多晶硅太阳电池用SiN薄膜的研究进展

SiN薄膜因为具有良好的减反射性质和钝化作用，已经越来越广泛地应用于多晶硅太阳电池的制造工艺中，介绍了SiN薄膜在硅太阳电池中的性质，制备方法等研究现状，同时提出了存在的问题并展望了今后的发展趋势。     

The Atmospheric Scanning Electron Microscope with open sample space observes dynamic phenomena in liquid or gas

Although conventional electron microscopy (EM) requires samples to be in vacuum, most chemical and physical reactions occur in liquid or gas. The Atmospheric Scanning Electron Microscope (ASEM) can observe dynamic phenomena in liquid or gas under atmospheric pressure in real time. An electron-permeable window made of pressure-resistant 100 nm-thick silicon nitride (SiN) film, set into the bottom of the open ASEM sample dish, allows an electron beam to be projected from underneath the sample. A detector positioned below captures backscattered electrons. Using the ASEM, we observed the radiation-induced self-organization process of particles, as well as phenomena accompanying volume change, including evaporation-induced crystallization. Using the electrochemical ASEM dish, we observed tree-like electrochemical depositions on the cathode. In silver nitrate solution, we observed silver depositions near the cathode forming incidental internal voids. The heated ASEM dish allowed observation of patterns of contrast in melting and solidifying solder. Finally, to demonstrate its applicability for monitoring and control of industrial processes, silver paste and solder paste were examined at high throughput. High resolution, imaging speed, flexibility, adaptability, and ease of use facilitate the observation of previously difficult-to-image phenomena, and make the ASEM applicable to various fields.     

氮化硅—硅界面陷阱的研究

本文对SiH_4-N_2系PECVD氮化硅-硅界面陷阱进行了研究.结果表明:MNS结构的C-V特性有滞后效应,滞后宽度随测试条件而变化;界面陷阱密度随淀积条件变化。     

Impact of radio frequency source power-induced ion energy on a refractive index of SiN film deposited by a pulsed-PECVD at room temperature

Using a pulsed-plasma enhanced chemical vapor deposition system, silicon nitride films were deposited at room temperature. A refractive index was examined in the range of bias power and duty ratio, 200-800 W and 40-90%, respectively. Ion energy diagnostics was related to the refractive index. The refractive index decreased with decreasing the duty ratio at all powers but 800 W. For all the duty variations at all powers but 200 W, the refractive index was strongly correlated with the ion energy flux. The refractive index varied between 1.662 and 1.817. Using a neural network model, the refractive index was optimized.     

Comparison between SiNx:H and hydrogen passivation of electromagnetically casted multicrystalline silicon material

This work intends to compare two different passivation methods for electromagnetically continuous pulling silicon (EMCP): remote plasma hydrogenation and remote plasma enhanced CVD of SiN followed by high-temperature sintering. All experiments are carried out on textured and non-textured EMCP samples from the same ingot. To check the effect of high-temperature diffusion on EMCP, a n⁺-emitter is formed on one group of the samples using POCl₃ diffusion. Passivation capabilities of both techniques are checked using measurements of minority carrier lifetime by means of microwave photoconductance decay mapping. Solar cells are made to compare lifetime measurement with cell parameters.     

SiON／SiN太阳电池双层减反膜的性能研究

报道了用电子回旋共振化学气相沉淀积技术淀积ＳｉＯＮ／ＳｉＮ双层硅太阳电池减反膜的实验研究。用红外吸收谱，俄歇电子谱以及二次离子质谱等实验方法对薄膜的组分，结构２，界面过渡区的特性以及膜层中的氢分布进行了分析，实验表明：在制备减反射膜中，要获得较佳的减反效果，应尽量降低淀积温度，增大微波功率。     

晶体硅太阳电池减反射膜的研究

在太阳电池表面形成一层减反射薄膜是提高太阳电池的光电转换效率比较可行且降低成本的方法。应用PECVD（等离子体增强化学气相沉积）系统,采用SiH4和NH3气源以制备氮化硅薄膜。研究探索了PECVD生长氮化硅薄膜的基本物化性质以及在沉积过程中反应压强、反应温度、硅烷氨气流量比和微波功率对薄膜性质的影响。通过大量实验,分析了氮化硅薄膜的相对最佳沉积参数,并得出制作减反射膜的优化工艺。     

蓝宝石衬底上使用氮化硅钝化的AlGaN/GaN高电子迁移率晶体管的研制与特性分析

本文研制了高性能的AlGaN/GaN高电子迁移率晶体管并进行了特性分析。诸如氮化铝插入层、氮化硅钝化、高宽窄比的T型栅、减小欧姆接触电阻和缩短漏源距离等技术被用于提高器件性能。使用半导体参数分析仪和矢量网络分析仪分别对前制器件的直流和交流特性进行了表征。所得80nm栅长的器件其最大漏极电流密度为1.41A/mm,该结果为到目前为止国内文献报道的最大值。同时测得峰值跨导为317mS/mm,特征频率为74.3GHz,最高振荡频率为112.4GHz。     

BST-MEMS移相器开关

为了提高MEMS电容开关性能,介绍了移相器的一种新型结构——分布式电容周期性加载结构。分析发现移相器的相移度和单元可变电容的变化率有关。目前MEMS可变电容单元采用的介质基本上是氮化硅。BST薄膜作为一种性质优良的介电材料,其介电常数远大于氮化硅。从MEMS移相器开关性能的几个关键指标出发,探讨在MEMS移相器开关中,用BST薄膜代替氮化硅介质的可能性。     

NH3/SiH4流量比对多晶硅/氮化硅复合层电池光电性能的影响研究

SiN薄膜因为具有良好的减反射性质和钝化作用, 越来越广泛地应用于晶硅太阳电池的制造工艺中。用等离子体化学气相沉积(PECVD)法, 通过改变流量比、气体总量及基底温度等工艺参数沉积SiN薄膜, 研究了流量比对在多晶硅太阳电池上所沉积的氮化硅薄膜性能的影响。实践表明, NH3/SiH4气体流量比为11.5∶1时电池材料具有最佳的光电性能。