EDXRF发射比值法识别镀金层及镀金层厚度的测定

本方法利用Au原子在X射线激发下所发射的L_β线和M线的强度比值来区别镀金和K金,同时也利用这个比值的大小来测定镀金层的厚度,测定区范围为0—4μm,测定值与标定值的相对偏差小于12％。     

ED—XRF法对镀金饰品的测定

和ＥＤ－ＸＲＦ荧光能谱仪，利用金原子在Ｘ射线激发下所发射的Ｌβ线和Ｌθ线的强度比值来识别样品是镀金的还是Ｋ金。同时利用这个比值的大小来测定镀金层的厚度，可测镀金层厚度０－５μｍ，最大相对标准偏差１５％。     

XRF靶线内标法测定金覆盖层的厚度

应用XRF靶线内标法测定Au的X—荧光谱线的强度,以此来测定饰品的金覆盖层的厚度,可以克服饰品的几何形状的影响。本文选择Rh的K_α线为内标线,Au的L_β线为分析线,以Au的L_β线强度对Rh的K_α线强度的比值为变量,研究了该比值与金覆盖层厚度的函数关系,以此测定金覆盖层的厚度,本方法测定金覆盖层厚度范围为0—5μm,测定结果与标称值的相对偏差≤15％。     

选择激发基本参数法识别镀金层以及测定其厚度

本文选择了Mo靶和Sn靶作为二次靶激发样品,同时应用无标样基本参数法计算样品谱图的拟合金含量,以此来识别样品是镀金的还是K金的,并测定了镀金层的厚度,本方法测定镀金层的范围为0—6μm,测定的偏差≤0.15μm,相对偏差≤15％。     

奖章镀金

“5．1奖章”、“劳模奖章”一般都采用镀金或镀银。材质为紫铜．先冲压成型，然后电镀．如果不要求镀金的重量和厚度．只要求表面金黄色光亮，可将奖章镀镍后闪镀金，但这种奖章保持不好外观就发生变化，且挂在身上，棱角处金层很快磨去．露出底层。我们现在要镀金的奖章要求每个镀1．5g．厚度大于12μm，这样保证了奖章的外观质量，提高了奖章价值，下面介绍这种奖章的镀金方法。     

Ni—Sn合金新镀法

Ni-Sn合金镀层有较高的熔点,可焊性好,硬度高,耐磨,耐腐蚀,表面均匀,光亮,可用于仪表,仪器装饰镀层,半导体致冷元件钎焊镀层,印制线路表面镀层,印制板插头镀金底层等,美国Wesstern electric specification规定:铜箔上直接镀硬金,其厚要有25μ;以Ni作底层,其金层厚度要有1.2～2.5μ;以Ni-Sn合金作底层,则硬金厚度只需0.125~0.25μ.这说明以Ni-Sn合金做底层,器件表面对镀金的要求大大降低,镀层耐磨性和耐腐蚀性有所提高. Ni-Sn合金可直接镀于Cu,Ni、柯伐和铁件上. 前目,国内外Ni-Sn合金电镀工艺普遍采用     

无氰刷镀金

采用多元有机物作络合剂,研制成功了11#、13#、15# (硬金) 等系列刷镀金(?).三系列镀液pH值均较宽,可由5.5～8.5.阴极电流密度可由0.1～4A/dm~2. 刷镀金层的抗蚀性能超过电镀金及化学镀金,尤其是化学镀金.介绍了铜、银基体上刷镀金的工艺要点及规范.     

用Micro—CT测量ICFT型源靶柱腔诊断孔轴线与靶杆夹角的研究

用微CT测量ICF（惯性约束聚变）T型源靶柱腔诊断孔轴线与靶杆夹角（下文以θ代替）可以有效的排除柱腔外壁所镀金层厚度的不均匀对测量结果的影响。将微CT测量的两种方法与金层厚度均匀条件下用显微镜测量的结果进行比较,得出划定诊断孔上下边界点找中心的微CT测量方法具有更高的可信度。     

波导同轴转换组件锈蚀分析

波导同轴转换装置采用镍-金双层镀层,部分零件在装配时发现有大量锈蚀。通过扫描电镜观察、镀层厚度测量等方法对锈蚀的原因进行了分析。结果表明:镀金层厚度较薄,镀层上有较多微孔,未能形成有效保护;零件包装盒使用了含氯元素的粘结剂,粘结剂变质分解导致了零件锈蚀。     

一种新的节金方法——电镀与离子溅射相结合

可以采用一种由惰性非金属材料组成的耐磨的透明薄膜保护镀金零件的表面·使其不被擦毛和腐蚀。这层保护膜采用离子溅射法沉积在这些零件上。由于采用了这种膜，可允许采用较薄的金镀层，控制膜的厚度可避免色差，采用中间层可以确保膜与金镀层间的良好结合。     

利用SEM、EDS及WDS对铜及其氧化物的价态效应研究

利用扫描电子显微镜(SEM)、X射线能谱仪(EDS)及X射线波谱仪(WDS)研究了铜及其氧化物的I_(Lα)/I_(Kα)和I_(Lα)/I_(Lβ)谱线强度比的价态效应。结果表明,不同价态铜的I_(Lα)/I_(Kα)和I_(Lα)/I_(Lβ)谱线强度比按一定的规律随价态而变化,即谱线强度比值随价数增加而减少。     

