高速钢表面多弧离子镀(Ti,Al)N薄膜及性能研究

采用多弧离子镀技术在W18Cr4V表面制备出(Ti,Al)N硬质薄膜,研究了Al含量对(Ti,Al)N薄膜的形貌、硬度、膜基结合力、耐磨性、摩擦系数的影响。并利用扫描电镜、X射线衍射仪对薄膜进行了分析。结果表明Al含量在25%左右的(Ti,Al)N薄膜硬度达到2780HV0.05,耐磨性好,摩擦系数仅为0.168,且与钢基体结合良好,具有最佳的综合性能。     

(Ti,Al)N单层和TiN/(Ti,Al)N复合涂层的切削性能研究

借助EDX、SEM、强度测试和切削实验研究了采用磁控溅射在硬质合金基体上沉积的(Ti,Al)N单层和TiN/(Ti,Al)N复合涂层的切削性能。研究表明,两种涂层均与基体结合紧密;TiN/(Ti,Al)N复合涂层则表现出更好的切削性能。     

高速钢表面多弧离子镀(Ti,Al)N薄膜及性能研究

采用多弧离子镀技术在W18Cr4V表面制备出（Ti，Al）N硬质薄膜，研究了Al含量对（Ti，Al）N薄膜的形貌、硬度、膜基结合力、耐磨性、摩擦系数的影响。并利用扫描电镜、X射线衍射仪对薄膜进行了分析。结果表明Al含量在25％左右的（Ti，Al）N薄膜硬度达到2780HV0．05，耐磨性好，摩擦系数仅为0．168，且与钢基体结合良好．具有最佳的综合性能。     

（Ti，Al）N涂层对不锈钢基材疲劳性能的影响

采用多弧离子镀技术在马氏体不锈钢1Cr11Ni2W2MoV表面分别沉积Ti70Al30N及梯度（Ti,Al）N涂层.涂层试样的疲劳试验在旋转弯曲疲劳实验机上室温下进行,研究了涂层试样与基体材料的疲劳强度、寿命及疲劳断裂机理.结果表明：施加Ti70Al30N涂层样品与梯度（Ti,Al）N涂层样品的条件疲劳极限较1Cr11Ni2W2MoV不锈钢基材的疲劳极限分别提高约7%及8%;施加涂层提高不锈钢基材疲劳寿命的原因主要在于Ti70Al30N涂层与梯度（Ti,Al）N涂层中的残余压应力作为滑移变形的阻力可阻碍疲劳裂纹的萌生与扩展.     

SiC颗粒增强铝基复合材料基材上制备(Ti,Al)N涂层的研究

利用电弧离子镀技术在SiCp／2024Al基体上制备(Ti，Al)N涂层．研究了偏压对涂层的相组成、晶格常数和成分的影响及不同过渡层对涂层与基体结合性能的影响．结果表明，在较小偏压下，(Ti，Al)N涂层呈(111)择优取向；偏压在-150V时，涂层无择优取向；但随偏压继续升高，出现(200)和(220)择优取向．在添加Ti过渡层时，涂层与基体形成致密均匀的良好结合．同时通过设计梯度涂层，获得了厚度达105um的无裂纹(Ti，Al)N涂层．     

Si和Y掺杂对(Ti,Al)N涂层结构和性能的影响

分别在未施加偏压和施加-100 V偏压条件下,利用磁控溅射技术在压气机叶片用1Cr11Ni2W2MoV热强不锈钢基体上沉积了Ti_0.3Al_0.7N和Ti_0.39Al_0.55Si_0.05Y_0.01N硬质涂层.实验结果表明,施加偏压及Si和Y掺杂明显改变了涂层的相结构,提高了涂层致密度,施加-100 V偏压且添加Si和Y的涂层为非晶结构,表面更加均匀致密.950℃氧化实验表明:Ti_0.39Al_0.55Si_0.05Y_0.01N涂层表面形成极薄且致密的Al₂O₃保护性氧化膜,大大降低了氧化速率.施加-100 V偏压的（Ti,Al）N和（Ti,Al,Si,Y）N沉积态涂层与未施加偏压的相应涂层相比,硬度均降低,尤其是（Ti,Al,Si,Y）N涂层变化显著.经950℃热处理,施加偏压的（Ti,Al,Si,Y）N涂层硬度略有降低,这是由于形成了硬度较低的B4相,而未施加偏压的（Ti,Al,Si,Y）N涂层硬度显著提高,这归因于B1相固溶体的分解.划痕测试结果表明,在实验载荷（50N）下,所有涂层均未出现连续性的剥落.     

