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1.
王力臻  谷书华  陈水标  商景鹏  廖奭 《电池》2002,32(4):207-210
利用滴定分析、热失重分析以及XRD方法研究了EMD和KOH溶液混合后的变化。结果表明:碱与MnO2可以相互作用并导致体系温度的升高,碱浓度的下降,EMD中形成Mn3O4以及MnO2中结合水的损失。相互作用的结果与所加KOH溶液的浓度、EMD中的水含量、二者用量的比例关系以及体系的温度有关。  相似文献   
2.
Increase in the ion concentration in the medium was found to increase conductivity and potassium hydroxide number (KOH No) in natural rubber latex (NRL). Addition of long chain fatty acids can increase the ion concentration in the medium and stability of NRL. A series of concentrated natural rubber latex samples from three different areas with different soils and climatic conditions were tested for the parameters such as KOH No and conductivity. They have been measured over a period of 62 days, upon addition of soap to natural rubber latex concentrate. The result showed that there was a strong positive linear correlation between conductivity and KOH No. The regression equation to express the relationship between the variables has also been found. © 2007 Wiley Periodicals, Inc. J Appl Polym Sci 2008  相似文献   
3.
针对向车载制氢机加水带入的金属离子导致制氢效率偏低的问题,在制氢测试系统实验台上研究加入含不同Zn2+、Fe3+和Cu2+质量浓度的溶液对制氢效率的影响.在电解电流为30 A,初始温度为19.7℃,压力恒为0.1 MPa条件下,电解2 L质量分数为30%的KOH溶液与其对应加入50 mL含不同金属离子质量浓度溶液做比较.试验结果表明:随着电解的进行,加入溶液所含的金属离子质量浓度越高,KOH溶液的电解电压越高,制氢速率越低,制氢效率越低.  相似文献   
4.
In this paper the process of silicon anisotropic etching in KOH solutions containing isopropyl alcohol in a wide concentration range is extensively studied. Though the alcohol does not take part in the etching process itself, it strongly affects the etching results. Both etch rates and the roughness of etched surfaces depend on the alcohol concentration in the etching solution, which is connected with the adsorption phenomena on the etched surface. The surface coverage with alcohol depends on the level of saturation of the etching solution and crystallographic orientation of an etched surface. It was observed that the best morphology of (1 1 0) surface was achieved just below saturation level with IPA whereas the (1 0 0) surfaces were improving above the saturation. A model, which explains these phenomena, was proposed. Based on this model, a simple way of selection of the composition of KOH solutions with alcohol additives, assuring optimization of etching results was suggested. The method is restricted to surface tension measurements and allows one to avoid elaborated etching experiments.  相似文献   
5.
It is important to tune the surface and pore structures of carbon materials for their application in capacitors. Herein, a novel microwave‐based approach is demonstrated to significantly increase the capacity of a supercapacitor. After activated carbon (AC) with KOH was treated by microwave heating only for 8 min, its symmetrical double‐layer capacitor increased from 68.6 to 107.9 F/g at current density of 0.2 A/g with 2 M KOH aqueous solution. The excellent capacity retention of 96% was obtained even after 4000 galvanostatic charge/discharge cycles at current density of 5 A/g. This microwave approach is much more efficient than the conventional heating process to tune the electrochemical properties of AC. Copyright © 2016 John Wiley & Sons, Ltd.  相似文献   
6.
An activated carbon with ash content less than ]0% and specific surface area more than 1600 m^2/g was prepared from cool and the effect of K-containing compounds in preparation of cool-based activated carbon was investigated in detail in this paper. KOH was used in co-carbonization with coal, changes in graphitic crystallites in chars derived from carbonization of coal with and without KOH were analyzed by X-ray diffraction (XRD) technique, activation rates of chars with different contents of K-containing compounds were deduced, and resulting activated carbons were characterized by nitrogen adsorption isotherms at 77 K and iodine numbers. The results showed that the addition of KOH to the coal before carbonization can realize the intensive removal of inorganic matters from chars under mild conditions, especially the efficient removal of dispersive quartz, an extremely difficult separated mineral component in other processes else. Apart from this, KOH demonstrates a favorable effect in control over cool carbonization with the goal to form nongraphitizable isotropic carbon precursor, which is a necessary prerequisite for the formation and development of micro pores. However, the K-containing compounds such as K2CO3 and K20 remaining in chars after carbonization catalyze the reaction between carbon and steam in activation, which leads to the formation of macro pores. In the end an innovative method, in which KOH is added to coal before carbonization and K-containing compounds are removed by acid washing after carbonization, was proposed for the synthesis of quality coal-based activated carbon.  相似文献   
7.
陈勇 《河北化工》2014,(9):150-152
针对保定中法供水有限公司原漏氯吸收装置中的中和碱液氢氧化钠,在空气中会吸收二氧化碳生成部分碳酸钠,形成大量结晶物,阻塞管道及泵腔,严重影响漏氯吸收装置运行的问题,找到了氢氧化钠的替代物氢氯化钾。实验结果表明,氢氯化钾在低温时能够有较高的溶解度,在空气中吸收二氧化碳之后生成的新物质,在低温和强碱环境中仍能拥有较高的溶解度,同时仍呈碱性并保持对氯的足够吸收能力。  相似文献   
8.
9.
We report on the corrosion of austenitic (AISI304) and duplex (2205) stainless steels in H2O/KOH 50% at 120 °C. The research is based on a combination of electrochemical, structural and compositional analyses, aimed at assessing the surface modifications resulting from anodic attack and their impact on corrosion resistance. Linear sweep voltammetry and electrochemical impedance spectrometry measurements were carried out in an air‐tight high‐temperature cell. In‐plane and cross‐sectional SEM micrography, X‐ray diffractometry and EDX profiling were used to characterise samples attacked under electrochemically controlled conditions. Electrochemical results have shown that AISI304 exhibits a complex passivating behaviour, while the anodic electrokinetics of the duplex is characterised by mixed kinetic control. AISI304 was found to fail by intergranular corrosion and to be covered: in passive conditions by acicular compounds and in transpassive conditions by a compact layer of corrosion products. Duplex samples, instead, exhibit an uniform form of corrosion morphology and bear a compact layer of corrosion products both in passive and in transpassive conditions.  相似文献   
10.
SiO2 and Si3N4, are usually used to mask the selected portions during etching of silicon in anisotropic etchants like KOH but polymers are expected to be very good alternative to SiO2 and Si3N4 as masking materials for MEMS applications. An adherent spin coated PMMA layer is reported to work as a mask material. It is a low temperature process, cheaper and films can be easily deposited and removed. One of the problems in its use is its adhesion to the substrate. Our previous experience in the field made us feel that sputtered PMMA will act as better mask because of its better adhesion to silicon. In the present article, a comparative study of spin coated PMMA with sputtered PMMA as an etch mask for silicon micromachining is reported. Structural and adhesive characteristics of the films are determined and compared with those available in the literature. These films deposited on silicon wafer were exposed to anisotropic etchant, KOH, to estimate the masking behavior. The maximum masking time of 32 min in 20 wt.% KOH at 80 °C was obtained for spin coated PMMA samples, which were prebaked at 90 °C. Masking time of sputter deposited PMMA films was found to be 300 min under similar conditions such as 20 wt.% KOH at 80 °C. This masking time is sufficient for fabrication of various MEMS structures, thus indicating candidature of sputtered PMMA as masking material. Various properties of the films are discussed and compared with the ones obtained through literature.  相似文献   
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