环境扫描电镜中电荷环境的测量

在环境扫描电镜(ESEM)中,采用高灵敏度的pA-表测试系统,测量法拉第杯,以及Cu-Zn合金、单晶Si、单晶Al2O3三种样品的样品电流(ISP)。ISP值反映出由电子流和离子流控制的ESEM样品室内的电荷环境。法拉第杯的ISP反映出入射电子和离子所控制的电荷环境;样品的ISP反映出入射电子、信号电子和离子所控制的电荷环境。由ISP值可确定ESEM在不同操作和环境条件下的离子化效率、离子化饱和程度,以及气体分子的散射作用。     

Li(Ni,Co,Mn)O_2合成过程中的结构变化

根据Li(Ni,Co,Mn)O2晶体中Li+和Ni2+的阳离子混排占位模型进行模拟计算,建立了(I003/I104)1/2、(I101/I012)1/2(、I101/I104)1/2等特征衍射线强度比与混排占位参数x的线性方程式。结合实验测得的X-射线衍射谱和混排占位模型研究了Li(Ni,Co,Mn)O2合成过程中的结构演变过程。     

Achieving the high phase purity of CH3NH3PbI3 film by two-step solution processable crystal engineering

To date,it is still a great challenge for highly efficient perovskite devices to realize the high quality perovskite films with high purity,high coverage ratio and good crystallization by two-step scalable solution method.In this study,a series Pb I_2films with tunable micro-architecture of Pb I_2crystals are prepared via solution processable crystal engineering.The perovskite film,prepared by optimized pit spacing in gas pumped Pb I_2film at 1000 Pa,shows the highest film quality,including no residual Pb I_2phase,compact morphology,and improved photoluminescence intensity.A transformation kinetics shows that the pit spacing strongly influences both the mass transfer and the sequential intercalation reaction between CH_3NH_3I and Pb I_2crystals,which ultimately determines the full reaction state of the perovskite film.The perovskite solar cells assembled by the perovskite film show both high power-conversion efficiency and good reproducibility of photovoltaic performance due to the restrained charge recombination arising from the high quality perovskite film.     

电磁雷管的稳健性设计

文章以电路分析为基础，建立了电磁雷管设计的数学模型，导出了感应电流Ｉ２和相关参数的理论方程。基于此方程，探讨了电磁雷管进行稳健性设计的途径。     

温度和多重项耦合对Er3Ga5O12在强磁场中磁化的影响

用量子理论计算了Er3Ga5O12在[100]和[111]方向的基态磁化强度随温度的变化情况，证实了实验的结论，计算了^4I13/2和^4I15/2两个多重项耦合对基态磁化强度的影响，进一步从理论上分析了Er3Ga5O12磁性非线性产生的微观机制。     

分段线性补偿型CMOS带隙基准电压源设计

设计了一种高精度CMOS带隙基准电压源电路.电路采用了共源共栅电流镜和自偏置技术,通过运放的负反馈分别获得正温度系数的电流IPTAT和负温度系数的电流ICTAT,通过电流的减法运算将在整个温度范围内分两段产生不同的补偿电流INL,并完成对带隙基准电压的分段线性补偿,由此得到温度系数很小的带隙基准电压.     

Wide PRIME-current range for all-magnetic shift registers

In an all-magnetic resistance-type shift register, a PRIME current pulsei_{p}(t), of amplitude Ip, is applied to Npand Nbturns through the minor and major apertures, respectively. For given operation frequencyf, the ratioR = I_{p}^{max}/I_{p}^{min}, whereI_{p}^{min} < I_{p} < I_{p}^{max}is the PRIME range of bistable operation, is maximized by matchingN_{p}/N_{b}so thatI_{p}^{max}values determined by spurious ZERO buildup and ONE dropout are the same. For a rectangular (or dc)i_{p}(t), the matchedN_{p}/N_{b}is fixed by the core properties, and R^maxis limited (e.g., <7). However, ifi_{p}(t)rises gradually, the matchedN_{p}/N_{b}depends also on the rise time Trofi_{p}(t). The lowerfis, with corresponding larger Tr, the smaller is the matchedN_{p}/N_{b}, and the larger is R^max. Calculation ofRis carried for ramp and half-sinusoidali_{p}(t)waveforms. The latter, for instance, atT = 25degC yields R^maxvalues of 14.0 and 22.0 forfof 1.0 and 0.5 kc/s respectively. Such wide PRIME ranges permit reliable register operation in a wide temperature range without resorting to temperature compensation of Ip. Experimental results are in agreement with the calculation.     

Fuzzy Motion-Adaptive Interpolation With Picture Repetition Detection for Deinterlacing

A novel fuzzy motion-adaptive deinterlacing algorithm is presented in this paper. It uses fuzzy logic to interpolate between two processing modes, i.e., a spatial $(I_{S})$ and a temporal $(I_{T})$ interpolator. Furthermore, the temporal interpolator employs a very simple fuzzy inference system to implement a smart temporal interpolation that locally adapts to the features of the television (TV) material, such as possible picture repetition modes in the fields or in part of the fields (hybrid material). The combination of both systems provides effective results with a low cost in terms of computational resources.