基于外辐射源的机动目标单站无源定位IMM算法

探讨一种基于外辐射源的信号到达时间差 (TDOA)和信号到达方向 (DOA)信息 ,利用固定单站对机动目标进行无源定位与跟踪的新方法。在建立目标机动模型与量测方程的基础上 ,运用交互式多模型 (IMM)算法 ,实现对机动目标进行定位与跟踪。通过计算机仿真 ,验证了该方法的正确性与有效性     

红外制导弹药协同定位跟踪方法研究

针对红外制导导弹无法直接测量弹目距离、视线角速度及目标加速度等制导信息,且单枚导弹的可观测量少,目标定位误差大的问题,考虑红外导引头的测量特性,利用多枚导弹与目标的几何关系对目标进行协同定位。建立多枚导弹对目标的协同跟踪模型,通过计算导弹间相对运动关系估算弹目距离,并将其作为伪量测量,结合导引头测角信息构建新的量测方程,利用卡尔曼滤波估计出弹目距离和视线角速度等制导信息。针对机动目标,研究了一种基于交互式多模型滤波方法,利用多个目标机动模型加权融合的方法来估计真实目标机动模型。数学仿真表明该方法有效提高了对固定/机动目标的估计精度。     

基于Jerk模型和EKF的多基地雷达机动目标跟踪算法

针对多基地雷达系统对高机动目标的跟踪精度问题,提出了基于Jerk模型和扩展卡尔曼滤波(EKF)的机动目标跟踪算法.通过建立系统的离散状态方程和非线性观测方程,推导状态向量和误差协方差矩阵的初始化计算公式,给出EKF滤波的流程.利用Monte Carlo仿真,分析和比较了在变加速目标轨迹下Jerk与当前统计模型的跟踪效果,表明该算法具有对高机动目标实现准确自适应跟踪的能力.     

杂波环境下被动多传感器机动目标跟踪新算法

针对杂波环境被动传感器机动目标跟踪问题,该文研究了一种基于粒子滤波的被动多传感器机动目标跟踪新算法。 在该算法中,首先推导了杂波环境下粒子滤波的似然函数表达式。其次将粒子滤波与交互多模型(IMM)相结合,用IMM方法实现模型的切换,以适应目标的机动变化。用粒子滤波实现对观测方程的非线性处理。最后,建立了被动多传感器的非线性观测模型,避免了目标的不可观测性,并且算法还能够处理非高斯噪声情况。仿真实验结果表明,提出的算法能够有效地对被动机动目标跟踪,且性能优于交互多模型概率数据关联滤波器(IMM-PDAF)。     

红外搜索跟踪系统对机动目标的跟踪算法研究

红外搜索跟踪系统(IRST)只能得到目标的角度,目标的精确三维运动方程难以建立,因此对机动目标进行跟踪尤为困难.提出了适合红外搜索跟踪系统的纯角度交互式多模型(IMM)定向跟踪算法,并和基于单一模型的卡尔曼滤波做了仿真对比,仿真结果表明了所提出的算法较卡尔曼滤波在性能上有很大提高,能够很好地跟踪机动目标.     

基于交互式多模型的机动目标跟踪算法

在军事和民用航空领域，可靠而精确地跟踪目标始终是目标跟踪系统设计的关键。但当目标处于强机动多模型的运动情况下时，在对目标进行状态估计时，单独采用一个模型会受到模型自身局限性的影响使得滤波精度不高，于是有必要采用多个模型描述机动目标的运动状态。基于此，采用交互式多模型滤波算法对目标进行跟踪。仿真结果表明，该算法对机动目标有很好的跟踪效果和较高的跟踪精度。     

用于机动目标跟踪的分段机动识别方法

分段轨迹识别方法是一种将目标轨迹分成若干段曲线,对每一段曲线进行参数估计进而估计目标状态的跟踪方法.基于分段轨迹识别方法提出了一种分段机动识别方法,使之能够适用于更多的目标机动类型.针对速度变化的目标,提出了新的曲线参数描述的模型以及新的优化跟踪性能的代价函数,改进了判断分段结束的条件以及起始新分段的方法.仿真结果表明:分段机动识别方法在稳态性能不变的情况下,能够更好地跟踪加减速目标;同时,分段机动识别方法对于高度机动目标的跟踪性能和准确构造的交互多模型算法相似,且远优于匀速直线运动模型下的卡尔曼滤波器.     

天波雷达匹配域处理测高方法目标机动影响分析

针对目标高度和飞行速度机动变化引起测高精度下降的问题,建立了一种基于目标机动的天波超视距雷达信号模型,提出了一种改进的机动目标匹配域处理（Maneuvering Target Matched Field Processing,MTMFP）测高算法。该算法首先结合电离层电子密度分布,分析了天波雷达基于微多径的信号传输现象;其次引入目标机动参量（即目标高度变化率和径向加速度）,建立了复距离-多普勒信号模型;最后详细分析了天波雷达MTMFP测高算法的估计性能。理论分析及仿真结果表明:基于所建立的天波雷达机动信号模型,可以实现目标高度变化率和径向加速度的联合估计,12次重访后,目标高度估计误差在500m左右。      

基于“当前”统计模型的容积卡尔曼滤波算法北大核心CSCD

由于雷达探测目标是在极坐标系下进行的,因此在直角坐标系下建立雷达跟踪系统的状态方程和观测方程时,观测方程是非线性的,基于"当前"统计模型的机动目标跟踪不能直接通过标准卡尔曼滤波实现。文中在"当前"统计模型基础上,提出用容积卡尔曼滤波来实现非线性滤波,并将其与扩展卡尔曼滤波进行比较。通过对一个三维空间中机动目标跟踪的仿真,表明该算法能稳定跟踪目标,且跟踪精度高。     

一种新的机动目标跟踪的多模型算法

采用带渐消因子的当前统计模型与匀速运动模型进行交互,设计了一种新的机动目标跟踪的交互式多模型算法。当前统计模型具有对一般机动目标跟踪精度高的特点,通过渐消因子的引入增强了该模型对突发机动的自适应跟踪能力,同时通过与CV模型的交互保证了对非机动目标的跟踪性能。仿真结果表明,在跟踪一般机动目标时,其误差和当前统计模型与CV模型交互的IMM算法相当;在跟踪突发机动目标时,该文算法的误差明显小于当前统计模型与CV交互的IMM算法。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.