Nisin as a Food Preservative: Part 1: Physicochemical Properties,Antimicrobial Activity,and Main Uses

Nisin is a natural preservative for many food products. This bacteriocin is mainly used in dairy and meat products. Nisin inhibits pathogenic food borne bacteria such as Listeria monocytogenes and many other Gram-positive food spoilage microorganisms. Nisin can be used alone or in combination with other preservatives or also with several physical treatments. This paper reviews physicochemical and biological properties of nisin, the main factors affecting its antimicrobial effectiveness, and its food applications as an additive directly incorporated into food matrices.     

Design of an antibacterial gelatin based on a covalent protein–protein coupling

An antibacterial peptide (AMP), i.e., nisin, was covalently bound to gelatin through a protein–protein coupling. Various reaction conditions were tested to study and optimize parameters of grafting e.g., orientation and density of AMP, which could impact the final antibacterial activity of the modified biopolymer. Modification was investigated by Fourier transform infrared (FT‐IR) spectroscopy and zeta potential. The antibacterial activity of the nisin‐enriched gelatin was evaluated against two staphylococci bacterial strains, i.e., Staphylococus epidermidis and Staphylococcus aureus. A higher activity was found for gelatin modified at pH = 7.4 revealing an influence of the nisin orientation on the protein antibacterial property. © 2014 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2015 , 132, 41825.     

Ignition and Charring of PVC-Based Electric Cables

Fire Technology - The ignition of four different PVC-based electric cables was studied using cone calorimeter and the influence of the charring phenomenon on ignition was investigated. The...     

Synthesis and Surface-Active Properties of Uronic Amide Derivatives,Surfactants from Renewable Organic Raw Materials

Short chemical syntheses were developed to produce a new set of surfactants from uronic acids derived from widely available raw materials. Three different strategies were used to synthesize uronic amide derivatives, the structures of which were totally characterized by spectrometric methods (IR, MS, ¹H-RMN and ¹³C-RMN). The best one, using an acid chloride as the synthetic intermediate, furnished the expected amides as a mixture of anomers in 46–58% global yield. Surface-active properties (CMC, γ_cmc, Γ_max, A _min) of homologous series of uronic acid N-alkylamides from C8 to C18 were also assessed. In general, these sugar-based surfactants exhibited good surface-activities, and appeared as valuable nonionic surfactants compared to octylphenol 9–10 ethylene oxide condensate, the most well-known nonionic surfactant. Increasing the alkyl chain length influenced the CMC values for both glucuronic and galacturonic N-alkylamide derivatives. The galacturonic N-alkylamides decreased γ_cmc at slower values than their counterpart’s glucuronic N-alkylamides.     

Plasma deposition of catalytic thin films: Experiments,applications, molecular modeling

Plasma deposition of catalytic thin films is reviewed in view of highlighting some interesting features. Plasma sputtering, plasma enhanced chemical vapor deposition and plasma enhanced metalorganic chemical vapor deposition and their preferential use in various kinds of catalytic films are described. Fuel cell electrodes, gas sensors and photocatalytic films are emphasized as significant applications. As example, magnetron sputtering deposition is successfully used for growing fuel cell electrodes with high performances. Doping doped TiO2 photocatalysts are deposited using various kinds of plasma depending on the expected film morphology. Gas sensors are well designed when using plasma deposition. Plasma treatment of catalysts offers a suitable alternative to thermal treatments. Finally, associated simulations, especially recent progress in molecular dynamic simulations of catalytic film growth are surveyed. This is a suitable way to understand basic mechanisms of catalytic film growth.     

Effects of the substrate temperature on the deposition of thin SiOx films by atmospheric pressure microwave plasma torch (TIA)

The effect of surface temperature on the deposition of silicon oxide (SiO_x) films with a non-thermal microwave axial injection torch (TIA) was investigated in an open air reactor. Argon was used as plasma gas and hexamethyldisiloxane (Si₂O₂C₆H₁₈) as silicon precursor. The parametric study reported here focuses on the influence of the substrate temperature on the morphological and chemical properties of the films deposited in the interval [0 °C–130 °C]. A similar effect of low and high surface temperature on the deposition process and on the microstructure of the deposited films was highlighted. Macroscopically, particles were promptly produced in the gas phase and incorporated to the film, which generates high surface roughness. Microscopically, FTIR results have shown a high carbon contamination of the deposited films at low and high temperatures, resulting in understoichiometric SiO_x films. They have also demonstrated that an optimum growth window for smooth and particle free SiO_x was to keep the surface temperature between 30 and 60 °C. Simple reaction mechanisms for powder formation and continuous silicon oxide thin films growth are suggested for each temperature ranges.