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1.
为了研究凝视激光探测系统的探测灵敏度指标性能,针对凝视激光探测系统的凝视成像特性及探测面元接收激光能量会随视场角的变化而改变的特点,从实验室现有测试条件出发,设计了一套关于其探测灵敏度的室内间接测试方法。分析了测试过程中各环节应注意的问题,给出了相应解决方法,对搭建的模拟激光探测系统在不同的方位角下进行了激光发射、探测实验测试,得出7个不同方位角的探测灵敏度结果,其中,中心视场角探测灵敏度为0.259nJ/cm2,相对误差在3.4%~4.2%范围内,得出该系统最小可探测能量随视场角增大而增大的规律,并定性分析了测试误差。结果表明,该设计方法实际可行,误差精度可以达到规程要求,为进一步研究设计高精度的灵敏度测试系统提供了有益参考。  相似文献   

2.
全向激光告警系统中激光光斑精确定位方法   总被引:3,自引:1,他引:2  
在成像型全向激光告警系统中,大视场探测与精确定向构成一对矛盾.为提高全向激光告警的定向精度,需要对激光光斑进行亚像素级的精确定位.在分析了鱼眼镜头大视场聚焦探测像差引起的光斑非对称性,并且信息量不足,不易于实现亚像素激光中心定位的基础上,提出通过镜头离焦的成像方式探测激光,使得激光在成像面上形成一定大小的弥散圆形光斑.在面阵探测器获取光斑采样像素点的基础上,通过双三次B样条插值曲面重建圆形光斑.并提取一定灰度值的光斑圆周插值点,作为圆形光斑边缘.通过快速Hough算法计算圆心,从而实现光斑中心的亚像素精度定位.通过实验对比验证,说明该方法可有效地提高激光光斑中心定位精度.  相似文献   

3.
星载激光高度计广泛地用于多种地形地貌的科研分析,例如冰层和植被覆盖变化。针对星载激光高度计数据的定量化应用,研究了激光高度计的定标方法,并设计了激光高度计地面定标模拟系统加以验证。该系统包含探测器阵列和高精度脉冲计时系统两部分,用于定标星载激光高度计的对地指向角和时间戳。对定标系统的性能进行实验测试和软件仿真,结果显示:探测器能够探测平均能量3 nJ/cm2的光斑,探测范围为1~16 nJ/cm2,计时系统计时精度为1.25 ns。  相似文献   

4.
基于正弦光栅的凝视型激光探测告警系统的设计与实现   总被引:4,自引:1,他引:3  
张超  牛燕雄  苏平  和婷  张鹏  牛海莎  李易难 《中国激光》2012,39(10):1016001-225
当激光入射到正弦光栅时,会产生0级和±1级衍射谱线,通过测量衍射谱线的分布,可获得入射激光的波长及方位角信息。为了实时探测激光光源的波长和方位角,设计了一种基于正弦光栅的凝视型激光探测告警系统。介绍了系统的工作原理,推导了激光波长和方位角的计算公式,并对系统的探测精度进行了数值模拟研究。分析了光栅常数和柱面镜曲率半径对系统探测能力的影响,并且给出了相关函数。实验结果表明:当光栅常数为1/500mm、柱面镜曲率半径为20mm时,系统可实现对波长为320~1100nm、视场角为±20°范围内激光源的实时探测,波长分辨率可达到10nm,角分辨率可达到1°。  相似文献   

5.
设计并实现了一种基于微悬臂梁焦平面阵列的凝视型激光告警系统。该系统通过微悬臂梁焦平面阵列及成像CCD来实现对入射激光的精确定向。入射激光通过红外镜头辐射到微悬臂梁焦平面阵列时会使微悬臂梁发生变形,通过光读出系统将这种变化成像在CCD上就可以判断出激光的入射方向。实验结果表明:镜头焦距为60mm、微悬臂梁面元为80μm×100μm时,告警系统的视场角为±15°,分辨率可达到0.5°。此告警系统视场角大、定向精度高,并且避免了激光对CCD的干扰及损坏。  相似文献   

6.
鱼眼成像型激光告警系统光斑中心亚像元定位方法   总被引:1,自引:0,他引:1  
光斑中心精确定位是成像型激光告警系统威胁激光准确定向的基础。分析了鱼眼成像型激光告警系统成像光斑特点,针对CMOS传感器像元非完全填充结构和大入射角区域光斑能量分布非对称造成定位误差大的问题,基于光斑高斯分布特征,提出将二维高斯分布函数积分分解为两个坐标方向一维积分的乘积,利用误差函数级数近似光斑灰度高斯积分,通过能量响应最大像元和次大像元的灰度比求解光斑中心坐标的细分算法,最后通过实验对比研究了新方法的定位性能。结果表明,本方法受像元非完全填充和镜头非对称像差的影响较小,近轴区域和入射角大于60°的轴外区域定位精度分别达到1/80和1/70 pixel,最大误差小于1/30 pixel。本方法计算相对简单、定位精度较高,且对不同位置光斑定位精度稳定,能够满足大视场激光告警装备的指标要求。  相似文献   