脉冲偏压对复合离子镀(Ti,Cu)N 薄膜结构与性能的影响

目的 (Ti,Cu)N薄膜是一种新型的硬质涂层材料,关于其结构和性能的研究报道还较少。研究脉冲偏压对(Ti,Cu)N薄膜结构与性能的影响规律,以丰富该研究领域的成果。方法将多弧离子镀和磁控溅射离子镀相结合构成复合离子镀技术,采用该技术在不同脉冲偏压下于高速钢基体表面制备(Ti,Cu)N薄膜。分析薄膜的微观结构,测定沉积速率及薄膜显微硬度,通过摩擦磨损实验测定薄膜的摩擦系数。结果在不同偏压下获得的(Ti,Cu)N薄膜均呈晶态,具有(200)晶面择优取向,当脉冲偏压为-300 V时,薄膜的择优程度最明显。随着脉冲偏压的增加,薄膜表面大颗粒数量减少且尺寸变小,表面质量提高;沉积速率呈现先增大、后减小的趋势,在脉冲偏压为-400 V时最大,达到25.04 nm/min;薄膜硬度也呈现先增大、后减小的趋势,在脉冲偏压为-300 V时达到最大值1571.4HV。结论脉冲偏压对复合离子镀(Ti,Cu)N薄膜的表面形貌、择优取向、沉积速率和硬度均有影响。     

基于正交试验Ti0.33Al0.67N膜层制备工艺研究

选用纯Ti靶与Ti0.33Al0.67合金靶制备Ti0.33Al0.67N膜层,在对基体材料进行离子渗氮之后,采用正交试验对多弧离子镀中的工艺参数进行优化,通过观察膜层结合力、表面形貌、显微硬度和膜层厚度选择最佳的工艺参数.     

(Ti,Al)N涂层的织构特征和切削性能研究

借助EPMA、XRD、SEM、EDX、纳米压痕和切削实验研究了采用磁控溅射在硬质合金基体上沉积的(Ti,Al)N涂层的微观组织结构和切削性能。研究表明:(Ti,Al)N涂层为面心立方的的平直的柱状晶;(Ti,Al)N涂层因其高的硬度和良好的抗氧化性能大大地提高切削寿命。     

(Ti,Al)N涂层的微观组织和性能

采用EPMA、XRD、SEM、TEM、HR-TEM、EDX、纳米压痕、氧化实验和切削实验研究了磁控溅射在硬质合金基体上沉积TiN涂层和(Ti,Al)N涂层的微观组织结构和性能。结果表明:TiN涂层晶粒为喇叭口柱状晶,(Ti,Al)N涂层为面心立方平直柱状晶,由于固溶了Al元素,(Ti,A l)N涂层呈(200)面择优生长;(Ti,Al)N涂层在硬质合金基体上无外延生长;(Ti,Al)N涂层在800℃氧化后形成Al2O3/TiO2/(Ti,Al)N的分层结构;(Ti,Al)N涂层具有更高的硬度和更好的切削性能。     

Microstructure and physical properties of PVD TiN/（Ti, Al）N multilayer coatings

Magnetron sputtered （Ti, Al） N monolayer and TiN/（Ti, Al） N multilayer coatings grown on cemented carbide substrates were studied by using energy dispersive X-ray spectroscopy （EDX）, scanning electron microscopy （SEM）, nanoindentation, Rockwell A indentation test, strength measurements and cutting tests. The results show that the （Ti, Al）N monolayer and TiN/（Ti, Al）N multilayer coatings perform good affinity to substrate, and the TiN/（Ti, Al）N multilayer coating exhibits higher hardness, higher toughness and better cutting performance compared with the （Ti, Al）N monolayer coating. Moreover, the strength measurement indicates that the physical vapour deposition （PVD） coating has no effect on the substrate strength.     

