新型MOS晶体管式压力传感器

在应力作用下,MOS晶体管的源漏电流的大小会随着沟道区所受应力大小而变化。基于MOS晶体管的这种力敏效应,采用晶体管和电阻构成压敏电桥,提出了一种新型的MOS晶体管式压力传感器。该器件在与目前最常用的压阻式压力传感器相比,继承了其制作工艺简单、稳定性和线性度好等优点,大幅提高了传感器灵敏度并降低了功耗,使得器件性能得到整体提高。     

新型MOS晶体管式压力传感器

在应力作用下,MOS晶体管的源漏电流的大小会随着沟道区所受应力大小而变化.基于MOS晶体管的这种力敏效应,采用晶体管和电阻构成压敏电桥,提出了一种新型的MOS晶体管式压力传感器.该器件在与目前最常用的压阻式压力传感器相比,继承了其制作工艺简单、稳定性和线性度好等优点,大幅提高了传感器灵敏度并降低了功耗,使得器件性能得到整体提高.     

浮栅技术及其应用

介绍了浮栅技术的基本原理及应用情况。井对2种应用了浮栅技术的典型器件-浮栅MOS晶体管和神MOS晶体管做了详细介绍，分析了他们的基本结构和工作原理，以及建立浮栅MOS晶体管的等效模型，并说明了他们的应用情况及存在的不足。     

高性能量子场效应管

美国加州的Valid逻辑系统公司设计出一种场效应晶体管,外形尺寸仅有传统MOS器件的十分之一,功耗亦降低到十分之一,速度却提高10倍。新器件在结构上除源极和漏极极性相反重掺杂外和MOS晶体管相似,然而MOS器件极性一样。实际     

初学者知识园地

它是以金属—氧化物一半导体场效应晶体管为主体构成的集成电路,简称为MOS集成电路。以N型沟道MOS晶体管构成的集成电路,称为N沟MOS集成电路,以P型沟道MOS晶体管构成的集成电路称为P沟MOS集成电路,二者统称单沟MOS电路。 N沟器件的多数载流子是电子,P沟器件的多数载流子是空穴。场效应器件是多数载流子工作的器件,电子比空穴的有效质量小,迁     

用于电子皮肤的界面应力传感器的研究

 截肢表面和假肢接口之间的应力分布以及人体足底应力分布对医学研究有着极为重要的意义.为了测量截肢和足底界面应力,本文提出了用平板电容和PDMS超弹塑性材料制作用于电子皮肤的界面应力传感器的方法.对该传感器的测量范围、器件大小、材料选择、机械部分设计、电极耦合和器件制作等问题提出了解决方法.最后,制作出了能够测量0～220kPa正压力和0～70kPa剪切力的用于电子皮肤的界面应力传感器.从实验得到传感器在不同正压力和剪切力下输出电容的实验数据,利用实验数据给出了传感器对正压力和剪切力的响应函数和响应曲线.     

集成MOS力敏运放压力传感器

设计并制作出一种新型集成压力传感器——集成MOS力敏运放压力传感器．它将运算放大器中的一对PMOS差分输入管集中设置在N型(100)Si膜片上的最大应力区，并使它们的沟道方向相互垂直，运放中其它元件全部集中设置在厚体硅上的低应力区．在压力作用下，输入级MOS 管沟道中载流子迁移率发生变化，运算放大器以其为输入信号而产生力敏输出．这种压力传感器具有很高的压力响应灵敏度，可望在诸多领域有广泛应用．     

晶体管、MOS器件

Y2000-62027-37 0005671珠式凸点应力对缩比 MOS 场效应晶体管器件退化的影响=The influence of Stud bumping Stress on devicedegradation in scaled MOSFETs[会,英]/Shimoyama,N.& Machida,K.//1999 IEEE International Reliabili-ty Physics Symposium.—37～41(UC)     

Si3N4栅MOS器件的隧穿电流模拟

随着MOS器件尺寸按比例缩小到亚100 nm时代,栅绝缘层直接隧穿(Direct Tunnel-ing,DT)电流逐渐增大.使用Si3N4材料作为栅介质,利用其介电常数高于SiO2的特性,可以在一定时期内有效地解决隧穿电流的问题.文章在二维器件模拟软件PISCES-II中首次添加了模拟高k材料MOS晶体管的器件模型,并对SiO2和Si3N4栅MOS晶体管的器件特性进行了模拟比较.     

功率MOS器件

本文介绍新近功率MOS场效应晶体管的主要结构和电学性能。为了提高MOS晶体管的电流和电压容量,首先得论述一些基本概念;然后介绍迄今为止最有希望的功率MOS结构,即V·MOS和VD·MOS晶体管中所使用的方法。 接着,我们叙述这些器件的电学性能,即阈值电压、电压—电流特性、欧姆(电阻)特性、饱和及准饱和范围,一次和二次击穿、安全工作区。还讨论了某些动态特性。最后,分析了功率MOS场效应晶体管的基本限制之一,即导通电阻与电压控制能力间的权衡;并提供了某些与其它功率器件的比较数据。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

A rigorous proof of MIMO channel capacity’s increase with antenna number

It is well known that adding more antennas at the transmitter or at the receiver may offer larger channel capacity in the multiple-input multiple-output（MIMO） communication systems. In this letter, a simple proof is presented for the fact that the channel capacity increases with an increase in the number of receiving antennas. The proof is based on the famous capacity formula of Foschini and Gans with matrix theory.