7.
谢亚峰  朴明旭  唐金力  赵渊明  连文泽  范杰平  张博 《红外与激光工程》2023,52(2):20220442-1-20220442-8
为了实现激光/红外双模导引头成像系统的小型化,简化光学系统结构,设计了四次反射的双模共光路环形孔径超薄成像系统,研究了该系统的分光路设计原理,给出了遮拦比与视场角的关系,实现了仅有单一光学元件的长波红外7.7~9.5μm和激光1.064μm双模导引头成像系统。双模环形孔径系统在长波红外波段的焦距为70 mm、等效F数为1.3、全视场为8°、空间频率为41.7 lp/mm时各视场MTF值均大于0.136。双模环形孔径系统在激光波长的焦距为53.8 mm、等效F数为1、全视场为10°、全视场范围内的光斑分布均匀。在环境温度范围为-40~80℃时,长波红外波段各视场MTF值均大于0.13,激光波长的弥散斑形状和能量分布基本不变,实现了光学被动无热化。通过公差分析可知双模环形孔径系统具备可加工性。  相似文献   

8.
为了实现激光告警系统的抗干扰性及宽视场,文章提出应用锥形光纤进行光学探头的设计。该方法是采用端面有锥角的光纤并与光电二极管直接耦合连接实现光电转换,通过测量电压值来表示入射光的能量。文章根据激光告警系统设计要求对锥形光纤角度选择及光纤能量接收进行了分析和实验,实验数据表明,该方法可以增大告警系统的探测视场。  相似文献   

9.
为了研究不同入射角下的激光干扰效果,采用逐步调节光轴指向的方法,对不同入射角下的干扰效果进行了实验研究和理论分析,取得了不同入射角下激光束在探测器上光斑位置、接收能量和光斑形状的数据。结果表明,光斑位置随入射角的增大而线性移动,对于本文中的光电成像系统而言,移动速率为入射角每增加0.1°,光斑偏离探测器中心16个像素;接收能量随入射角的增大而减小,对于本文中视场角为8°的光学系统而言,减小的幅度不超过1%;不同入射角下的激光光斑形状满足空间平移不变性。这一结果对开展激光干扰光电成像系统试验是有帮助的。  相似文献   

10.
单秋莎  苏秀琴  段晶  周亮  刘凯  闫佩佩  姜凯 《红外与激光工程》2020,49(3):0314002-0314002-6
基于外视场拼接原理,研制一套大视场中波红外原理样机。设计一制冷型中波红外光学系统。采用光学系统出瞳与冷屏重合的二次成像结构形式,保证系统具有100%冷光阑效率。工作波段为3.7~4.8μm,焦距为40 mm,相对孔径为1:2,全视场角为21.74°×17.46°(27.88°),系统总长145 mm。采用孔/反射镜分时成像的外视场拼接,实现2×1视场扩展。设计结果表明:在空间频率21 lp/mm处,轴外视场MTF>0.68,接近衍射极限。系统结构紧凑,成像质量较高。利用原理样机完成可行性和合理性验证。  相似文献   

11.
Waveguide multilayer optical card (WMOC) is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling & processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic (VB) language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.  相似文献   

12.
IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…  相似文献   

13.
The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.  相似文献   

14.
Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.  相似文献   

15.
A doping system consisting of NPB and PVK is employed as a composite hole transporting layer (CHTL). By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK : NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK : NPB at 1:3.  相似文献   

16.
An insert layer structure organic electroluminescent device(OLED) based on a new luminescent material (Zn(salen)) is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn(salen)/Liq/LiF/A1/CuPc/NPD/Zn(salen)/Liq/LiF/A1. Effective insert electrode layers comprising LiF(1nm)/Al(5 nm) are used as a single semitransparent mirror, and bilayer cathode LiF(1 nm)/A1(100 nm) is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.  相似文献   

17.
Due to variable symbol length of digital pulse interval modulation(DPIM), it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation(FDPIM) method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.  相似文献   

18.
It is a key problem to accurately calculate beam spots' center of measuring the warp by using a collimated laser. A new method, named double geometrical center method (DGCM), is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device (CCD) is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What's more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.  相似文献   

19.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

20.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

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