察注入前后磨痕的形貌。研究了C离子注入对医用纯钛腐蚀性能、显微硬度、表面弹性模量和磨损行为的影响。结果表明，C离子注入后医用纯钛表面生成了一层包括TiC强化相和游离态C的表面改性膜，使试样表面显微硬度和弹性模量升高，并使医用纯钛在模拟体液中的耐磨损性能和耐腐蚀性能提高，而磨损程度减轻。     

金属结构材料的智能化

当前在金属结构材料智能化研究方面，最典型的几个研究方向有（1）自修复材料：涂有自修复性BN和TiC表面膜的不锈钢；具有抑制裂纹扩展功能的弥散ZrO2钢材；具有利用弥散Pb微粒来抑制疲劳裂纹扩展的合金钢；利用弥散Y2O3颗粒提高氧化膜附着性抑制裂纹长大；利用BN在编变孔隙表面上桥出来抑制孔隙长大；带氧化铝涂层的TiC—Ni基梯度功能材料；具有Al2／Al多层钝态膜的钢；自愈性SiC-玻璃复合膜；具有中度构造的多层膜涂层不锈钢．（2）自诊断材料：利用压电薄膜涂层赋与振动传感器功能；徐有压电高分子涂层的铝板；与光纤复合的铝板…     

银离子注入马氏体不锈钢表面改性研究

利用MEVVA源强流离子注入机将银离子注入到马氏体不锈钢表面,注入能量和注入剂量分别为100keV和(0.1~8)×1017ions/cm2。选用革兰氏阳性金黄色葡萄球菌和革兰氏阴性大肠杆菌研究了银离子注入不锈钢的抗菌性能,电化学法测定了其耐蚀性能,AES分析了不锈钢注入层中主要元素的浓度分布,讨论了注入剂量与不锈钢抗菌性能及耐蚀性能的关系。研究表明:随银离子注入剂量的增加,银在注入层中的峰值浓度变化不大,但分布深度增加,马氏体不锈钢抗菌性能显著提高。在100keV注入能量、8×1017ions/cm2注入剂量条件下,银离子注入马氏体不锈钢后可以使其具有最佳的抗菌性能,但耐蚀性能略有下降。     

离子束辅助轰击对电弧离子镀沉积TiAIN膜层的影响

采用俄罗斯UVN0．5D2I离子束辅助电弧离子镀沉积设备,在高速钢W18C14V基材上沉积TiAlN膜层;利用N离子束对膜层沉积之前的预处理和膜层沉积时的辅助轰击,并用SEM、X射线衍射和力学测试等手段研究了N离子束轰击对膜层表面形貌、相结构、显微硬度影响．结果表明：N离子束的预处理在基材表面形成了一定厚度N的过渡层;N离子束对膜层的辅助轰击,明显地降低了膜层表面“大颗粒”的密度,改善了膜层的表面形貌;同时,形成了由过渡层成分与膜层成分动态混合的扩散层;无N离子轰击时,TiMN膜层是由（TiM）N相和Ti：A1N相组成;轰击能量为7．5keV时,TiMN膜层也是由（TiAl）N相和Ti：MN相组成,但（TiM）N（111）取向减弱,而（200）和（220）取向均增强;Ti,A1N（211）及（301）取向均减弱．N离子束辅助轰击,使膜层的显微硬度由原来的21GPa提高到25．3GPa．     

GCr15钢表面钽沉积及氮离子注入的磨损性能

利用磁控溅射法在GCr15轴承钢表面沉积厚约100nm的钽膜,然后对其进行氮等离子体基离子注入,注入能量为50keV,利用GXRD分析改性层的组成相结构,用Φ6mm的氮化硅球作为对磨件测试处理后试样的磨损性能,并利用SEM结合EDX观测磨痕的形貌及成分,探讨其磨损机制。结果表明,改性层含有钽的氮化物,注入剂量较低时,化合物是TaN0.1,随着注入剂量增加,形成TaN;GCr15钢经过处理后能够提高磨损性能,摩擦系数有所降低:表面经过处理后,摩擦系数由未处理前的0.8～1下降至0.2～0.3,同时磨损量大幅度降低,降低幅度达到88%。注入层的磨损机制主要以磨粒磨损为主,兼有粘着磨损。     

