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51.
In this paper a G
m
-C resonator circuit is proposed which is based on a new current-mode differentiating concept, compatible with low voltage and very high frequency operation.A prototype 4th-order 200 MHz band pass filter has been fabricated using a 0.8 m CMOS process and shows a side-band rejection lower than –80 dB. This response confirms the feasibility of the proposed resonator in very-high frequency applications such as IF band pass sections of RF front-end circuits. The filter consumes less than 5.5 mW from a 2.7 V supply and the measured dynamic range is 57 dB at IM3 of 0.5%, where the active area is 0.12 mm2. 相似文献
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甚高频通信在民航中有广泛应用,但是它极易受到各种噪声的干扰,传统方法去噪效果差且没有消除固有干扰,提出了一种基于小波分析的自适应卡尔曼滤波算法。该算法在小波分析中提出了新阈值函数,在自适应卡尔曼滤波算法中增加了调节窗口长度的自适应因子,以此来调节滤波增益,可以有效地避免滤波发散。随机选择了某一时段4种不同频率的甚高频语音信号,并用提出的算法进行滤波处理,从信噪比、均方根误差、信号波形图和语谱图等方面进行分析。结果表明,该算法能够有效去除甚高频语音信号中的噪声,可以获得更高的信噪比和更小的均方根误差,进一步提升语音质量。 相似文献
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针对米波雷达的波束较宽、由于地面反射引起波瓣分裂,通常只能估高而不能测高这一难题,提出一种基于分裂波瓣的米波雷达低仰角测高方法——比相比幅法.该方法采用多个不同高度的测高天线,由于不同高度天线的分裂波瓣有一定的相位关系,利用该相位关系确定目标所在仰角区间;利用不同天线接收信号幅度进行比幅处理提取归一化误差信号;再查表得到目标的高度.分析地面起伏对测高精度的影响;推导不同阵地情况下的比幅误差曲线.将该方法应用于某型雷达,在我国首次成功地进行了米波雷达测高.试验结果表明该方法是行之有效的. 相似文献
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Y. Ziegler V. Daudrix C. Droz R. Platz N. Wyrsch A. Shah 《Solar Energy Materials & Solar Cells》2001,66(1-4)
In the present work, several series with variation of deposition parameters such as hydrogen dilution ratio, VHF-power and plasma excitation frequency fexc have been extensively analyzed. Compared with “conventional” more-stable layers obtained at 200–250°C and high H2 dilution ratios of about 10, it was observed that electrical transport properties after light-induced degradation of layers deposited at “moderately high” temperatures (300–350°C) are equivalent but required lower H2 dilution ratios (between 2 and 4). As a consequence, the deposition rate of more stable layers obtained at moderately high temperatures is increased by a factor of 2. Moreover, optical gaps of a-Si:H deposited at 300–350°C are significantly lower (by approx. 10 meV); furthermore, they decrease with fexc. 相似文献
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Thin silicon intrinsic layers were deposited in the amorphous to nano-crystalline transition regime to investigate their structural and optoelectrical properties using the very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) technique. Optical emission spectroscopy (OES) was primarily used to monitor the plasma properties during the deposition. The ratio Hα/Si*, estimated from OES spectra, is closely related to the microstructure of the films. With the increasing plasma power from 10 to 50 W, the ratio Hα/Si* increases leading to nano-crystalline films. The ratio Hα/Si* decreases with the increase of process gas pressure at constant power of 15 and 30 W. The films were nano-crystalline at low pressure and became amorphous at high pressure. 相似文献
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