引入GaN过渡层对Si（111）衬底上生长GaN外延的影响

本文研究了在Si(111)衬底上生长GaN外延层的方法。相比于直接在AlN缓冲层上生长GaN外延层,引入GaN过渡层显著地提高了外延层的晶体质量并降低了外延层的裂纹密度。使用X射线双晶衍射仪、光学显微镜以及在位监测曲线分析了GaN过渡层对外延层的晶体质量以及裂纹密度的影响。实验发现,直接在AlN缓冲层上生长外延层,晶体质量较差, X射线(0002)面半高宽最优值为0.686°,引入GaN过渡层后,通过调整生长条件,控制岛的长大与合并的过程,从而控制三维生长到二维生长过渡的过程,外延层的晶体质量明显提高, (0002)面半高宽降低为0.206°,并且裂纹明显减少。研究结果证明,通过生长合适厚度的GaN过渡层,可以得到高质量、无裂纹的GaN外延层。     

砷化镓激光器脊型波导的制备

本文主要研究了用湿法腐蚀的方法制备砷化镓激光器脊型波导,具体研究了砷化镓（GaAs）、铟镓磷（ InGaP）、铝镓铟磷（AlGaInP）材料的腐蚀。本文还成功地配制了能同时腐蚀铟镓磷和铝镓铟磷材料的腐蚀液。我们还分析了腐蚀时间和腐蚀浓度对脊型形状和脊型深度的影响。最后,在合适的条件下,本文得到了合适的脊型深度和光滑的脊型表面,而且得到的脊型的陡直度很小。这些结果表明这些腐蚀液将有用于激光器的制备。     

Suppression of electron leakage in 808 nm laser diodes with asymmetric waveguide layer

Electron leakage in GaAs-based separately confined heterostructure 808 nm laser diodes (SCH LDs) has a serious influence on device performance. Here, in order to reduce the energy of electrons injected into the quantum well (QW), an AlGaAs interlayer with a smaller Al component is added between the active region and the n-side waveguide. Numerical device simulation reveals that when the Al-composition of the AlGaAs interlayer and its thickness are properly elected, the electron leakage is remarkably depressed and the characteristics of LDs are improved, owing to the reduction of injected electron energy and the improvement of QW capture efficiency.