Characterisation of a 300× photovoltaic concentrator system with one-axis tracking

A solar concentrator with one-axis tracking is being developed at our institute. This concentrator system achieves a high geometrical concentration ratio of 300 using a parabolic trough mirror and a three-dimensional second stage consisting of compound parabolic concentrators. The design of the system as well as the characterisation of the second stage is described in this paper.     

电子辐照GaInP/GaAs/Ge三结太阳电池少子寿命的变化

为研究电子辐照空间太阳电池的损伤机制，对电子辐照GaInP/GaAs/Ge三结太阳电池进行了光致发光谱测量，分析了GaInP顶电池及GaAs中间电池发光强度随电子注量的变化规律。利用辐射效率关系对归一化发光强度随电子辐照注量的变化进行了拟合，分别得到了GaInP顶电池及GaAs中间电池在不同辐照条件下的少子非辐射复合寿命τ_nr，通过对比辐照前后少子非辐射复合寿命的衰降变化，发现GaInP顶电池的抗辐照性能优于GaAs中间电池。     

自对准GaInP/GaAs HBT器件

利用发射极金属掩蔽进行内切腐蚀的方法研制成自对准InGaP/GaAs异质结双极晶体管 (HBT),其特征频率(ft)达到54GHz,最高振荡频率(fmax)达到71GHz,并且,这种方法工艺简单,成品率高.文中还对该结果进行了分析,提出了进一步提高频率特性的方法.     

Theoretical modeling of the interface recombination effect on the performance of Ⅲ-Ⅴtandem solar cells

A typical GaInP/GaInAs/Ge tandem solar cell structure operating under AM0 illumination is proposed, and the current-voltage curves are calculated for different recombination velocities at both front and back-surfaces of the three subcells by using a theoretical model including optical and electrical modules. It is found that the surface recombination at the top GaInP cell is the main limitation for obtaining high efficiency tandem solar cells.     

Optimal growth procedure of GaInP/GaAs heterostructure for high-efficiency solar cells

We have developed an optimal growth procedure for gas-source MBE production of a GaInP/GaAs heterointerface. The interface quality is crucial to obtaining high-performance GaAs solar cells with a GaInP barrier layer because minority carrier lifetime depends strongly on the interface structure. In situ Reflective High-Energy Electron Diffraction (RHEED) observation during the growth across the GaInP/GaAs heterointerface revealed that the phosphorus atoms are replaced by arsenic atoms in the near-interface region of the GaInP layer, and a transient layer acting as a carrier trap is formed. Introduction of a GaP layer into the interface was found to be effective in suppressing carrier loss. From Composition Analysis by Thickness Fringe-Transmission Electron Microscopy (CAT-TEM) images, it was also found that the optimum thickness of inserted GaP to avoid the generation of misfit dislocations is 1 nm.     

Diffuse diffracted features and ordered domain structures in GalnP layers grown by organometallic vapor phase epitaxy

Transmission electron diffraction (TED) and transmission electron microscope (TEM) studies have been made of organometallic vapor phase epitaxial Ga_xIn_1−xP layers (x ≈ 0.5) grown at temperatures in the range 570–690°C to investigate ordering and ordered domain structures. TED and TEM examination shows that the size and morphology of ordered domains depend on the growth temperature. The ordered domains change from a fine rod-like shape to a plate-like shape as the growth temperature increases. The domains are of width 0.6∼2 nm and of length 1∼10 nm. Characteristic diffuse features observed in TED patterns are found to depend on the growth temperature. Extensive computer simulations show a direct correlation between the ordered domain structures and such diffuse features. A possible model is suggested to describe the temperature dependence of the ordered domain structure.     

Temperature dependent model dielectric function of highly disordered Ga0.52In0.48P

We report on the temperature dependence of the dielectric function of Ga_0.52In_0.48P from room temperature to 500°C, and for photon energies from 0.75 eV to 5 eV. The undoped, highly disordered Ga_0.52In_0.48P thin film was grown by metal-organic vapor phase epitaxy lattice matched onto a (001) GaAs substrate. The dielectric function of Ga_0.52In_0.48P was measured by in-situ spectroscopic ellipsometry, and analyzed using Adachi's composite critical point model. We provide a second-order temperature expansion parameter set for calculation of the Ga_0.52In_0.48P dielectric function and its temperature dependence, and which may become useful for in situ growth control or optoelectronic device performance evaluation at elevated temperatures. We discuss the temperature-induced shift of critical point transition energy parameters.     

Effects of high temperature annealing on the device characteristics of Ga0.52In0.48P/GaAs and Al0.52In0.48P/GaAs heterojunction bipolar transistors

GaInP/GaAs and AlInP/GaAs heterojunction bipolar transistor (HBT) structures were grown by low pressure metalorganic vapor phase epitaxy and annealed at various temperatures up to 675°C for 15 min. Subsequent comparisons with HBTs fabricated on both annealed and unannealed control samples showed no effects for annealing up to and including 575°C, but significant changes in the electrical characteristics were observed at an annealing temperature of 675°C. For the GaInP/GaAs devices, the base current increased by a significant amount, reducing the gain and increasing the base current ideality factor from 1.07 to 1.9. Photoluminescence and electrical measurements on the structures indicated that both the emitter and base were affected by an increase in the recombination times in those regions. These effects were attributed to an out-diffusion of hydrogen from the base during annealing. The emitter of the AlInP/GaAs HBT was affected less by the hydrogen diffusion because of the larger bandgap. These observations have important implications for device performance dependence on the details of the temperature/time profile subsequent to the base growth.     

Structural and optical properties of GaxIn1−xP layers grown by chemical beam epitaxy

Chemical beam epitaxial (CBE) Ga_xIn_1?xP layers (x≈0.5) grown on (001) GaAs substrates at temperatures ranging from 490 to 580°C have been investigated using transmission electron diffraction (TED), transmission electron microscopy, and photoluminescence (PL). TED examination revealed the presence of diffuse scattering 1/2{111}_B positions, indicating the occurrence of typical CuPt-type ordering in the GaInP CBE layers. As the growth temperature decreased from 580 to 490°C, maxima in the intensity of the diffuse scattering moved from ½{111}_B to ½{?1+δ,1?δ,0} positions, where δ is a positive value. As the growth temperature increased from 490 to 550°C, the maxima in the diffuse scattering intensity progressively approached positions of $\frac{1}{2}\{\bar 110\} $ , i.e., the value of δ decreased from 0.25 to 0.17. Bandgap reduction (～45 meV) was observed in the CBE GaInP layers and was attributed to the presence of ordered structures.