Mo_2C对Ti(C,N)基金属陶瓷腐蚀性能的影响

通过静态浸泡腐蚀和动电位极化两种方法,研究了Mo2C对Ti(C,N)基金属陶瓷在NaOH溶液中腐蚀性能的影响。实验结果表明:Ti(C,N)基金属陶瓷的耐蚀性明显优于WC-Co硬质合金;添加Mo2C可以大幅度提高Ti(C,N)基金属陶瓷的机械性能,硬度从91.2到94.0 HRA和抗弯强度从930到1 350 MPa,但会降低金属陶瓷的耐蚀性能;由于Mo2C的加入,会使金属陶瓷的动电位极化曲线出现两个钝化区,但是两个钝化区域的电流均未达到真正的钝化电流(10-5A/cm2),因而这些钝化现象均为伪钝化;在经动电位极化后的试样表面,粘结相Ni和白色的内环相均会被腐蚀,其中内环相为富Mo的(Mo,Ti)(C,N)固溶体,其耐腐蚀性较未溶的Ti(C,N)芯更差。随着Mo2C添加量的提高,内环形相的厚度随之会增加,从而降低了Ti(C,N)基金属陶瓷的耐蚀性能。     

The electrochemical corrosion behavior of TiN and (Ti,Al)N coatings in acid and salt solution

In this study, the corrosion properties of TiN and (Ti,Al)N coatings fabricated by Hollow Cathode Ionic Plating (HCIP) were studied by electrochemical techniques such as electrochemical impedance spectroscopy (EIS) measurement and potentiodynamic measurement in acid and salt solution. It was found that both coatings showed an excellent corrosion resistance in acid and salt solutions at the beginning of long-term immersing test. The corrosion resistance of TiN coating deteriorated rapidly after nearly 100 h immersion in both acid and salt solutions. In the contrast, the corrosion rate of (Ti,Al)N coating decreased a little and then kept at a stable value. For the TiN coating, the corrosion initiated from pinholes and the underlying corrosion was very similar to pitting corrosion. With the addition of aluminum to the TiN coating, the corrosion resistance was improved, especially in salt solution. The test results demonstrated that the (Ti,Al)N coating seemed to posses certain self-repairing function. The corrosion mechanism took the form of denudation corrosion, owing to deterioration of the adhesion of the coating.     

Mechanical Properties and Oxidation Behavior of a Graded (Ti,Al)N Coating Deposited by Arc-Ion Plating

A graded (Ti,Al)N coating was deposited on 1Cr–11Ni–2W–2Mo–V stainless steel for aero-engine compressor blades by arc-ion plating(AIP). The microstructure and the morphology of the graded coating were investigated using electron-probe microanalysis (EPMA), X-ray diffraction and scanning-electron microscopy. The mechanical properties of the graded coating were investigated and it was found that the microhardness and the wear resistance were similar to those of the monolithic (Ti,Al)N coating, but much better than those of a homogenous TiN coating. In addition, the adhesive strength and the thermal-shock resistance of the graded (Ti,Al)N coating were much better than those of the monolithic TiN and (Ti,Al)N coatings. The oxidation tests were performed at 600 and 700°C in air for 500 hr, and corrosion tests were carried out at 600°C under the synergistic effect of water vapor and NaCl for 20 hr. Compared to pure TiN, it was found that due to the incorporation of aluminum, a protective layer rich in alumina was formed on top of the graded (Ti,Al)N coating, which greatly improved the oxidation resistance and corrosion resistance of the coating.     

VC对纳米TiN改性Ti(C,N)基金属陶瓷组织和性能的影响

研究了添加0%～2.5%(质量分数)晶粒长大抑制剂VC对Ti(C,N)基金属陶瓷组织和性能的影响。结果表明,添加VC后,组织中晶粒的芯部变小、环形相变薄,1.5%～2.5%VC的加入使材料的晶粒显著细化。添加VC可提高材料的抗弯强度和硬度,添加量为1%时,抗弯强度达到最大值1370MPa,添加量为2.5%时,维氏硬度达到最大值15.3GPa;适量添加VC可提高材料的断裂韧性,添加量为1%时,达到最大值8.6MPa·m1/2。VC添加量为0.5%时,材料维氏硬度和断裂韧性分别为14.4GPa和7.6MPa·m1/2,综合力学性能最好。     

直流磁控溅射沉积（Ti，Al）N膜的研究

研究了用直流磁控反应性溅射法在Ａｒ＋Ｎ２气氛中沉积（Ｔｉ，Ａｌ）Ｎ膜的工艺。（Ｔｉ，Ａｌ）Ｎ膜具有比ＴｉＮ膜高的耐磨性、硬度和高温抗氧化性。ＡＥＳ深度分析表明，由Ａｌ的选择性氧化形成的Ａｌ２Ｏ３保护层，是（Ｔｉ，Ａｌ）Ｎ膜具有优良高温抗氧化性能的原因．