[FePt/C]n多层膜的结构和磁学性能

采用磁控溅射方法制备FePt（50nm）和[FePt（2nm，3nm，5nm）／C（1nm）]。膜，并在550℃退火30min，研究了周期数（n）对FePt／C系列多层膜结构及磁学性能的影响。结果表明：退火后多层膜的矫顽力在总膜层厚度约为30nm时出现最大值；随着n的增大，多层膜的饱和磁化强度和晶粒尺寸均不断增大；C的加入可以有效降低晶粒间交换耦合作用。刚此可以通过控制周期数得到县仃合适的微观结构和高的磁学性能的FePt／C多层膜，从而满足超高密度磁记录介质的要求。     

碳化硼薄膜的电子束蒸发制备及表面分析

采用电子束蒸发技术制备碳化硼薄膜,利用X射线衍射(XRD)分析了薄膜的结构,测量了薄膜的X射线光电子能谱(XPS),并利用原子力显微镜(AFM)对薄膜进行表面分析.XRD结果表明:薄膜的结晶性随着衬底温度的升高逐渐转好,在较低的衬底温度下制备出多晶碳化硼薄膜.XPS分析得到了碳化硼薄膜表面的化学成分和结构特性,其主要成分为B_4C.AFM结果表明,薄膜表面光滑平整、均匀致密,随着衬底温度的升高薄膜均方根(RMS)粗糙度逐渐增大.     

SURFACE MODIFICATION OF TITANIUM FILMS WITH SODIUM ION IMPLANTATION： SURFACE PROPERTIES AND PROTEIN ADSORPTION

Sodium implanted titanium films with different ion doses were characterized to correlate their ion implantation parameters. Native titanium films and ion implanted titanium films were characterized with combined techniques of X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and light microscopy (LM). The surface presented increased sodium concentration on treated titanium films with ion dose increasing, except for the group with the highest ion dose of 4× 1017 ions/cm2. XPS depth profiling displayed that sodium entered titanium film around 25-50 nm depth depending on its implantation ion dose. AFM characterization showed that sodium ion implantation treatment changed the surface morphology from a relatively smooth titanium film to rough surfaces corresponding to different implantation doses.After sodium implantation, implanted titanium films presented big particles with island structure morphology. The surface morphology and particle growth displayed the corresponding trend.Fibrinogen adsorption on these titanium films was performed to correlate with the surface properties of treated titanium films. The results show that protein adsorption on ion-implanted samples with dose of 2 × 1017 and 4 × 1017 are statistically higher (p ＜ 0. 01) than samples treated with dose of 5×1016 and 1 ×1017, as well as the control samples.     

Studying Ni-B alloys with X-ray photoelectron spectroscopy

Ni and Ni-B films that contain 4–20 at % boron are produced by electroplating from baths containing sodium decahydroclovodecarborate and borane-morpholine as boron sources. The chemical state of Ni, B, and O atoms on the original film surface, as well as in that etched to 1 μm or annealed in air at 700°C was determined using X-ray photoelectron spectroscopy (XPS). Judging from the absolute values and directions of the peak shifts in XPS spectra of freshly obtained films, it is assumed that Ni and B atoms chemically interact with each other and Ni-Ni bonds are replaced by shorter Ni-B bonds. Boron is segregated in the surface layer of Ni-B films and hampers the thermal oxidation of nickel.     

Surface Modification of PVD-TiN Films Using MEVVAIon Implantation

IN severe working and operating conditions tin filmsfabricated by conventional methods may also fail.Therefore,the investigations were towards furthersurface treatments,aiming at modifying the wearresistance of TiN films.Among the post surfacetreatment methods,MEVVA ion implantation hasshown to be particularly promising for surfacemodification|2l Some studies have shown that the wearand friction of implanted TiN films were improved afterMEVVA ion implantation,irrespective of the type ofi…     

Influence of nitrogen implantation into HSS substrate on internal stress and adhesion strength of c-BN films

Cubic boron nitride(c-BN) films were deposited on HSS substrate implanted with nitrogen ion by RF-magnetron sputtering. The films were analyzed by bending beam method, scratch test, XRD and AFM. The results show that the implantation of N ion can reduce the internal stress and improve the adhesion strength of the films.The critical load comes to 16.92N, compared to 1.75N of c-BN film on the unimplanted HSS. AFM shows that the surface of the c-BN film on the implanted HSS is low in roughness and small in grain size. The phase structure of the nitrogen implanted layer was analyzed by XRD. The influence of nitrogen implanted layer on the internal stress and adhesion strength of c-BN films were also investigated.     

