氧化物结合碳化硅复合材料的粒度级配对其性能的影响

通过分析氧化物结合碳化硅复合材料中加入的不同氧化物，以及碳化硅粗、中、细颗粒间的粒度级配，对该材料的组成进行合理的设计，使其既保证一定的抗弯强度，又具有良好的抗氧化性能，得出氧化钙的加入有利于材料强度的提高；粗粉质量分数一定，细粉质量分数不超过45％时,材料的强度随细粉含量的增加而提高；粗粉、细粉质量比为1：1，中粉质量分数不超过35％时，强度随中粉质量分数增加而提高。     

Commercial polymer films as calibration standards for EIS measurements

The current protocol regarding calibration and troubleshooting of potentiostats used to conduct electrochemical impedance spectroscopy (EIS) measurements on coated metals involves dummy cells made of simple electrical components. This concept has two major limitations: first, the instrument is used at an impedance range it has not been calibrated for—the instrument is calibrated for impedances in the order of ohms, but corrosion protective coatings usually have impedance values in the range of GΩ cm² or higher; second, commercial coating systems do rarely behave like ideal equivalent circuits of electronic components. In view of these limitations, we propose the use of thin polymer films such as PVF or poly ethylene terephthalate (PET) as new calibration standards for EIS measurements. These films are well defined in thickness and composition and give a highly reproducible response when subjected to EIS measurements. In addition, they closely mimic commercial coating systems with regard to target impedance range and electrical characteristics.     

多晶硅产业现状及发展趋势

介绍多晶硅国内生产企业的现状、市场需求、技术水平以及未来的发展趋势.     

由TiOSO4水解—沉淀制备TiO2薄膜

通过控制ＴｉＯＳＯ４的水解－沉淀反应条件，可控制基片上膜层粒子大小及其附着力，适量尿素加入可加快均匀成速度。根据ＳＥＭ断面观察与重量法相比较，表征了膜厚。适当反应条件下，反应１ｈ，干燥－煅烧制得的膜０．２μｍ以上；四次重复反应－煅烧，获得的膜这０．８μｍ以上。     

Room temperature oxidation of lead-indium alloy films

The kinetics of growth of thin (14 to 40Å) oxide layers on lead-indium alloys was investigated ellipsometrically, using: 3000Å thick films at 23°C; and oxygen exposures at 760 torr for times ranging from five minutes to five days. Assuming that the oxide layer is comprised of a two-phase mixture of PbO and In₂O₃ having a negligible extinction coefficient made it possible to estimate the oxide composition from the ellipsometrically-obtained oxide refractive index. Under these oxidizing conditions, the volume fraction of PbO in the oxide mixture decreases from a value of unity for pure lead to zero for alloys containing more than 30 at. percent In, in agreement with the Auger Electron Spectroscopy results of Chou and coworkers. The oxidation rate equals a exp (X₁/X), where α and X₁ will be seen to vary complexly with alloy composition. A theoretical explanation of these results is also presented.     

PP改性汽车轮罩专用料的研制

通过在聚丙烯中加入EPDM(三元乙丙橡胶)、LDPE,形成三元共混体系,并在体系中加入交联剂、助交联剂、流动性调节剂等助剂及一种较新型的无机填料硅土,可明显改善聚丙烯的冲击性能、加工流动性和尺寸稳定性,使其能够满足生产及性能要求并降低了成本。     

大功率硅整流电能计量装置的改造

分析了造成大功率硅整流交流电能计量装置计量误差大的原因，介绍了具体的改造内容。通过改造减小了电能计量装置综合误差，节省了费用。     

Effects of Ti addition on low carbon hot strips produced by CSP process

Large quantity of fine Ti（C,N） particles, 15-30 nm in size, were observed in low carbon hot strips added to a small amount of Ti and produced by CSP process. The results showed that the precipitation of Ti（C,N） mostly took place during soaking and hot rolling, which is significantly different from that in the conventional production. These fine Ti carbonitride particles could be very effective on the austenite grain refinement by hindering grain growth of recrystallized austenite. Their precipitation behavior was discussed and compared with that of the steels produced in the conventional production.     

NiFe层厚度对薄膜磁阻性能的影响

用直流磁控溅射方法制备了以Ta为缓冲层的Ni80Fe2O薄膜。研究了NiR层厚度对薄膜电阻变化量△R的影响。实验发现△R随NiFe厚度先变大后减小，最大约为0．3Ω，当NiFe厚度达到140nm后△R趋于饱和。其变化的原因是NiFe厚度影响着晶粒尺寸和表面粗糙度，进而影响着电子的散射，使△R呈现上述的变化趋势。     

干氧SiO2的氢氟酸缓冲腐蚀研究

根据对掺三氯乙烯(TCE)干氧氧化的SiO2在不同配比氢氟酸缓冲腐蚀液(BHF)中的腐蚀特性的研究结果表明, 在HF wt%保持不变的条件下,腐蚀速率先随着NH4F wt%的增大而上升;NH4F大于15wt%～20wt%以后,腐蚀速率反而随之降低.值得注意的是,干氧SiO2同湿氧SiO2相比,在1wt% HF条件下,前者的腐蚀速率要比后者高,直到HF酸浓度大于3wt%时,前者的腐蚀速率才低于后者,这一现象可用NH 4 阻挡模型结合TCE在SiO2中引入浅电子陷阱的方式得到解释.