基于多正弦窗谱估计的改进谱减法语音增强

采用运算简单、实时性好、改进的功率谱减法对带噪语音进行增强。鉴于谱减法的特点,文中采用了多正弦窗谱估计对功率谱进行估计。多正弦窗谱估计是一种非参数的现代谱估计方法,与周期图法相比,谱估计偏差和方差更小,可以得到效果更好的增强语音。分别对周期图法、多窗谱法及多正弦窗谱法的增强效果进行了比较。实验结果表明,语音在多正弦窗谱法增强后,分段信噪比最高,且没有因为谱减产生的音乐噪声,主观听觉效果最好。多正弦窗谱估计对输入信噪比较低的含噪语音增强效果非常好。     

多正弦窗谱估计的性能分析

多正弦窗谱估计是一种非参数的现代谱估计方法。本文较为全面地分析了它的性能,包括谱的聚集性,偏差,方差,最优窗口数,分辨率,计算复杂度等。以四种信号模型为例,分析了窗口数和小波阈值法去除估计噪声对多正弦窗谱估计的偏差和方差的影响,并与周期谱图进行了比较。理论分析和实验结果表明与周期谱图相比,多正弦窗谱具有小得多的偏差和方差,可将其应用于谱估计的性能要求较高的场合。     

非平稳环境下基于人耳听觉掩蔽特性的语音增强

传统的语音增强算法往往仅对平稳噪声或缓慢变化的噪声有效,且残留的音乐噪声较大。对此,本文研究了一种非平稳环境下基于听觉掩蔽效应的语音增强算法。该算法对传统谱减法的功率谱估计算法进行改进,根据最小均方误差原则和语音信号的听觉掩蔽阈值调整功率谱估计的参数,并引入了基于最小值统计特性的噪声估计算法,使估计的噪声更好地跟踪噪声的变化。实验结果表明:该算法对平稳和非平稳的噪声都得到较好的增强效果,且较好地抑制了音乐噪声。     

非平稳噪声环境下的噪声估计算法

通过对噪音和语音频谱的分析,针对航空背景噪声的特性,提出一种用于语音增强的新的噪声估计算法。通常的噪声估计一般利用语音端点检测方法,取噪声段的谱平均值作为待估计的噪声谱,但该方法在信噪比较低时性能下降严重。笔者提出的基于频率段能量比的噪音谱估计方法,不依赖于语音端点检测而直接由语音帧来估计噪音谱,通过计算一帧语音中各频率段中能量比,以判断该帧是否含有语音来修正噪声谱估计的计算因子。算法提高了谱减法的适用范围,还在一般谱相减方法的基础上提出了改进的谱相减算法。     

认知无线电中的宽频段频谱感知器设计

无线频谱感知器是认知无线电系统的核心。文章针对认知无线电中的宽频段频谱感知问题,提出了利用谐波滤波器组周期性检测的方案,并给出了基于能量检测的硬件实现框图。理论与仿真分析表明,基于快速傅里叶变换的周期图法不满足一致性估计条件,方差性能很难满足实际应用需求;分段平均周期图法与加窗平均周期图法收敛性好,方差小,但是功率谱密度主瓣较宽,分辨率低;多窗谱估计法具有较小的估计偏差,且其方差性能和频谱分辨率均远远优于周期图法,因而比较适合应用在实际的认知无线电系统中。     

基于动态谱估计的改进谱减语音增强算法

语音增强是语音信号处理的重要课题。根据基于最小值追踪的谱估计方法,提出了一种非平稳噪声环境下快速追踪噪声变化的方法,将其应用到改进后的谱减法中,以提升语音增强的效果。仿真结果表明,改进后的谱减法能有效降低背景噪声,提高输出语音信号的信噪比。     

基于听觉掩蔽效应和噪声估计的语音增强算法

谱减法在增强语音、提高信噪比的同时,残留的音乐噪声较大.在利用听觉掩蔽闻值对谱减系数进行修正的基础上,采用实时噪声估计来减少谱减法噪声估计误差,并对谱减后的语音信号进行感知滤波来进一步抑制残留音乐噪声.实验结果表明,该算法能去除噪声,增强语音,并在不影响信噪比的同时降低语音失真测度值.主观测听表明语音音质有明显提高.     

结合相位谱补偿的调制域谱减法

针对现有谱减法面临增强语音可懂度低且引入"音乐噪声"的问题,提出了一种结合相位谱补偿的调制域谱减法。首先将语音分解到若干频带,以同一频带不同时间的幅度谱为输入,通过傅里叶变换得到调制谱,然后采用谱减法修正不同频带的调制幅度谱,有效抑制了背景噪声,同时利用反对称函数补偿调制相位谱,进一步降低残留噪声,提高了语音可懂度。主客观实验结果表明,在不同噪声及信噪比情况下,本文方法能明显抑制背景噪声和"音乐噪声",同时处理后的增强语音保持良好的语音可懂度,改善了主观感知质量。     

基于听觉掩蔽效应的语音增强算法的研究

提出了一种基于听觉掩蔽效应的语音增强算法。算法对含噪语音的增强包括谱减法语音增强和感知加权语音增强两个步骤,分别从客观和主观两方面来提高含噪语音的质量。在谱减法阶段考虑了语音和噪声谱的交叉项,有效地减少了增强语音中的残余噪声;在感知加权处理中充分利用了人耳的掩蔽效应,设计了感知加权滤波器,对谱减法增强后的语音进行滤波,进一步消除残余噪声。对算法进行了数值实验,实验结果表明该算法能有效提高含噪语音的质量,比传统的谱减法有较大改进。     

一种基于小波变换和谱减法的改进的语音增强算法

谱减法是目前受到广泛研究的语音增强算法之一,但谱减法分辨率固定及存在音乐噪声残留的问题,限制了谱减法的应用推广。本文针对以上问题,利用小波变换的多分辨率特性及谱减法运算量小、处理速度快的特点,提出了一种基于小波变换和改进的Berouti谱减法的改进语音增强算法。实验结果表明,该算法在抑制噪声,增强语音信号的可懂度及鲁棒性方面优于传统的谱减法。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.