离子束辅助沉积氧化镁薄膜

为了获得等离子体显示器的介质保护膜,利用离子束辅助沉积技术制备了致密的MgO薄膜;通过X射线衍射仪、扫描电镜、光电子能谱分析了MgO薄膜的特性及特性和工艺参数之间的关系。结果表明：薄膜主要显示（200）晶面的择优取向;从断面形貌、密度及折射率来看,离子束辅助沉积制备的MgO薄膜比电子束蒸发制备的MgO薄膜更致密,薄膜和基底间的结合力更强;离子能量,基底温度,沉积速率及退火处理影响薄膜的结晶,离子能量为1KeV时,薄膜结晶性最好,在离子能量固定为1KeV时,基底温度或沉积速率降低都能提高薄膜的结晶度;空气为退火有助于薄膜的进一步生长。     

硼掺杂对钛基金刚石薄膜附着力的影响

采用微波等离子体化学气相沉积(MPCVD)技术在钛基片上沉积了掺硼金刚石薄膜,并对掺杂前后的薄膜形貌及结构进行了检测.结果表明掺杂元素对形貌和结构有很大的影响,同时掺杂后薄膜与基底附着力有所下降.掠角衍射(GIXD)检测表明,中间层的主要成分是TiC和TiH_2.随着硼的加入,两者的含量增加.薄膜与基底的附着力下降的原因主要是受中间过渡层成分和残余应力增加的共同影响.     

Corrosion resistance properties of AZ31 magnesium alloy after Ti ion implantation

Magnesium alloys have a wide range of applications in industry; however, their corrosion resistance, wear resistance, and hardness are rather poor, which limit their applications. Ti ion was implanted into the AZ31 magnesium alloy surface by metal vapor vacuum arc (MEVVA) implanter. This metal arc ion source has a broad beam and high current capabilities. The implantation energy was fixed at 45 keV and the dose was at 9 × 1017 cm?2. Through ion implantation, Ti ion implantation layer with approximately 900 nm in thickness was directly formed on the surface of AZ31 magnesium alloy, by which its surface property greatly improved. The chemical states of some typical elements of the ion implantation layer were analyzed by means of X-ray photoelectron spectroscopy (XPS), while the cross sectional morphology of the ion im-plantation layer and the phase structure were observed by means of scanning electron microscopy (SEM) and X-ray diffraction (XRD). The property of corrosion resistance of the Ti ion implanted layer was studied by the CS300P electrochemistry corrosion workstation in 3.5% NaCl solution. The results showed that the property of corrosion resistance was enhanced remarkably, while the corrosion velocity was obviously slowed down.     

TiN薄膜的合成及其性能研究

用电子束蒸发沉积钛和40keV氮离子束轰击交替进行的办法合成了TiN薄膜。用RBS,AES,TEM,XPS,和X射线衍射研究TiN薄膜的组分和结构表明:用离子束增强沉积制备的TiN薄膜主要由TiN相构成;晶粒大小为30—40um,无择优取向;而非离子束轰击沉积的薄膜则是无定形的;用离子束增强沉积制备的TiN薄膜,其氧含量明显小于无离子束轰击薄膜的值;在TiN薄膜和衬底之间存在一个界面混合区,厚度为40um左右。机械性能测试表明,TiN薄膜具有高的显微硬度,低的摩擦系数。     

硼碳氮薄膜的制备与表征

用电子束蒸发的方法在单晶硅(100)基片上制备了硼碳氮薄膜,通过椭圆偏振仪、X射线衍射仪(XRD)、X光电子能谱仪(XPS)、傅立叶红外光谱仪(FTIR),测试分析了薄膜厚度均匀性、成分与结构.结果表明,薄膜均匀性较好,薄膜的沉积速率非常慢;薄膜在衬底温度为常温下沉积已是晶态的,随着衬底温度升高到450 ℃,其结晶性逐渐增强;薄膜不是石墨与BN的混和膜而是C、B、N相互结合成键.